Tatsuro MASUYAMA

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,174,537
- Issue date Dec 24, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,947,257
- Issue date Apr 2, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 11,822,244
- Issue date Nov 21, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 11,815,813
- Issue date Nov 14, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, carboxylic acid generator, resist composition and meth...
- Patent number 11,739,056
- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resist composition and method for producing resist pattern
- Patent number 11,681,218
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, photoresist composition and process for producing...
- Patent number 11,474,431
- Issue date Oct 18, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,467,490
- Issue date Oct 11, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,366,387
- Issue date Jun 21, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and process for producing photoresist pattern
- Patent number 11,327,399
- Issue date May 10, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,261,273
- Issue date Mar 1, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 11,214,635
- Issue date Jan 4, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,198,748
- Issue date Dec 14, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,975,028
- Issue date Apr 13, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,882,839
- Issue date Jan 5, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,816,902
- Issue date Oct 27, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, photoresist composition and process for producing...
- Patent number 10,781,198
- Issue date Sep 22, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 10,774,029
- Issue date Sep 15, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 10,725,380
- Issue date Jul 28, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,670,963
- Issue date Jun 2, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition
- Patent number 10,564,544
- Issue date Feb 18, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing photoresist pattern and photoresist composition
- Patent number 10,520,810
- Issue date Dec 31, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 10,209,618
- Issue date Feb 19, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and process of producing photoresist pattern
- Patent number 10,168,616
- Issue date Jan 1, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic compound, resin, resist composition and method for produc...
- Patent number 10,073,343
- Issue date Sep 11, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,047,046
- Issue date Aug 14, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,971,241
- Issue date May 15, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,869,930
- Issue date Jan 16, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,869,929
- Issue date Jan 16, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,822,060
- Issue date Nov 21, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20210389669
- Publication date Dec 16, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20210389672
- Publication date Dec 16, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METH...
- Publication number 20210263416
- Publication date Aug 26, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20210255545
- Publication date Aug 19, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20200231720
- Publication date Jul 23, 2020
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20200096866
- Publication date Mar 26, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20200057369
- Publication date Feb 20, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200010594
- Publication date Jan 9, 2020
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20190369490
- Publication date Dec 5, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20190292287
- Publication date Sep 26, 2019
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20190250508
- Publication date Aug 15, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20190112265
- Publication date Apr 18, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20190112286
- Publication date Apr 18, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20190025698
- Publication date Jan 24, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20190011837
- Publication date Jan 10, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...
- Publication number 20180373146
- Publication date Dec 27, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...
- Publication number 20180354927
- Publication date Dec 13, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20180348632
- Publication date Dec 6, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20180259851
- Publication date Sep 13, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20170329223
- Publication date Nov 16, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION
- Publication number 20170329224
- Publication date Nov 16, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20170329219
- Publication date Nov 16, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20170247323
- Publication date Aug 31, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20160244400
- Publication date Aug 25, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20160237190
- Publication date Aug 18, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20160170300
- Publication date Jun 16, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20160145186
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160147146
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20160139508
- Publication date May 19, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160131975
- Publication date May 12, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tatsuro MASUYAMA

Person

Patents Grantslast 30 patents

Salt, acid generator, resist composition and method for producing r...

Salt, acid generator, resist composition and method for producing r...

Compound, resin, resist composition and method for producing resist...

Compound, resin, resist composition and method for producing resist...

Carboxylate, carboxylic acid generator, resist composition and meth...

Compound, resist composition and method for producing resist pattern

Compound, resin, photoresist composition and process for producing...

Salt, acid generator, resist composition and method for producing r...

Salt, acid generator, resist composition and method for producing r...

Photoresist composition and process for producing photoresist pattern

Resin, resist composition and method for producing resist pattern

Compound, resin, resist composition and method for producing resist...

Resin, resist composition and method for producing resist pattern

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Compound, resin, photoresist composition and process for producing...

Compound, resin, resist composition and method for producing resist...

Compound, resin, resist composition and method for producing resist...

Salt and photoresist composition containing the same

Photoresist composition

Process for producing photoresist pattern and photoresist composition

Photoresist composition

Photoresist composition and process of producing photoresist pattern

Non-ionic compound, resin, resist composition and method for produc...

Salt and photoresist composition containing the same

Compound, resin, resist composition and method for producing resist...

Compound, resin, resist composition and method for producing resist...

Resin, resist composition and method for producing resist pattern

Compound, resin, resist composition and method for producing resist...

Patents Applicationslast 30 patents

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METH...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...

COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...

PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PHOTORESIST COMPOSITION

PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN