Tatsushi KANEKO

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,579,529
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Matsui
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 8,921,025
- Issue date Dec 30, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tatsushi Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process using the same
- Patent number 7,771,913
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tatsushi Kaneko
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,368,218
- Issue date May 6, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,255,973
- Issue date Aug 14, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoacid generators, chemically amplified resist compositions, and...
- Patent number 7,235,343
- Issue date Jun 26, 2007
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition and patterning method
- Patent number 6,511,785
- Issue date Jan 28, 2003
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist compositions and patterning method
- Patent number 6,395,453
- Issue date May 28, 2002
- Shin-Etsu Chemical Co., Ltd.
- Tatsushi Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silacyclohexane compounds, preparation thereof, liquid crystal comp...
- Patent number 6,004,478
- Issue date Dec 21, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid crystal composition and liquid crystal display element compr...
- Patent number 5,980,778
- Issue date Nov 9, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid crystal compositions comprising silacyclohexane compounds
- Patent number 5,951,913
- Issue date Sep 14, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silacyclohexane compound, a method of preparing it and a liquid cry...
- Patent number 5,868,961
- Issue date Feb 9, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid crystal compositions and liquid crystal display elements con...
- Patent number 5,866,037
- Issue date Feb 2, 1999
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Twisted nematic liquid crystal composition containing a silacyclohe...
- Patent number 5,851,426
- Issue date Dec 22, 1998
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid crystal composition and a liquid crystal display element whi...
- Patent number 5,762,826
- Issue date Jun 9, 1998
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Guest host liquid crystal composition
- Patent number 5,755,995
- Issue date May 26, 1998
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Optically active silacyclohexane compounds, liquid crystal composit...
- Patent number 5,730,902
- Issue date Mar 24, 1998
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, preparation thereof liquid crystal compo...
- Patent number 5,730,901
- Issue date Mar 24, 1998
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compound, a process for producing the same, and a l...
- Patent number 5,725,797
- Issue date Mar 10, 1998
- Shin-Etsu Chemical Co., Ltd.
- Kazuyuki Asakura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cyclohexanone compounds, process for preparing the same, and proces...
- Patent number 5,693,841
- Issue date Dec 2, 1997
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compound, a method of preparing it and a liquid cry...
- Patent number 5,679,746
- Issue date Oct 21, 1997
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, preparation thereof, liquid crystal comp...
- Patent number 5,665,271
- Issue date Sep 9, 1997
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compound, a method of preparing it and a liquid cry...
- Patent number 5,659,059
- Issue date Aug 19, 1997
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, a liquid crystal composition comprising...
- Patent number 5,650,092
- Issue date Jul 22, 1997
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, preparation thereof, liquid crystal comp...
- Patent number 5,641,430
- Issue date Jun 24, 1997
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, a liquid crystal composition comprising...
- Patent number 5,624,601
- Issue date Apr 29, 1997
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compounds, a liquid crystal composition comprising...
- Patent number 5,595,686
- Issue date Jan 21, 1997
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compound, a method of preparing it and a liquid cry...
- Patent number 5,582,764
- Issue date Dec 10, 1996
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Triflate compounds and process for preparing silacyclohexane-based...
- Patent number 5,582,765
- Issue date Dec 10, 1996
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silacyclohexane compound, a method of preparing it and a liquid cry...
- Patent number 5,578,244
- Issue date Nov 26, 1996
- Shin-Etsu Chemical Co., Ltd.
- Takaaki Shimizu
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200285152
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Matsui
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
- Publication number 20100310986
- Publication date Dec 9, 2010
- Tatsushi KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process using the same
- Publication number 20070231738
- Publication date Oct 4, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tatsushi Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20050227173
- Publication date Oct 13, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20050227174
- Publication date Oct 13, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generators, chemically amplified resist compositions, and...
- Publication number 20040229162
- Publication date Nov 18, 2004
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY

Tatsushi KANEKO

Person

Patents Grantslast 30 patents

Positive resist composition and patterning process

Positive resist compositions and patterning process

Resist composition and patterning process using the same

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Photoacid generators, chemically amplified resist compositions, and...

Chemically amplified positive resist composition and patterning method

Photoresist compositions and patterning method

Silacyclohexane compounds, preparation thereof, liquid crystal comp...

Liquid crystal composition and liquid crystal display element compr...

Liquid crystal compositions comprising silacyclohexane compounds

Silacyclohexane compound, a method of preparing it and a liquid cry...

Liquid crystal compositions and liquid crystal display elements con...

Twisted nematic liquid crystal composition containing a silacyclohe...

Liquid crystal composition and a liquid crystal display element whi...

Guest host liquid crystal composition

Optically active silacyclohexane compounds, liquid crystal composit...

Silacyclohexane compounds, preparation thereof liquid crystal compo...

Silacyclohexane compound, a process for producing the same, and a l...

Cyclohexanone compounds, process for preparing the same, and proces...

Silacyclohexane compound, a method of preparing it and a liquid cry...

Silacyclohexane compounds, preparation thereof, liquid crystal comp...

Silacyclohexane compound, a method of preparing it and a liquid cry...

Silacyclohexane compounds, a liquid crystal composition comprising...

Silacyclohexane compounds, preparation thereof, liquid crystal comp...

Silacyclohexane compounds, a liquid crystal composition comprising...

Silacyclohexane compounds, a liquid crystal composition comprising...

Silacyclohexane compound, a method of preparing it and a liquid cry...

Triflate compounds and process for preparing silacyclohexane-based...

Silacyclohexane compound, a method of preparing it and a liquid cry...

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

Resist composition and patterning process using the same

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Photoacid generators, chemically amplified resist compositions, and...