Tao-Yi Fu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for monitoring a non-defect related characteris...
- Patent number 10,324,046
- Issue date Jun 18, 2019
- KLA-Tencor Corp.
- Tao-Yi Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source multiplexing illumination for mask inspection
- Patent number 9,625,810
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with time multiplexed sources for reticle inspe...
- Patent number 9,151,718
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for inspection of a specimen using different in...
- Patent number 8,384,887
- Issue date Feb 26, 2013
- KLA-Tencor Technologies Corp.
- Steve R. Lange
- G01 - MEASURING TESTING
Information Patent Grant
Systems configured to generate output corresponding to defects on a...
- Patent number 8,355,140
- Issue date Jan 15, 2013
- KLA-Tencor Technologies Corp.
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Grant
Systems configured to generate output corresponding to defects on a...
- Patent number 7,924,434
- Issue date Apr 12, 2011
- KLA-Tencor Technologies Corp.
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Grant
Confocal wafer inspection system and method
- Patent number 7,858,911
- Issue date Dec 28, 2010
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for inspection of a specimen using different in...
- Patent number 7,738,089
- Issue date Jun 15, 2010
- KLA-Tencor Technologies Corp.
- Steve R. Lange
- G01 - MEASURING TESTING
Information Patent Grant
High throughput brightfield/darkfield water inspection system using...
- Patent number 7,554,655
- Issue date Jun 30, 2009
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Systems configured to inspect a specimen
- Patent number 7,535,563
- Issue date May 19, 2009
- KLA-Tencor Technologies Corporation
- Grace Hsiu-Ling Chen
- G01 - MEASURING TESTING
Information Patent Grant
High throughput darkfield/brightfield wafer inspection system using...
- Patent number 7,522,275
- Issue date Apr 21, 2009
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Dark field inspection apparatus and methods
- Patent number 7,436,503
- Issue date Oct 14, 2008
- KLA-Tencor Technologies Corp.
- Grace Hsiu-Ling Chen
- G01 - MEASURING TESTING
Information Patent Grant
Confocal wafer inspection method and apparatus using fly lens arran...
- Patent number 7,399,950
- Issue date Jul 15, 2008
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
High throughput brightfield/darkfield wafer inspection system using...
- Patent number 7,379,173
- Issue date May 27, 2008
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
System and method for coherent optical inspection
- Patent number 7,327,464
- Issue date Feb 5, 2008
- KLA-Tencor Technologies Corporation
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Grant
Spatial light modulator fourier transform
- Patent number 7,317,527
- Issue date Jan 8, 2008
- KLA-Tencor Technologies Corporation
- Dragos Maciuca
- G01 - MEASURING TESTING
Information Patent Grant
High throughput darkfield/brightfield wafer inspection system using...
- Patent number 7,259,844
- Issue date Aug 21, 2007
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
System and method for coherent optical inspection
- Patent number 7,209,239
- Issue date Apr 24, 2007
- KLA-Tencor Technologies Corporation
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Grant
High throughput brightfield/darkfield wafer inspection system using...
- Patent number 7,164,475
- Issue date Jan 16, 2007
- KLA-Tencor Technologies Corporation
- Christopher R Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Confocal wafer depth scanning inspection method
- Patent number 7,109,458
- Issue date Sep 19, 2006
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus using interferometric metrology for high aspec...
- Patent number 7,061,625
- Issue date Jun 13, 2006
- KLA-Tencor Technologies Corporation
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Grant
Confocal wafer inspection method and apparatus using fly lens arran...
- Patent number 6,867,406
- Issue date Mar 15, 2005
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Grant
High throughput brightfield/darkfield wafer inspection system using...
- Patent number 6,816,249
- Issue date Nov 9, 2004
- KLA-Tencor Corporation
- Christopher R Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,584,218
- Issue date Jun 24, 2003
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,363,166
- Issue date Mar 26, 2002
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput brightfield/darkfield wafer inspection system using...
- Patent number 6,288,780
- Issue date Sep 11, 2001
- KLA-Tencor Technologies Corp.
- Christopher R Fairley
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,052,478
- Issue date Apr 18, 2000
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,737,072
- Issue date Apr 7, 1998
- KLA Instruments Corporation
- David Garth Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 5,572,598
- Issue date Nov 5, 1996
- KLA Instruments Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,563,702
- Issue date Oct 8, 1996
- KLA Instruments Corporation
- David G. Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Illumination System with Time Multiplexed Sources for Reticle Inspe...
- Publication number 20130242295
- Publication date Sep 19, 2013
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION
- Publication number 20120236281
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems Configured to Generate Output Corresponding to Defects on a...
- Publication number 20110181891
- Publication date Jul 28, 2011
- KLA-Tencor Technologies Corporation
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT IN...
- Publication number 20100238433
- Publication date Sep 23, 2010
- KLA-Tencor Technologies Corporation
- Steve R. Lange
- G01 - MEASURING TESTING
Information Patent Application
Confocal wafer inspection system and method
- Publication number 20080273196
- Publication date Nov 6, 2008
- KLA-Tencor Corporation
- Christopher R. Fairley
- G02 - OPTICS
Information Patent Application
High throughput brightfield/darkfield water inspection system using...
- Publication number 20080225298
- Publication date Sep 18, 2008
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
High throughput darkfield/brightfield wafer inspection system using...
- Publication number 20080007726
- Publication date Jan 10, 2008
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
System And Method For Coherent Optical Inspection
- Publication number 20070195332
- Publication date Aug 23, 2007
- KLA-Tencor Technologies Corporation
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Application
High throughput darkfield/brightfield wafer inspection system using...
- Publication number 20070115461
- Publication date May 24, 2007
- KLA-Tencor Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
Systems Configured to Generate Output Corresponding to Defects on a...
- Publication number 20070030477
- Publication date Feb 8, 2007
- KLA-TENCOR TECHNOLOGIES CORP.
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Application
Confocal wafer inspection method and apparatus using fly lens arran...
- Publication number 20070007429
- Publication date Jan 11, 2007
- KLA-Tencor Corporation
- Christopher R. Fairley
- G02 - OPTICS
Information Patent Application
Confocal wafer inspection method and apparatus
- Publication number 20050156098
- Publication date Jul 21, 2005
- Christopher R. Fairley
- G02 - OPTICS
Information Patent Application
High throughput brightfield/darkfield wafer inspection system using...
- Publication number 20050062962
- Publication date Mar 24, 2005
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
Methods and systems for inspection of a specimen using different in...
- Publication number 20050052643
- Publication date Mar 10, 2005
- Steve R. Lange
- G01 - MEASURING TESTING
Information Patent Application
High throughput brightfield/darkfield wafer inspection system using...
- Publication number 20040252297
- Publication date Dec 16, 2004
- KLA-Tencor Technologies Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
System and method for coherent optical inspection
- Publication number 20040130710
- Publication date Jul 8, 2004
- Shiow-Hwei Hwang
- G01 - MEASURING TESTING
Information Patent Application
High throughput brightfield/darkfield wafer inspection system using...
- Publication number 20020118359
- Publication date Aug 29, 2002
- KLA-Tencor Technologies Corporation
- Christopher R. Fairley
- G01 - MEASURING TESTING
Information Patent Application
Automated photomask inspection apparatus
- Publication number 20020054702
- Publication date May 9, 2002
- Mark Joseph Wihl
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Methods and systems for monitoring a non-defect related characteris...

Source multiplexing illumination for mask inspection

Illumination system with time multiplexed sources for reticle inspe...

Methods and systems for inspection of a specimen using different in...

Systems configured to generate output corresponding to defects on a...

Systems configured to generate output corresponding to defects on a...

Confocal wafer inspection system and method

Methods and systems for inspection of a specimen using different in...

High throughput brightfield/darkfield water inspection system using...

Systems configured to inspect a specimen

High throughput darkfield/brightfield wafer inspection system using...

Dark field inspection apparatus and methods

Confocal wafer inspection method and apparatus using fly lens arran...

High throughput brightfield/darkfield wafer inspection system using...

System and method for coherent optical inspection

Spatial light modulator fourier transform

High throughput darkfield/brightfield wafer inspection system using...

System and method for coherent optical inspection

High throughput brightfield/darkfield wafer inspection system using...

Confocal wafer depth scanning inspection method

Method and apparatus using interferometric metrology for high aspec...

Confocal wafer inspection method and apparatus using fly lens arran...

High throughput brightfield/darkfield wafer inspection system using...

Automated photomask inspection apparatus

Automated photomask inspection apparatus

High throughput brightfield/darkfield wafer inspection system using...

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Patents Applicationslast 30 patents

Illumination System with Time Multiplexed Sources for Reticle Inspe...

SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION

Systems Configured to Generate Output Corresponding to Defects on a...

METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT IN...

Confocal wafer inspection system and method

High throughput brightfield/darkfield water inspection system using...

High throughput darkfield/brightfield wafer inspection system using...

System And Method For Coherent Optical Inspection

High throughput darkfield/brightfield wafer inspection system using...

Systems Configured to Generate Output Corresponding to Defects on a...

Confocal wafer inspection method and apparatus using fly lens arran...

Confocal wafer inspection method and apparatus

High throughput brightfield/darkfield wafer inspection system using...

Methods and systems for inspection of a specimen using different in...

High throughput brightfield/darkfield wafer inspection system using...

System and method for coherent optical inspection

High throughput brightfield/darkfield wafer inspection system using...

Automated photomask inspection apparatus