Tatsuya SASAKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank substrate, mask blank, reflective mask blank, transfer m...
- Patent number 9,400,421
- Issue date Jul 26, 2016
- Hoya Corporation
- Tatsuya Sasaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Mask blank, reflective mask blank, photomask, reflective mask, phot...
- Patent number 8,962,223
- Issue date Feb 24, 2015
- Hoya Corporation
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Grant
Mask blank substrate
- Patent number 8,399,159
- Issue date Mar 19, 2013
- Hoya Corporation
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 8,398,811
- Issue date Mar 19, 2013
- Ebara Corporation
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing apparatus
- Patent number 8,388,409
- Issue date Mar 5, 2013
- Ebara Corporation
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Grant
Electrode structure, semiconductor element, and methods of manufact...
- Patent number 8,304,335
- Issue date Nov 6, 2012
- Renesas Electronics Corporation
- Shigeru Koumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode structure, semiconductor element, and methods of manufact...
- Patent number 8,169,078
- Issue date May 1, 2012
- Renesas Electronics Corporation
- Shigeru Koumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 8,025,759
- Issue date Sep 27, 2011
- Ebara Corporation
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Grant
Method and device for polishing
- Patent number 7,108,579
- Issue date Sep 19, 2006
- Ebara Corporation
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 6,969,305
- Issue date Nov 29, 2005
- Ebara Corporation
- Norio Kimura
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing method
- Patent number 6,827,633
- Issue date Dec 7, 2004
- Ebara Corporation
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Grant
Separating machine for thinned semiconductor substrate and separati...
- Patent number 6,730,578
- Issue date May 4, 2004
- Mitsubishi Gas Chemical Company, Inc.
- Kazuhiro Otsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light wavelength filtering circuit and manufacturing method thereof
- Patent number 5,841,929
- Issue date Nov 24, 1998
- NEC Corporation
- Keiro Komatsu
- G02 - OPTICS
Information Patent Grant
Semiconductor optical amplifier device capable of deflecting output...
- Patent number 5,835,261
- Issue date Nov 10, 1998
- NEC Corporation
- Takemasa Tamanuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical integrated circuit and method for fabricating the same
- Patent number 5,796,883
- Issue date Aug 18, 1998
- NEC Corporation
- Kiichi Hamamoto
- G02 - OPTICS
Information Patent Grant
Semiconductor optical integrated circuits and method for fabricatin...
- Patent number 5,770,466
- Issue date Jun 23, 1998
- NEC Corporation
- Tatsuya Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photonic integrated circuit and fabrication process t...
- Patent number 5,703,974
- Issue date Dec 30, 1997
- NEC Corporation
- Tatsuya Sasaki
- G02 - OPTICS
Information Patent Grant
Semiconductor optical integrated circuits
- Patent number 5,565,693
- Issue date Oct 15, 1996
- NEC Corporation
- Tatsuya Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing optical integrated circuit
- Patent number 5,358,896
- Issue date Oct 25, 1994
- NEC Corporation
- Keiro Komatsu
- G02 - OPTICS
Information Patent Grant
Method of making tunable semiconductor laser
- Patent number 5,284,791
- Issue date Feb 8, 1994
- NEC Corporation
- Yasutaka Sakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an optical semiconductor device
- Patent number 5,250,462
- Issue date Oct 5, 1993
- NEC Corporation
- Tatsuya Sasaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical waveguide formed of compound semiconductor materials and pr...
- Patent number 5,237,639
- Issue date Aug 17, 1993
- NEC Corporation
- Tomoaki Kato
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
- Publication number 20230132780
- Publication date May 4, 2023
- HOYA CORPORATION
- Tatsuya SASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER M...
- Publication number 20140234755
- Publication date Aug 21, 2014
- HOYA CORPORATION
- Tatsuya Sasaki
- B32 - LAYERED PRODUCTS
Information Patent Application
MASK BLANK, REFLECTIVE MASK BLANK, PHOTOMASK, REFLECTIVE MASK, PHOT...
- Publication number 20130209925
- Publication date Aug 15, 2013
- HOYA CORPORATION
- Tatsuya Sasaki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ELECTRODE STUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTU...
- Publication number 20120028456
- Publication date Feb 2, 2012
- RENESAS ELECTRONICS CORPORATION
- Shigeru KOUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20110306274
- Publication date Dec 15, 2011
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
MASK BLANK SUBSTRATE
- Publication number 20110171568
- Publication date Jul 14, 2011
- HOYA CORPORATION
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
ELECTRODE STRUCTURE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACT...
- Publication number 20100200863
- Publication date Aug 12, 2010
- NEC Corporation
- Tatsuya Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POLISHING APPARATUS
- Publication number 20100151770
- Publication date Jun 17, 2010
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Application
ELECTRODE STRUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACT...
- Publication number 20100032839
- Publication date Feb 11, 2010
- Shigeru Koumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Polishing Method and Apparatus
- Publication number 20080146119
- Publication date Jun 19, 2008
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
Polishing apparatus and polishing method
- Publication number 20060166503
- Publication date Jul 27, 2006
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
Substrate polishing apparatus
- Publication number 20050142991
- Publication date Jun 30, 2005
- Hidetaka Nakao
- B24 - GRINDING POLISHING
Information Patent Application
Polishing method
- Publication number 20050054267
- Publication date Mar 10, 2005
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Application
Polishing apparatus
- Publication number 20050009456
- Publication date Jan 13, 2005
- Tatsuya Sasaki
- B24 - GRINDING POLISHING
Information Patent Application
Polishing method and polishing liquid
- Publication number 20040248415
- Publication date Dec 9, 2004
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Application
Method and device for polishing
- Publication number 20040235301
- Publication date Nov 25, 2004
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Application
Polishing apparatus
- Publication number 20030166383
- Publication date Sep 4, 2003
- Norio Kimura
- B24 - GRINDING POLISHING
Information Patent Application
Polishing method
- Publication number 20030124960
- Publication date Jul 3, 2003
- Yutaka Wada
- B24 - GRINDING POLISHING
Information Patent Application
Separating machine for thinned semiconductor substrate and separati...
- Publication number 20020106869
- Publication date Aug 8, 2002
- Kazuhiro Otsu
- H01 - BASIC ELECTRIC ELEMENTS

Tatsuya SASAKI

Person

Patents Grantslast 30 patents

Mask blank substrate, mask blank, reflective mask blank, transfer m...

Mask blank, reflective mask blank, photomask, reflective mask, phot...

Mask blank substrate

Polishing apparatus and polishing method

Substrate polishing apparatus

Electrode structure, semiconductor element, and methods of manufact...

Electrode structure, semiconductor element, and methods of manufact...

Polishing apparatus and polishing method

Method and device for polishing

Polishing apparatus

Polishing method

Separating machine for thinned semiconductor substrate and separati...

Light wavelength filtering circuit and manufacturing method thereof

Semiconductor optical amplifier device capable of deflecting output...

Optical integrated circuit and method for fabricating the same

Semiconductor optical integrated circuits and method for fabricatin...

Semiconductor photonic integrated circuit and fabrication process t...

Semiconductor optical integrated circuits

Method of producing optical integrated circuit

Method of making tunable semiconductor laser

Method for fabricating an optical semiconductor device

Optical waveguide formed of compound semiconductor materials and pr...

Patents Applicationslast 30 patents

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...

MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER M...

MASK BLANK, REFLECTIVE MASK BLANK, PHOTOMASK, REFLECTIVE MASK, PHOT...

ELECTRODE STUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTU...

POLISHING APPARATUS AND POLISHING METHOD

MASK BLANK SUBSTRATE

ELECTRODE STRUCTURE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACT...

SUBSTRATE POLISHING APPARATUS

ELECTRODE STRUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACT...

Substrate Polishing Method and Apparatus

Polishing apparatus and polishing method

Substrate polishing apparatus

Polishing method

Polishing apparatus

Polishing method and polishing liquid

Method and device for polishing

Polishing apparatus

Polishing method

Separating machine for thinned semiconductor substrate and separati...