Tatsuro OHSHITA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,136,535
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Tatsuro Ohshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust device for processing apparatus provided with multiple blades
- Patent number 11,315,770
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,170,979
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,133,157
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,553,407
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,297,428
- Issue date May 21, 2019
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method
- Patent number 9,978,566
- Issue date May 22, 2018
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vaporizing unit, film forming apparatus, film forming method, compu...
- Patent number 9,343,295
- Issue date May 17, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 9,252,001
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 8,636,871
- Issue date Jan 28, 2014
- Tokyo Electron Limited
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
- Publication number 20230411128
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220139672
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD
- Publication number 20210296102
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200126770
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
- Publication number 20190333744
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190333741
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190244794
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD
- Publication number 20190172689
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190122863
- Publication date Apr 25, 2019
- TOKYO ELECTRON LIMITED
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190057845
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20170103877
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150332898
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus, Plasma Processing Method and Storage M...
- Publication number 20140138356
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20100297346
- Publication date Nov 25, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20100006543
- Publication date Jan 14, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS

Tatsuro OHSHITA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and power supply control method

Exhaust device for processing apparatus provided with multiple blades

Plasma etching method and plasma etching apparatus

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Plasma etching method

Vaporizing unit, film forming apparatus, film forming method, compu...

Plasma processing apparatus, plasma processing method and storage m...

Plasma processing apparatus, plasma processing method and storage m...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus, Plasma Processing Method and Storage M...

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...