Tateoki Miyauchi

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Laser cleavage cutting method and system
- Patent number 5,968,382
- Issue date Oct 19, 1999
- Hitachi, Ltd.
- Takashi Matsumoto
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of modifying conductive lines of an electronic circuit board...
- Patent number 5,832,595
- Issue date Nov 10, 1998
- Hitachi, Ltd.
- Shigenobu Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
IC wiring connecting method using focused energy beams
- Patent number 5,824,598
- Issue date Oct 20, 1998
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
IC wiring connecting method and apparatus
- Patent number 5,497,034
- Issue date Mar 5, 1996
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
IC wiring connecting method and apparatus
- Patent number 5,472,507
- Issue date Dec 5, 1995
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser machining apparatus and method of the same
- Patent number 5,229,569
- Issue date Jul 20, 1993
- Hitachi, Ltd.
- Tateoki Miyauchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of cutting interconnection pattern with laser and apparatus...
- Patent number 5,208,437
- Issue date May 4, 1993
- Hitachi, Ltd.
- Tateoki Miyauchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for processing a fine pattern
- Patent number 5,116,782
- Issue date May 26, 1992
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Printed circuit board with a uniform conductive layer formed by equ...
- Patent number 5,023,407
- Issue date Jun 11, 1991
- Hitachi, Ltd.
- Mitugu Shirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for correcting defects of X-ray mask
- Patent number 4,933,565
- Issue date Jun 12, 1990
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion beam processing apparatus and method of correcting mask defects
- Patent number RE33193
- Issue date Apr 3, 1990
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- 250 - Radiant energy
Information Patent Grant
IC wiring connecting method and resulting article
- Patent number 4,868,068
- Issue date Sep 19, 1989
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming film by ion beam
- Patent number 4,687,939
- Issue date Aug 18, 1987
- Hitachi, Ltd.
- Tateoki Miyauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for ion beam work
- Patent number 4,683,378
- Issue date Jul 28, 1987
- Hitachi, Ltd.
- Akira Shimase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for repairing defects on a photo-mask pattern
- Patent number 4,609,566
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Mikio Hongo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting delicate wiring of IC device
- Patent number 4,609,809
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Circuit programming by use of an electrically conductive light shield
- Patent number 4,581,628
- Issue date Apr 8, 1986
- Hitachi, Ltd.
- Tateoki Miyauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for summing several ring-shape laser beams
- Patent number 4,566,765
- Issue date Jan 28, 1986
- Hitachi, Ltd.
- Tateoki Miyauchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask with corrected white defects
- Patent number 4,510,222
- Issue date Apr 9, 1985
- Hitachi, Ltd.
- Masaaki Okunaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion beam processing apparatus and method of correcting mask defects
- Patent number 4,503,329
- Issue date Mar 5, 1985
- Hitachi, Ltd.
- Hiroshi Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for redressing defective photomask
- Patent number 4,463,073
- Issue date Jul 31, 1984
- Hitachi, Ltd.
- Tateoki Miyauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting transparent defects on a photomask
- Patent number 4,444,801
- Issue date Apr 24, 1984
- Hitachi, Ltd.
- Mikio Hongo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tateoki Miyauchi

Person

Patents Grantslast 30 patents

Laser cleavage cutting method and system

Method of modifying conductive lines of an electronic circuit board...

IC wiring connecting method using focused energy beams

IC wiring connecting method and apparatus

IC wiring connecting method and apparatus

Laser machining apparatus and method of the same

Method of cutting interconnection pattern with laser and apparatus...

Method and apparatus for processing a fine pattern

Printed circuit board with a uniform conductive layer formed by equ...

Method and apparatus for correcting defects of X-ray mask

Ion beam processing apparatus and method of correcting mask defects

IC wiring connecting method and resulting article

Method and apparatus for forming film by ion beam

Apparatus for ion beam work

Method and apparatus for repairing defects on a photo-mask pattern

Method and apparatus for correcting delicate wiring of IC device

Circuit programming by use of an electrically conductive light shield

Apparatus for summing several ring-shape laser beams

Photomask with corrected white defects

Ion beam processing apparatus and method of correcting mask defects

Method and apparatus for redressing defective photomask

Method and apparatus for correcting transparent defects on a photomask