Tatsuya Miyahara

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of crystallizing amorphous silicon film and deposition appar...
- Patent number 12,112,947
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Tatsuya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing silicon film and film deposition apparatus
- Patent number 12,080,552
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Tatsuya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon film forming method and substrate processing apparatus
- Patent number 11,600,490
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method of substrate processing apparatus and substrate pro...
- Patent number 11,260,433
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Yoshihiro Takezawa
- B08 - CLEANING
Information Patent Grant
Silicon film forming method and substrate processing apparatus
- Patent number 10,892,162
- Issue date Jan 12, 2021
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240128081
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD AND METHOD FOR FORMING POLYCRYSTALLINE SILIC...
- Publication number 20230151480
- Publication date May 18, 2023
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING POLYCRYSTALLINE SILICON FILM
- Publication number 20230141501
- Publication date May 11, 2023
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- C30 - CRYSTAL GROWTH
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220364228
- Publication date Nov 17, 2022
- Tokyo Electron Limited
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
METHOD OF DEPOSITING SILICON FILM AND FILM DEPOSITION APPARATUS
- Publication number 20220319845
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CRYSTALLIZING AMORPHOUS SILICON FILM AND DEPOSITION APPAR...
- Publication number 20220319846
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS
- Publication number 20220270940
- Publication date Aug 25, 2022
- TOKYO ELECTRON LIMITED
- Shingo HISHIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210090887
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Method of Substrate Processing Apparatus and Substrate Pro...
- Publication number 20200230666
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20190309420
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Method and Operating Method of Film-Forming Apparatus, and...
- Publication number 20190284687
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190272995
- Publication date Sep 5, 2019
- TOKYO ELECTRON LIMITED
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tatsuya Miyahara

Person

Patents Grantslast 30 patents

Method of crystallizing amorphous silicon film and deposition appar...

Method of depositing silicon film and film deposition apparatus

Silicon film forming method and substrate processing apparatus

Cleaning method of substrate processing apparatus and substrate pro...

Silicon film forming method and substrate processing apparatus

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM DEPOSITION METHOD AND METHOD FOR FORMING POLYCRYSTALLINE SILIC...

METHOD FOR FORMING POLYCRYSTALLINE SILICON FILM

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF DEPOSITING SILICON FILM AND FILM DEPOSITION APPARATUS

METHOD OF CRYSTALLIZING AMORPHOUS SILICON FILM AND DEPOSITION APPAR...

ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS

SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

Cleaning Method of Substrate Processing Apparatus and Substrate Pro...

Substrate Processing Apparatus and Substrate Processing Method

Cleaning Method and Operating Method of Film-Forming Apparatus, and...

SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS