Tatsuo Matsudo

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming apparatus
- Patent number 12,027,344
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shinya Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device, and plasma processing method
- Patent number 12,020,900
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Munehito Kagaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,443,920
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,410,834
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Keiichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,328,904
- Issue date May 10, 2022
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,765
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,937,631
- Issue date Mar 2, 2021
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wear amount measuring apparatus and method, temperature measuring a...
- Patent number 10,746,531
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,734,201
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,685,859
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 10,325,758
- Issue date Jun 18, 2019
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,283,328
- Issue date May 7, 2019
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wear amount measuring apparatus and method, temperature measuring a...
- Patent number 10,184,786
- Issue date Jan 22, 2019
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Temperature measuring method, substrate processing system and compo...
- Patent number 9,952,032
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement apparatus and method
- Patent number 9,500,537
- Issue date Nov 22, 2016
- Tokyo Electron Limited
- Jun Abe
- G01 - MEASURING TESTING
Information Patent Grant
Heat-flux measuring method, substrate processing system, and heat-f...
- Patent number 9,459,159
- Issue date Oct 4, 2016
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitive coupling plasma processing apparatus
- Patent number 9,412,562
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement apparatus and method
- Patent number 9,304,050
- Issue date Apr 5, 2016
- Tokyo Electron Limited
- Jun Abe
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for measuring thickness and temperature and su...
- Patent number 9,163,931
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Measuring apparatus and plasma processing apparatus
- Patent number 9,070,725
- Issue date Jun 30, 2015
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Temperature measuring system, substrate processing apparatus and te...
- Patent number 9,046,417
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Capacitive coupling plasma processing apparatus
- Patent number 9,038,566
- Issue date May 26, 2015
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring temperature of component in processing chamber...
- Patent number 9,028,139
- Issue date May 12, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and temperature measuring method
- Patent number 9,022,645
- Issue date May 5, 2015
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Temperature control system including sub-chiller
- Patent number 9,019,505
- Issue date Apr 28, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and temperature measuring method and ap...
- Patent number 8,986,494
- Issue date Mar 24, 2015
- Tokyo Electron Limited
- Tatsuo Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Focus ring heating method, plasma etching apparatus, and plasma etc...
- Patent number 8,858,753
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Temperature measuring method, storage medium, and program
- Patent number 8,825,434
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Chishio Koshimizu
- G01 - MEASURING TESTING
Information Patent Grant
Method for heating part in processing chamber of semiconductor manu...
- Patent number 8,824,875
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Jun Yamawaku
- F27 - FURNACES KILNS OVENS RETORTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240331977
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, HIGH-FREQUENCY POWER SUPPLY CIRCUIT, AND...
- Publication number 20240120179
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Masaharu SHIRATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE
- Publication number 20230411118
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
- Publication number 20230307215
- Publication date Sep 28, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20230250530
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Takamichi KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230230809
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230167554
- Publication date Jun 1, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20230051432
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20220165544
- Publication date May 26, 2022
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020568
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20210280394
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Keiichi TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT SYSTEM, TEMPERATURE MEASUREMENT METHOD, AND...
- Publication number 20210151285
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- G01 - MEASURING TESTING
Information Patent Application
Substrate Processing Apparatus
- Publication number 20200321195
- Publication date Oct 8, 2020
- TOKYO ELECTRON LIMITED
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200144026
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20190385815
- Publication date Dec 19, 2019
- TOKYO ELECTRON LIMITED
- Shinya IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190221405
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WEAR AMOUNT MEASURING APPARATUS AND METHOD, TEMPERATURE MEASURING A...
- Publication number 20190137260
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190115188
- Publication date Apr 18, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190108975
- Publication date Apr 11, 2019
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASURING METHOD, SUBSTRATE PROCESSING SYSTEM AND COMPO...
- Publication number 20180231369
- Publication date Aug 16, 2018
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180061681
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170256382
- Publication date Sep 7, 2017
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT APPARATUS AND METHOD
- Publication number 20160195436
- Publication date Jul 7, 2016
- TOKYO ELECTRON LIMITED
- Jun ABE
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160126064
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126065
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS
- Publication number 20150221478
- Publication date Aug 6, 2015
- TOKYO ELECTRON LIMITED
- Shinji HIMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-FLUX MEASURING METHOD, SUBSTRATE PROCESSING SYSTEM, AND HEAT-F...
- Publication number 20150185092
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR MEASURING THICKNESS AND TEMPERATURE AND SU...
- Publication number 20150176974
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- G01 - MEASURING TESTING
Information Patent Application
WEAR AMOUNT MEASURING APPARATUS AND METHOD, TEMPERATURE MEASURING A...
- Publication number 20150168130
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Tatsuo MATSUDO
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150170882
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tatsuo Matsudo

Person

Patents Grantslast 30 patents

Film forming apparatus

Plasma processing device, and plasma processing method

Temperature measurement system, temperature measurement method, and...

Plasma processing apparatus

Substrate processing method

Substrate processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Wear amount measuring apparatus and method, temperature measuring a...

Substrate processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Wear amount measuring apparatus and method, temperature measuring a...

Temperature measuring method, substrate processing system and compo...

Temperature measurement apparatus and method

Heat-flux measuring method, substrate processing system, and heat-f...

Capacitive coupling plasma processing apparatus

Temperature measurement apparatus and method

Apparatus and method for measuring thickness and temperature and su...

Measuring apparatus and plasma processing apparatus

Temperature measuring system, substrate processing apparatus and te...

Capacitive coupling plasma processing apparatus

Method of measuring temperature of component in processing chamber...

Plasma processing apparatus and temperature measuring method

Temperature control system including sub-chiller

Plasma processing apparatus and temperature measuring method and ap...

Focus ring heating method, plasma etching apparatus, and plasma etc...

Temperature measuring method, storage medium, and program

Method for heating part in processing chamber of semiconductor manu...

Patents Applicationslast 30 patents

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE, HIGH-FREQUENCY POWER SUPPLY CIRCUIT, AND...

PLASMA TREATMENT DEVICE

PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FILM FORMING APPARATUS

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

TEMPERATURE MEASUREMENT SYSTEM, TEMPERATURE MEASUREMENT METHOD, AND...

Substrate Processing Apparatus

PLASMA PROCESSING APPARATUS

FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

WEAR AMOUNT MEASURING APPARATUS AND METHOD, TEMPERATURE MEASURING A...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

TEMPERATURE MEASURING METHOD, SUBSTRATE PROCESSING SYSTEM AND COMPO...

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

TEMPERATURE MEASUREMENT APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS

HEAT-FLUX MEASURING METHOD, SUBSTRATE PROCESSING SYSTEM, AND HEAT-F...

APPARATUS AND METHOD FOR MEASURING THICKNESS AND TEMPERATURE AND SU...

WEAR AMOUNT MEASURING APPARATUS AND METHOD, TEMPERATURE MEASURING A...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD