Tatehito USUI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,131,964
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method and plasma processing apparatus
- Patent number 12,051,574
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,875,978
- Issue date Jan 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and wavelength selection method used in pl...
- Patent number 11,569,135
- Issue date Jan 31, 2023
- HITACHI HIGH-TECH CORPORATION
- Yohei Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,462,416
- Issue date Oct 4, 2022
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,437,289
- Issue date Sep 6, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 11,424,110
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer, method for determining processing control parameter, subs...
- Patent number 11,287,782
- Issue date Mar 29, 2022
- Hitachi, Ltd.
- Takeshi Ohmori
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etching apparatus and etching method and detecting apparatus of fil...
- Patent number 11,239,097
- Issue date Feb 1, 2022
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- G01 - MEASURING TESTING
Information Patent Grant
Substitute sample, method for determining control parameter of proc...
- Patent number 11,152,237
- Issue date Oct 19, 2021
- Hitachi, Ltd.
- Hyakka Nakada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of determining processing condition
- Patent number 11,112,775
- Issue date Sep 7, 2021
- Hitachi, Ltd.
- Hyakka Nakada
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,971,369
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and operation method thereof
- Patent number 10,672,595
- Issue date Jun 2, 2020
- HITACHI HIGH-TECH CORPORATION
- Takeshi Ohmori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,665,516
- Issue date May 26, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,622,269
- Issue date Apr 14, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,453,695
- Issue date Oct 22, 2019
- Hitachi High-Technologies Corporation
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,020,233
- Issue date Jul 10, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operation method thereof
- Patent number 10,008,370
- Issue date Jun 26, 2018
- Hitachi High-Technologies Corporation
- Takeshi Ohmori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operating method of plasma processi...
- Patent number 9,934,946
- Issue date Apr 3, 2018
- Hitachi High-Technologies Corporation
- Yohei Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,865,439
- Issue date Jan 9, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,805,940
- Issue date Oct 31, 2017
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 9,767,997
- Issue date Sep 19, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,741,629
- Issue date Aug 22, 2017
- Hitachi High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,190,336
- Issue date Nov 17, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,747,608
- Issue date Jun 10, 2014
- Hitachi High-Technologies Corporation
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 8,425,786
- Issue date Apr 23, 2013
- Hitachi High-Technologies Corporation
- Makoto Satake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,197,634
- Issue date Jun 12, 2012
- Hitachi High-Technologies Corporation
- Kenetsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,088,247
- Issue date Jan 3, 2012
- Hitachi High-Technologies Corporation
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 8,083,888
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Tatehito Usui
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240213004
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240047239
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230215710
- Publication date Jul 6, 2023
- Hitachi High-Tech Corporation
- Mitsuru Nagasawa
- G01 - MEASURING TESTING
Information Patent Application
WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230118576
- Publication date Apr 20, 2023
- Hitachi High-Tech Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230096723
- Publication date Mar 30, 2023
- Hitachi High-Tech Corporation
- Tsubasa Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220367298
- Publication date Nov 17, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220102226
- Publication date Mar 31, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND WAVELENGTH SELECTION METHOD USED IN PL...
- Publication number 20210249317
- Publication date Aug 12, 2021
- Hitachi High-Tech Corporation
- Yohei Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD AND DETECTING APPARATUS OF FIL...
- Publication number 20210225674
- Publication date Jul 22, 2021
- Hitachi High-Technologies Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200335354
- Publication date Oct 22, 2020
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200328099
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substitute Sample, Method for Determining Control Parameter of Proc...
- Publication number 20200273732
- Publication date Aug 27, 2020
- Hitachi, Ltd
- Hyakka NAKADA
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEM AND METHOD OF DETERMINING PROCESSING CONDITION
- Publication number 20190369605
- Publication date Dec 5, 2019
- Hitachi, Ltd
- Hyakka NAKADA
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190237337
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- G01 - MEASURING TESTING
Information Patent Application
Computer, Method for Determining Processing Control Parameter, Subs...
- Publication number 20190064755
- Publication date Feb 28, 2019
- Hitachi, Ltd
- Takeshi OHMORI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180277377
- Publication date Sep 27, 2018
- Hitachi High-Technologies Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF
- Publication number 20180269042
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180269118
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180122665
- Publication date May 3, 2018
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF
- Publication number 20170372878
- Publication date Dec 28, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170358504
- Publication date Dec 14, 2017
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...
- Publication number 20170178874
- Publication date Jun 22, 2017
- Hitachi High-Technologies Corporation
- Yohei KAWAGUCHI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160351405
- Publication date Dec 1, 2016
- Hitachi High-Technologies Corporation
- Kousuke FUKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160284610
- Publication date Sep 29, 2016
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160211186
- Publication date Jul 21, 2016
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF
- Publication number 20160177449
- Publication date Jun 23, 2016
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150041060
- Publication date Feb 12, 2015
- Hitachi High-Technologies Corporation
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150024521
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF
- Publication number 20150021294
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140295583
- Publication date Oct 2, 2014
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- G01 - MEASURING TESTING

Tatehito USUI

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Wafer processing method and plasma processing apparatus

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and wavelength selection method used in pl...

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and operational method thereof

Computer, method for determining processing control parameter, subs...

Etching apparatus and etching method and detecting apparatus of fil...

Substitute sample, method for determining control parameter of proc...

System and method of determining processing condition

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and operation method thereof

Etching method and plasma processing apparatus

Etching method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and operation method thereof

Plasma processing apparatus and operating method of plasma processi...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and operational method thereof

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma etching method and plasma etching apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

WAFER PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND WAVELENGTH SELECTION METHOD USED IN PL...

ETCHING APPARATUS AND ETCHING METHOD AND DETECTING APPARATUS OF FIL...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

Substitute Sample, Method for Determining Control Parameter of Proc...

SYSTEM AND METHOD OF DETERMINING PROCESSING CONDITION

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Computer, Method for Determining Processing Control Parameter, Subs...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND OPERATION METHOD THEREOF

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD