Tatsuya Ikenari

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Osaka, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 9,355,822
- Issue date May 31, 2016
- Tokyo Electron Limited
- Norikazu Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency power supply device
- Patent number 8,674,619
- Issue date Mar 18, 2014
- Daihen Corporation
- Yuya Nakamori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High frequency power supply
- Patent number 7,630,220
- Issue date Dec 8, 2009
- Daihen Corporation
- Hiroyuki Kotani
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
High-frequency power supply device
- Patent number 7,221,102
- Issue date May 22, 2007
- Daihen Corporation
- Hiroyuki Kotani
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140361690
- Publication date Dec 11, 2014
- Norikazu Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH FREQUENCY POWER SUPPLY DEVICE
- Publication number 20130082620
- Publication date Apr 4, 2013
- DAIHEN Corporation
- Yuya NAKAMORI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
High Frequency Power Supply
- Publication number 20080048632
- Publication date Feb 28, 2008
- DAIHEN Corporation
- Hiroyuki Kotani
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
High-frequency power supply device
- Publication number 20050259450
- Publication date Nov 24, 2005
- DAIHEN CORPORATION
- Hiroyuki Kotani
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...