Tatsuo Abe

Person

Fukushima, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for cleaning silicon wafer
- Patent number 11,878,329
- Issue date Jan 23, 2024
- Shin-Etsu Handotai Co., Ltd.
- Kensaku Igarashi
- B08 - CLEANING
Information Patent Grant
Method for evaluating silicon wafer and method for manufacturing si...
- Patent number 11,222,780
- Issue date Jan 11, 2022
- Shin-Etsu Handotai Co., Ltd.
- Kensaku Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor wafer
- Patent number 11,177,125
- Issue date Nov 16, 2021
- Shin-Etsu Handotai Co., Ltd.
- Kensaku Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor wafer
- Patent number 11,094,525
- Issue date Aug 17, 2021
- Shin-Etsu Handotai Co., Ltd.
- Kensaku Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor wafer
- Patent number 9,082,610
- Issue date Jul 14, 2015
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water and method for storing silicon wafer
- Patent number 8,303,722
- Issue date Nov 6, 2012
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrasonic cleaning apparatus and ultrasonic cleaning method
- Patent number 8,083,856
- Issue date Dec 27, 2011
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- B08 - CLEANING
Information Patent Grant
Substrate processing method and processing apparatus
- Patent number 6,374,834
- Issue date Apr 23, 2002
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for etching wafer
- Patent number 5,914,281
- Issue date Jun 22, 1999
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING HETEROEPITAXIAL WAFER
- Publication number 20240429046
- Publication date Dec 26, 2024
- Shin-Etsu Handotai Co., Ltd.
- Toshiki MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL WAFER AND PRODUCTION METHOD THEREFOR
- Publication number 20240395563
- Publication date Nov 28, 2024
- Shin-Etsu Handotai Co., Ltd.
- Atsushi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AN...
- Publication number 20240274477
- Publication date Aug 15, 2024
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER MANUFACTURING METHOD
- Publication number 20240203745
- Publication date Jun 20, 2024
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING SILICON WAFER, METHOD OF MANUFACTURING SILICON W...
- Publication number 20240120192
- Publication date Apr 11, 2024
- Shin-Etsu Handotai Co., Ltd.
- Kota FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE
- Publication number 20230268175
- Publication date Aug 24, 2023
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRY-ETCHING SEMICONDUCTOR SUBSTRATE AND METHOD FOR DRY-E...
- Publication number 20230207399
- Publication date Jun 29, 2023
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE
- Publication number 20230170208
- Publication date Jun 1, 2023
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi OHTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR POLISHING WAFER
- Publication number 20230137813
- Publication date May 4, 2023
- Shin-Etsu Handotai Co., Ltd.
- Masaaki OSEKI
- B24 - GRINDING POLISHING
Information Patent Application
WAFER TREATMENT APPARATUS AND METHOD FOR TREATING WAFER
- Publication number 20210013031
- Publication date Jan 14, 2021
- Shin-Etsu Handotai Co., Ltd.
- Kensaku IGARASHI
- B08 - CLEANING
Information Patent Application
METHOD FOR EVALUATING SILICON WAFER AND METHOD FOR MANUFACTURING SI...
- Publication number 20200203233
- Publication date Jun 25, 2020
- Shin-Etsu Handotai Co., Ltd.
- Kensaku IGARASHI
- B08 - CLEANING
Information Patent Application
METHOD FOR CLEANING SILICON WAFER
- Publication number 20200164410
- Publication date May 28, 2020
- Shin-Etsu Handotai Co., Ltd.
- Kensaku IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER
- Publication number 20200105517
- Publication date Apr 2, 2020
- Shin-Etsu Handotai Co., Ltd.
- Kensaku IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER
- Publication number 20200027721
- Publication date Jan 23, 2020
- Shin-Etsu Handotai Co., Ltd.
- Kensaku IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRASONIC CLEANING APPARATUS AND METHOD FOR CLEANING
- Publication number 20160067749
- Publication date Mar 10, 2016
- Shin-Etsu Handotai Co., Ltd.
- Hitoshi KABASAWA
- B08 - CLEANING
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER
- Publication number 20150053234
- Publication date Feb 26, 2015
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER
- Publication number 20140048100
- Publication date Feb 20, 2014
- Shin-Etsu Handotai Co., Ltd.
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER
- Publication number 20130233344
- Publication date Sep 12, 2013
- Shin-Etsu Handotai Co., Ltd.
- Hitoshi Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRASONIC CLEANING APPARATUS AND ULTRASONIC CLEANING METHOD
- Publication number 20100294305
- Publication date Nov 25, 2010
- SHIN-ETSU HANDOTAI CO., LTD
- Tatsuo Abe
- B08 - CLEANING
Information Patent Application
Water and method for storing silicon wafer
- Publication number 20030139067
- Publication date Jul 24, 2003
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Water for storing silicon wafers and storing method
- Publication number 20030036570
- Publication date Feb 20, 2003
- Tatsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for cleaning silicon wafer

Method for evaluating silicon wafer and method for manufacturing si...

Method for cleaning semiconductor wafer

Method for cleaning semiconductor wafer

Method for cleaning semiconductor wafer

Water and method for storing silicon wafer

Ultrasonic cleaning apparatus and ultrasonic cleaning method

Substrate processing method and processing apparatus

Apparatus for etching wafer

Patents Applicationslast 30 patents

METHOD FOR PRODUCING HETEROEPITAXIAL WAFER

EPITAXIAL WAFER AND PRODUCTION METHOD THEREFOR

METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AN...

SILICON WAFER MANUFACTURING METHOD

METHOD OF CLEANING SILICON WAFER, METHOD OF MANUFACTURING SILICON W...

METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE

METHOD FOR DRY-ETCHING SEMICONDUCTOR SUBSTRATE AND METHOD FOR DRY-E...

METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE

METHOD AND APPARATUS FOR POLISHING WAFER

WAFER TREATMENT APPARATUS AND METHOD FOR TREATING WAFER

METHOD FOR EVALUATING SILICON WAFER AND METHOD FOR MANUFACTURING SI...

METHOD FOR CLEANING SILICON WAFER

METHOD FOR CLEANING SEMICONDUCTOR WAFER

METHOD FOR CLEANING SEMICONDUCTOR WAFER

ULTRASONIC CLEANING APPARATUS AND METHOD FOR CLEANING

METHOD FOR CLEANING SEMICONDUCTOR WAFER

METHOD FOR CLEANING SEMICONDUCTOR WAFER

METHOD FOR CLEANING SEMICONDUCTOR WAFER

ULTRASONIC CLEANING APPARATUS AND ULTRASONIC CLEANING METHOD

Water and method for storing silicon wafer

Water for storing silicon wafers and storing method