Te-Hung Wu

Person

Xinshi Township, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method and computer-readable medium of optical proximity correction
- Patent number 8,321,822
- Issue date Nov 27, 2012
- United Microelectronics Corp.
- Yu-Shiang Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to compensate optical proximity correction
- Patent number 8,321,820
- Issue date Nov 27, 2012
- United Microelectronics Corp.
- Chun-Hsien Huang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method to determine process window
- Patent number 8,225,237
- Issue date Jul 17, 2012
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for constructing OPC model
- Patent number 8,166,424
- Issue date Apr 24, 2012
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to compensate optical proximity correction
- Patent number 8,151,221
- Issue date Apr 3, 2012
- United Microelectronics Corp.
- Chun-Hsien Huang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for selectively amending layout patterns
- Patent number 8,042,069
- Issue date Oct 18, 2011
- United Microelectronics Corp.
- Yu-Shiang Yang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of verifying a layout pattern
- Patent number 7,913,196
- Issue date Mar 22, 2011
- United Microelectronics Corp.
- Te-Hung Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for amending layout patterns
- Patent number 7,886,254
- Issue date Feb 8, 2011
- United Microelectronics Corp.
- Chia-Wei Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting photomask pattern
- Patent number 7,669,153
- Issue date Feb 23, 2010
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting photomask defect
- Patent number 7,664,614
- Issue date Feb 16, 2010
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark for concurrently monitoring alignment accuracy, focus,...
- Patent number 6,536,130
- Issue date Mar 25, 2003
- United Microelectronics Corp.
- Te-Hung Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD, SYSTEM AND COMPUTER-READABLE STORAGE MEDIUM FOR CATEGORIZIN...
- Publication number 20230281944
- Publication date Sep 7, 2023
- Kaohsiung Chang Gung Memorial Hospital
- Te-Ju Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO COMPENSATE OPTICAL PROXIMITY CORRECTION
- Publication number 20120192123
- Publication date Jul 26, 2012
- United Microelectronics Corp.
- Chun-Hsien Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STRUCTURE OF MEMORY DEVICE AND PROCESS FOR FABRICTING THE SAME
- Publication number 20110309424
- Publication date Dec 22, 2011
- UNITED MICROELECTRONICS COR
- Ming-Te WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND COMPUTER-READABLE MEDIUM OF OPTICAL PROXIMITY CORRECTION
- Publication number 20110296359
- Publication date Dec 1, 2011
- UNITED MICROELECTRONICS COF
- Yu-Shiang YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO COMPENSATE OPTICAL PROXIMITY CORRECTION
- Publication number 20110271237
- Publication date Nov 3, 2011
- UNITED MICROELECTRONICS COF
- Chun-Hsien HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO DETERMINE PROCESS WINDOW
- Publication number 20100131914
- Publication date May 27, 2010
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONSTRUCTING OPC MODEL
- Publication number 20100070944
- Publication date Mar 18, 2010
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SELECTIVELY AMENDING LAYOUT PATTERNS
- Publication number 20100036644
- Publication date Feb 11, 2010
- Yu-Shiang Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR AMENDING LAYOUT PATTERNS
- Publication number 20090300576
- Publication date Dec 3, 2009
- Chia-Wei Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF INSPECTING PHOTOMASK DEFECT
- Publication number 20090119045
- Publication date May 7, 2009
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of verifying a layout pattern
- Publication number 20080295062
- Publication date Nov 27, 2008
- Te-Hung Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CORRECTING PHOTOMASK PATTERN
- Publication number 20080270969
- Publication date Oct 30, 2008
- United Microelectronics Corp.
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE HAVING A PROTECTION LAYER
- Publication number 20070072090
- Publication date Mar 29, 2007
- Sheng-Yueh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Customer illumination aperture structure
- Publication number 20070053077
- Publication date Mar 8, 2007
- Ling-Chieh Lin
- G02 - OPTICS
Information Patent Application
METHOD OF FORMING THE PHOTO RESIST FEATURE
- Publication number 20070048669
- Publication date Mar 1, 2007
- Te-Hung Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving illumination uniformity in exposure process, a...
- Publication number 20070024835
- Publication date Feb 1, 2007
- Kuo-Chun Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REDUCING CRITICAL DIMENSION
- Publication number 20060257749
- Publication date Nov 16, 2006
- Sheng-Yueh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Method and computer-readable medium of optical proximity correction

Method to compensate optical proximity correction

Method to determine process window

Method for constructing OPC model

Method to compensate optical proximity correction

Method for selectively amending layout patterns

Method of verifying a layout pattern

Method for amending layout patterns

Method for correcting photomask pattern

Method of inspecting photomask defect

Overlay mark for concurrently monitoring alignment accuracy, focus,...

Patents Applicationslast 30 patents

METHOD, SYSTEM AND COMPUTER-READABLE STORAGE MEDIUM FOR CATEGORIZIN...

METHOD TO COMPENSATE OPTICAL PROXIMITY CORRECTION

STRUCTURE OF MEMORY DEVICE AND PROCESS FOR FABRICTING THE SAME

METHOD AND COMPUTER-READABLE MEDIUM OF OPTICAL PROXIMITY CORRECTION

METHOD TO COMPENSATE OPTICAL PROXIMITY CORRECTION

METHOD TO DETERMINE PROCESS WINDOW

METHOD FOR CONSTRUCTING OPC MODEL

METHOD FOR SELECTIVELY AMENDING LAYOUT PATTERNS

METHOD FOR AMENDING LAYOUT PATTERNS

METHOD OF INSPECTING PHOTOMASK DEFECT

Method of verifying a layout pattern

METHOD FOR CORRECTING PHOTOMASK PATTERN

RETICLE HAVING A PROTECTION LAYER

Customer illumination aperture structure

METHOD OF FORMING THE PHOTO RESIST FEATURE

Method for improving illumination uniformity in exposure process, a...

METHOD FOR REDUCING CRITICAL DIMENSION