Tatsuya HANDA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,896,210
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Masaru Nishino
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus and electrode structure
- Patent number 8,758,551
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Tatsuya Handa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrode structure
- Patent number 8,480,849
- Issue date Jul 9, 2013
- Tokyo Electron Limited
- Tatsuya Handa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrode structure
- Patent number 8,282,770
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Tatsuya Handa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming equipment and film forming method
- Patent number 7,718,005
- Issue date May 18, 2010
- Tokyo Electron Limited
- Tatsuya Handa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS TREATMENT APPARATUS
- Publication number 20220301821
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Yuji SAEGUSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE
- Publication number 20130276982
- Publication date Oct 24, 2013
- Tatsuya HANDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20130162142
- Publication date Jun 27, 2013
- TOCALO CO., LTD.
- Masaru NISHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE
- Publication number 20130008606
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Tatsuya HANDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100041240
- Publication date Feb 18, 2010
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE
- Publication number 20080223523
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Tatsuya HANDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Forming Equipment and Film Forming Method
- Publication number 20070254101
- Publication date Nov 1, 2007
- Tokyo Electron Limited
- Tatsuya Handa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Treating device
- Publication number 20040020599
- Publication date Feb 5, 2004
- Sumi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tatsuya HANDA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and method

Substrate processing apparatus and electrode structure

Substrate processing apparatus and electrode structure

Substrate processing apparatus and electrode structure

Film forming equipment and film forming method

Patents Applicationslast 30 patents

GAS TREATMENT APPARATUS

SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE

PLASMA PROCESSING APPARATUS AND METHOD

SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE

FOCUS RING, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND ELECTRODE STRUCTURE

Film Forming Equipment and Film Forming Method

Treating device