Taro Ikeda

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower plate, plasma processing apparatus and plasma processing method
- Patent number 12,051,564
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, lower dielectric member and plasma processing apparatus
- Patent number 12,046,455
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,967,485
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,170
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,663
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,887,825
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mikio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,842,886
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,784,085
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,721,528
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma probe device, plasma processing apparatus, and control method
- Patent number 11,705,310
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,600,475
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and plasma processing method
- Patent number 11,538,667
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,508,556
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Array antenna and plasma processing apparatus
- Patent number 11,476,088
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density monitor, plasma processing apparatus, and plasma pro...
- Patent number 11,410,835
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,355,326
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,152,269
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antenna and plasma deposition apparatus
- Patent number 10,991,549
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 10,971,413
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and gas introduction mechanism
- Patent number 10,804,078
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Yutaka Fujino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,777,389
- Issue date Sep 15, 2020
- TOKYO ELECTRON LIMIED
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source and plasma processing apparatus
- Patent number 10,727,030
- Issue date Jul 28, 2020
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device with shower plate having protrusion for su...
- Patent number 10,557,200
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus with shower plate having protrusion for...
- Patent number 10,443,130
- Issue date Oct 15, 2019
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source and plasma processing apparatus
- Patent number 10,319,567
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Remote Plasma Device and Plasma Processing Apparatus
- Publication number 20240412949
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
- Publication number 20240404805
- Publication date Dec 5, 2024
- Tokyo Electron Limited
- Mikio SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20240312767
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Taro HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTOR AND PLASMA PROCESSING APPARATUS
- Publication number 20240297018
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240212985
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240170260
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20240055231
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240038500
- Publication date Feb 1, 2024
- Tokyo Electron Limited
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240030008
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014005
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014013
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Nobuo MATSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386791
- Publication date Nov 30, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CEILING WALL
- Publication number 20230343561
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Satoshi ITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNER, AND IMPEDANCE MATCHING METHOD
- Publication number 20230335876
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230295797
- Publication date Sep 21, 2023
- Tokyo Electron Limited
- Nobuo MATSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230260750
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230245870
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230238217
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Koji KOTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230238219
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE
- Publication number 20230178339
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Kenta KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230106303
- Publication date Apr 6, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230081103
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Kenta KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASUREMENT METHOD
- Publication number 20230066120
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230064817
- Publication date Mar 2, 2023
- Tokyo Electron Limited
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...
- Publication number 20230054452
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230031447
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and control method

Shower plate, plasma processing apparatus and plasma processing method

Plasma processing apparatus

Shower plate, lower dielectric member and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and lower stage

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and control method

Plasma probe device, plasma processing apparatus, and control method

Plasma processing apparatus and control method

Stage, plasma processing apparatus, and plasma processing method

Plasma processing apparatus

Array antenna and plasma processing apparatus

Plasma density monitor, plasma processing apparatus, and plasma pro...

Plasma processing apparatus and control method

Plasma probe device and plasma processing apparatus

Plasma processing apparatus and control method

Antenna and plasma deposition apparatus

Plasma processing apparatus and control method

Plasma processing apparatus and gas introduction mechanism

Plasma processing apparatus and plasma processing method

Microwave plasma source and plasma processing apparatus

Plasma processing device with shower plate having protrusion for su...

Plasma processing apparatus with shower plate having protrusion for...

Microwave plasma source and plasma processing apparatus

Patents Applicationslast 30 patents

Remote Plasma Device and Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS

DISTRIBUTOR AND PLASMA PROCESSING APPARATUS

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CEILING WALL

TUNER, AND IMPEDANCE MATCHING METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA MEASUREMENT METHOD

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS