Tanuj AGGARWAL

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography system bandwidth control
- Patent number 11,769,982
- Issue date Sep 26, 2023
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 11,050,213
- Issue date Jun 29, 2021
- Cymer, LLC
- Joshua Jon Thornes
- G01 - MEASURING TESTING
Information Patent Grant
Gas optimization in a gas discharge light source
- Patent number 10,892,594
- Issue date Jan 12, 2021
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system bandwidth control
- Patent number 10,833,471
- Issue date Nov 10, 2020
- Cymer, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 10,727,642
- Issue date Jul 28, 2020
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,627,724
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Frank Everts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas optimization in a gas discharge light source
- Patent number 10,218,147
- Issue date Feb 26, 2019
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dither free adaptive and robust dose control for photoli...
- Patent number 10,096,969
- Issue date Oct 9, 2018
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixture control in a gas discharge light source
- Patent number 10,090,629
- Issue date Oct 2, 2018
- Cymer, LLC
- Rahul Ahlawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimating a gain relationship of an optical source
- Patent number 10,036,963
- Issue date Jul 31, 2018
- Cymer, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controller for an optical system
- Patent number 9,939,732
- Issue date Apr 10, 2018
- Cymer, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas mixture control in a gas discharge light source
- Patent number 9,819,136
- Issue date Nov 14, 2017
- Cymer, LLC
- Rahul Ahlawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 9,762,023
- Issue date Sep 12, 2017
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas optimization in a gas discharge light source
- Patent number 9,634,455
- Issue date Apr 25, 2017
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY SYSTEM BANDWIDTH CONTROL
- Publication number 20210021094
- Publication date Jan 21, 2021
- CYMER, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20200321746
- Publication date Oct 8, 2020
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20190190229
- Publication date Jun 20, 2019
- CYMER, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM BANDWIDTH CONTROL
- Publication number 20190155170
- Publication date May 23, 2019
- CYMER, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180253014
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Frank EVERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ESTIMATING A GAIN RELATIONSHIP OF AN OPTICAL SOURCE
- Publication number 20180074412
- Publication date Mar 15, 2018
- CYMER, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20180006425
- Publication date Jan 4, 2018
- CYMER, LLC
- Joshua Jon Thornes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20170237224
- Publication date Aug 17, 2017
- CYMER, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20170229832
- Publication date Aug 10, 2017
- CYMER, LLC
- Rahul Ahlawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20170201057
- Publication date Jul 13, 2017
- CYMER, LLC
- Rahul Ahlawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20170179677
- Publication date Jun 22, 2017
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLER FOR AN OPTICAL SYSTEM
- Publication number 20170115575
- Publication date Apr 27, 2017
- CYMER, LLC
- Tanuj Aggarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tanuj AGGARWAL

Person

Patents Grantslast 30 patents

Lithography system bandwidth control

Online calibration for repetition rate dependent performance variables

Gas optimization in a gas discharge light source

Lithography system bandwidth control

Online calibration for repetition rate dependent performance variables

Lithographic apparatus and method

Gas optimization in a gas discharge light source

Method for dither free adaptive and robust dose control for photoli...

Gas mixture control in a gas discharge light source

Estimating a gain relationship of an optical source

Controller for an optical system

Gas mixture control in a gas discharge light source

Online calibration for repetition rate dependent performance variables

Gas optimization in a gas discharge light source

Patents Applicationslast 30 patents

LITHOGRAPHY SYSTEM BANDWIDTH CONTROL

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE

LITHOGRAPHY SYSTEM BANDWIDTH CONTROL

LITHOGRAPHIC APPARATUS AND METHOD

ESTIMATING A GAIN RELATIONSHIP OF AN OPTICAL SOURCE

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE

GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE

GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

CONTROLLER FOR AN OPTICAL SYSTEM