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Tatsuya Ichikawa
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Ibaraki, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive element, method for formation of resist pattern, and...
Patent number
8,501,392
Issue date
Aug 6, 2013
Hitachi Chemical Company, Ltd.
Manabu Saitou
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive element, photosensitive element roll, process for th...
Patent number
7,592,124
Issue date
Sep 22, 2009
Hitachi Chemical Co., Ltd.
Tasuo Chiba
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photosensitive element, method for forming resist pattern, and meth...
Patent number
7,078,151
Issue date
Jul 18, 2006
Hitachi Chemical Co., Ltd.
Tomoaki Aoki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive film for circuit formation and process for producing...
Patent number
7,067,226
Issue date
Jun 27, 2006
Hitachi Chemical Co., Ltd.
Masao Kubota
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition and photosensitive element using t...
Patent number
6,555,290
Issue date
Apr 29, 2003
Hitachi Chemical Co., Ltd.
Tatsuya Ichikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition and photosensitive element using t...
Patent number
6,228,560
Issue date
May 8, 2001
Hitachi Chemical Company, Ltd.
Tatsuya Ichikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition and photosensitive element using t...
Patent number
6,060,216
Issue date
May 9, 2000
Hitachi Chemical Co., Ltd.
Tatsuya Ichikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin compositions and photosensitive element using...
Patent number
5,744,282
Issue date
Apr 28, 1998
Hitachi Chemical Co., Ltd.
Tatsuya Ichikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition
Patent number
4,980,266
Issue date
Dec 25, 1990
Hitachi Chemical Company, Ltd.
Taku Kawaguchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT EMPLOYING...
Publication number
20100129752
Publication date
May 27, 2010
Hitachi Chemical Company, Ltd.
Yoshiki Ajioka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...
Publication number
20090297982
Publication date
Dec 3, 2009
Manabu Saitou
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive element, photosensitive element roll, process for th...
Publication number
20060078824
Publication date
Apr 13, 2006
HITACHI CHEMICAL CO., Ltd.
Tatsuo Chiba
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive film for circuit formation and process for producing...
Publication number
20040112859
Publication date
Jun 17, 2004
Masao Kubota
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive element, method for forming resist pattern, and meth...
Publication number
20040018446
Publication date
Jan 29, 2004
Tomoaki Aoki
B32 - LAYERED PRODUCTS