Tatsuhiko Higashiki

Person

Fujiswa-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor memory device and method for manufacturing same
- Patent number 9,922,991
- Issue date Mar 20, 2018
- TOSHIBA MEMORY CORPORATION
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection apparatus and pattern inspection method
- Patent number 9,894,271
- Issue date Feb 13, 2018
- TOSHIBA MEMORY CORPORATION
- Ryoji Yoshikawa
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Template manufacturing method, semiconductor device manufacturing m...
- Patent number 8,609,014
- Issue date Dec 17, 2013
- Kabushiki Kaisha Toshiba
- Tsukasa Azuma
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Liquid immersion optical tool, method for cleaning liquid immersion...
- Patent number 8,174,669
- Issue date May 8, 2012
- Kabushiki Kaisha Toshiba
- Tatsuhiko Higashiki
- G02 - OPTICS
Information Patent Grant
Mask pattern correcting method
- Patent number 8,122,385
- Issue date Feb 21, 2012
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Patent number 7,985,958
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device manufacturing method to form resist pattern
- Patent number 7,968,272
- Issue date Jun 28, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for inspecting sample surface
- Patent number 7,952,071
- Issue date May 31, 2011
- Ebara Corporation
- Nobuharu Noji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure processing system, exposure processing method and method f...
- Patent number 7,630,052
- Issue date Dec 8, 2009
- Kabushiki Kaisha Toshiba
- Takuya Kono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aligner evaluation system, aligner evaluation method, a computer pr...
- Patent number 7,546,178
- Issue date Jun 9, 2009
- Kabushiki Kaisha Toshiba
- Takuya Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aligner evaluation system, aligner evaluation method, a computer pr...
- Patent number 7,269,470
- Issue date Sep 11, 2007
- Kabushiki Kaisha Toshiba
- Takuya Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask designing method, pattern predicting method and computer...
- Patent number 7,139,998
- Issue date Nov 21, 2006
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design system of alignment marks for semiconductor manufacture
- Patent number 7,100,146
- Issue date Aug 29, 2006
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Displacement correction apparatus, exposure system, exposure method...
- Patent number 7,046,334
- Issue date May 16, 2006
- Kabushiki Kaisha Toshiba
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a semiconductor device and apparatus for m...
- Patent number 7,018,932
- Issue date Mar 28, 2006
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method and method of manufacturing semiconductor device
- Patent number 6,872,508
- Issue date Mar 29, 2005
- Kabushiki Kaisha Toshiba
- Nobuhiro Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposing method
- Patent number 6,842,230
- Issue date Jan 11, 2005
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 6,813,001
- Issue date Nov 2, 2004
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing system in electronic devices
- Patent number 6,730,447
- Issue date May 4, 2004
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical exposure apparatus of scanning exposure system and its expo...
- Patent number 6,479,201
- Issue date Nov 12, 2002
- Kabushiki Kaisha Toshiba
- Tatsuhiko Higashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration measuring method, aberration measuring system and aberra...
- Patent number 6,437,858
- Issue date Aug 20, 2002
- Kabushiki Kaisha Toshiba
- Takuya Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of electrical measurement of misregistration of patterns
- Patent number 6,288,556
- Issue date Sep 11, 2001
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure apparatus of scanning exposure system and its expo...
- Patent number 6,262,792
- Issue date Jul 17, 2001
- Kabushiki Kaisha Toshiba
- Tatsuhiko Higashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure tool and method capable of correcting high (N-TH) order li...
- Patent number 6,008,880
- Issue date Dec 28, 1999
- Kabushiki Kaisha Toshiba
- Tatsuhiko Higashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20170271363
- Publication date Sep 21, 2017
- KABUSHIKI KAISHA TOSHIBA
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
- Publication number 20160275365
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Ryoji Yoshikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING...
- Publication number 20140232032
- Publication date Aug 21, 2014
- Kabushiki Kaisha Toshiba
- Ryoji Yoshikawa
- G01 - MEASURING TESTING
Information Patent Application
TEMPLATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING M...
- Publication number 20120009799
- Publication date Jan 12, 2012
- Tsukasa AZUMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...
- Publication number 20110229826
- Publication date Sep 22, 2011
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EXPOSING METHOD, EUV EXPOSING APPARATUS, AND EB EXPOSING APPA...
- Publication number 20090305165
- Publication date Dec 10, 2009
- Ryoichi INANAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid Immersion Optical Tool, Method for Cleaning Liquid Immersion...
- Publication number 20090284718
- Publication date Nov 19, 2009
- Kabushiki Kaisha Toshiba
- Tatsuhiko Higashiki
- G02 - OPTICS
Information Patent Application
EXPOSURE METHOD, PHOTO MASK, AND RETICLE STAGE
- Publication number 20090148782
- Publication date Jun 11, 2009
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND OPTICAL APPARATUS
- Publication number 20090141378
- Publication date Jun 4, 2009
- Kazuo TAWARAYAMA
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR INSPECTING SAMPLE SURFACE
- Publication number 20090026368
- Publication date Jan 29, 2009
- Ebara Corporation
- Nobuharu Noji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exposure apparatus, exposure method and optical proximity correctio...
- Publication number 20090004581
- Publication date Jan 1, 2009
- Kazuya Fukuhara
- G02 - OPTICS
Information Patent Application
MASK PATTERN CORRECTING METHOD
- Publication number 20080301621
- Publication date Dec 4, 2008
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD AND LITHOGRAPHY SYSTEM
- Publication number 20080204685
- Publication date Aug 28, 2008
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aligner evaluation system, aligner evaluation method, a computer pr...
- Publication number 20070288113
- Publication date Dec 13, 2007
- Kabushiki Kaisha Toshiba
- Takuya Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method to form resist pattern, a...
- Publication number 20070128554
- Publication date Jun 7, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion exposure apparatus and method of manufacturing semiconduc...
- Publication number 20070096764
- Publication date May 3, 2007
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion optical tool, method for cleaning liquid immersion...
- Publication number 20070039637
- Publication date Feb 22, 2007
- Tatsuhiko Higashiki
- G02 - OPTICS
Information Patent Application
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Publication number 20060151721
- Publication date Jul 13, 2006
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Liquid immersion optical tool, method for cleaning liquid immersion...
- Publication number 20060050351
- Publication date Mar 9, 2006
- Tatsuhiko Higashiki
- G02 - OPTICS
Information Patent Application
Exposure system and method for manufacturing semiconductor device
- Publication number 20060001846
- Publication date Jan 5, 2006
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure processing system, exposure processing method and method f...
- Publication number 20050170262
- Publication date Aug 4, 2005
- Takuya Kono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Displacement correction apparatus, exposure system, exposure method...
- Publication number 20040227916
- Publication date Nov 18, 2004
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design system of alignment marks for semiconductor manufacture
- Publication number 20040207856
- Publication date Oct 21, 2004
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing system in electronic devices
- Publication number 20040168632
- Publication date Sep 2, 2004
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photomask designing method, pattern predicting method and computer...
- Publication number 20040133872
- Publication date Jul 8, 2004
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aligner evaluation system, aligner evaluation method, a computer pr...
- Publication number 20040088071
- Publication date May 6, 2004
- Takuya Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing a semiconductor device and apparatus for m...
- Publication number 20040033448
- Publication date Feb 19, 2004
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposing method
- Publication number 20030117599
- Publication date Jun 26, 2003
- Kabushiki Kaisha Toshiba
- Manabu Takakuwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and apparatus
- Publication number 20030090640
- Publication date May 15, 2003
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and method of manufacturing semiconductor device
- Publication number 20030016341
- Publication date Jan 23, 2003
- Nobuhiro Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tatsuhiko Higashiki

Person

Patents Grantslast 30 patents

Semiconductor memory device and method for manufacturing same

Pattern inspection apparatus and pattern inspection method

Template manufacturing method, semiconductor device manufacturing m...

Liquid immersion optical tool, method for cleaning liquid immersion...

Mask pattern correcting method

Electron beam drawing apparatus, deflection amplifier, deflection c...

Semiconductor device manufacturing method to form resist pattern

Apparatus and method for inspecting sample surface

Exposure processing system, exposure processing method and method f...

Aligner evaluation system, aligner evaluation method, a computer pr...

Aligner evaluation system, aligner evaluation method, a computer pr...

Photomask designing method, pattern predicting method and computer...

Design system of alignment marks for semiconductor manufacture

Displacement correction apparatus, exposure system, exposure method...

Method for manufacturing a semiconductor device and apparatus for m...

Exposure method and method of manufacturing semiconductor device

Exposing method

Exposure method and apparatus

Manufacturing system in electronic devices

Optical exposure apparatus of scanning exposure system and its expo...

Aberration measuring method, aberration measuring system and aberra...

Method of electrical measurement of misregistration of patterns

Optical exposure apparatus of scanning exposure system and its expo...

Exposure tool and method capable of correcting high (N-TH) order li...

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME

PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING...

TEMPLATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING M...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...

WAFER EXPOSING METHOD, EUV EXPOSING APPARATUS, AND EB EXPOSING APPA...

Liquid Immersion Optical Tool, Method for Cleaning Liquid Immersion...

EXPOSURE METHOD, PHOTO MASK, AND RETICLE STAGE

OPTICAL ELEMENT AND OPTICAL APPARATUS

APPARATUS AND METHOD FOR INSPECTING SAMPLE SURFACE

Exposure apparatus, exposure method and optical proximity correctio...

MASK PATTERN CORRECTING METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD AND LITHOGRAPHY SYSTEM

Aligner evaluation system, aligner evaluation method, a computer pr...

Semiconductor device manufacturing method to form resist pattern, a...

Immersion exposure apparatus and method of manufacturing semiconduc...

Liquid immersion optical tool, method for cleaning liquid immersion...

Electron beam drawing apparatus, deflection amplifier, deflection c...

Liquid immersion optical tool, method for cleaning liquid immersion...

Exposure system and method for manufacturing semiconductor device

Exposure processing system, exposure processing method and method f...

Displacement correction apparatus, exposure system, exposure method...

Design system of alignment marks for semiconductor manufacture

Manufacturing system in electronic devices

Photomask designing method, pattern predicting method and computer...

Aligner evaluation system, aligner evaluation method, a computer pr...

Method for manufacturing a semiconductor device and apparatus for m...

Exposing method

Exposure method and apparatus

Exposure method and method of manufacturing semiconductor device