Tatsuhiko Koide

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method and a s...
- Patent number 11,929,250
- Issue date Mar 12, 2024
- Kioxia Corporation
- Katsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,921,428
- Issue date Mar 5, 2024
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and manufacturing method of s...
- Patent number 11,862,484
- Issue date Jan 2, 2024
- Kioxia Corporation
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate, method of manufacturing semiconductor devi...
- Patent number 11,616,120
- Issue date Mar 28, 2023
- Kioxia Corporation
- Fuyuma Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 10,714,328
- Issue date Jul 14, 2020
- TOSHIBA MEMORY CORPORATION
- Tomonori Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment apparatus and method for semiconductor substrate
- Patent number 10,573,508
- Issue date Feb 25, 2020
- TOSHIBA MEMORY CORPORATION
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 10,453,729
- Issue date Oct 22, 2019
- TOSHIBA MEMORY CORPORATION
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 10,290,491
- Issue date May 14, 2019
- TOSHIBA MEMORY CORPORATION
- Shinsuke Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of treating surface of semiconductor substrate
- Patent number 9,991,111
- Issue date Jun 5, 2018
- TOSHIBA MEMORY CORPORATION
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of treating surface of semiconductor substrate
- Patent number 9,859,111
- Issue date Jan 2, 2018
- TOSHIBA MEMORY CORPORATION
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 9,748,091
- Issue date Aug 29, 2017
- TOSHIBA MEMORY CORPORATION
- Shinsuke Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,213,242
- Issue date Dec 15, 2015
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor substrate surface treatment method
- Patent number 8,435,903
- Issue date May 7, 2013
- Kabushiki Kaisha Toshiba
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,399,357
- Issue date Mar 19, 2013
- Kabushiki Kaisha Toshiba
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,097,538
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Tatsuhiko Koide
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of treating a semiconductor substrate
- Patent number 7,985,683
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of treating surface of semiconductor substrate
- Patent number 7,838,425
- Issue date Nov 23, 2010
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of treating a semiconductor substrate
- Patent number 7,749,909
- Issue date Jul 6, 2010
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...
- Publication number 20240087918
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230307265
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Takaumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230301079
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Naomi Yanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...
- Publication number 20230207616
- Publication date Jun 29, 2023
- Kioxia Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND A S...
- Publication number 20230089765
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Katsuhiro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...
- Publication number 20220406626
- Publication date Dec 22, 2022
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...
- Publication number 20220310401
- Publication date Sep 29, 2022
- KIOXIA Corporation
- Hakuba KITAGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220181171
- Publication date Jun 9, 2022
- KIOXIA Corporation
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...
- Publication number 20220085153
- Publication date Mar 17, 2022
- KIOXIA Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF S...
- Publication number 20200251356
- Publication date Aug 6, 2020
- Toshiba Memory Corporation
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190214277
- Publication date Jul 11, 2019
- Toshiba Memory Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20190080947
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20190074171
- Publication date Mar 7, 2019
- Toshiba Memory Corporation
- Tomonori Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20180082832
- Publication date Mar 22, 2018
- Toshiba Memory Corporation
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20170338102
- Publication date Nov 23, 2017
- Toshiba Memory Corporation
- Shinsuke KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20160293400
- Publication date Oct 6, 2016
- KABUSHIKI KAISHA TOSHIBA
- Shinsuke KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160071747
- Publication date Mar 10, 2016
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20160049289
- Publication date Feb 18, 2016
- Kabushiki Kaisha Toshiba
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20150371845
- Publication date Dec 24, 2015
- Kabushiki Kaisha Toshiba
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE AND APPARATUS FOR CLEANI...
- Publication number 20150034130
- Publication date Feb 5, 2015
- KABUSHIKI KAISHA TOSHIBA
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF S...
- Publication number 20140213064
- Publication date Jul 31, 2014
- KABUSHIKI KAISHA TOSHIBA
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130196512
- Publication date Aug 1, 2013
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130008868
- Publication date Jan 10, 2013
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120088357
- Publication date Apr 12, 2012
- Yoshihiro OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SURFACE TREATMENT METHOD
- Publication number 20110269313
- Publication date Nov 3, 2011
- Yoshihiro OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS
- Publication number 20110220152
- Publication date Sep 15, 2011
- Yukiko KITAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20110143541
- Publication date Jun 16, 2011
- Yoshihiro OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20110143545
- Publication date Jun 16, 2011
- Hisashi Okuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20110139192
- Publication date Jun 16, 2011
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100267233
- Publication date Oct 21, 2010
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS

Tatsuhiko Koide

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method and a s...

Substrate processing method and substrate processing apparatus

Semiconductor manufacturing apparatus and manufacturing method of s...

Semiconductor substrate, method of manufacturing semiconductor devi...

Semiconductor manufacturing apparatus and method of manufacturing s...

Surface treatment apparatus and method for semiconductor substrate

Substrate treatment apparatus and substrate treatment method

Substrate treatment apparatus and substrate treatment method

Apparatus and method of treating surface of semiconductor substrate

Apparatus and method of treating surface of semiconductor substrate

Substrate treatment apparatus and substrate treatment method

Substrate processing method and substrate processing apparatus

Semiconductor substrate surface treatment method

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Method of treating a semiconductor substrate

Method of treating surface of semiconductor substrate

Method of treating a semiconductor substrate

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND A S...

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...

CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVI...

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF S...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE

METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE AND APPARATUS FOR CLEANI...

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF S...

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR SUBSTRATE SURFACE TREATMENT METHOD

SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE