Te-Sheng WANG

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulation-assisted alignment between metrology image and design
- Patent number 11,669,018
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 11,592,752
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method and apparatus
- Patent number 11,243,473
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulation-assisted alignment between metrology image and design
- Patent number 11,029,609
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Displacement based overlay or alignment
- Patent number 10,852,646
- Issue date Dec 1, 2020
- ASML Netherlands B.V.
- Marinus Jochemsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 10,656,531
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hotspot aware dose correction
- Patent number 10,372,043
- Issue date Aug 6, 2019
- ASML Netherlands B.V.
- Gang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Indirect determination of a processing parameter
- Patent number 10,359,705
- Issue date Jul 23, 2019
- ASML Netherlands B.V.
- Te-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SOFTWARE, METHODS, AND SYSTEMS FOR DETERMINATION OF A LOCAL FOCUS P...
- Publication number 20240355578
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING LOCAL FOCUS POINTS DURING INSPECT...
- Publication number 20240183806
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G01 - MEASURING TESTING
Information Patent Application
SIMULATION-ASSISTED METROLOGY IMAGE ALIGNMENT
- Publication number 20230401727
- Publication date Dec 14, 2023
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20230133487
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY C...
- Publication number 20210407112
- Publication date Dec 30, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SIMULATION-ASSISTED ALIGNMENT BETWEEN METROLOGY IMAGE AND DESIGN
- Publication number 20210294219
- Publication date Sep 23, 2021
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20200278613
- Publication date Sep 3, 2020
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD AND APPARATUS
- Publication number 20200159124
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIMULATION-ASSISTED ALIGNMENT BETWEEN METROLOGY IMAGE AND DESIGN
- Publication number 20200089122
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20190258169
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLACEMENT BASED OVERLAY OR ALIGNMENT
- Publication number 20190146358
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Marinus JOCHEMSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INDIRECT DETERMINATION OF A PROCESSING PARAMETER
- Publication number 20180321596
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOTSPOT AWARE DOSE CORRECTION
- Publication number 20180259858
- Publication date Sep 13, 2018
- ASML NETHERLANDS B.V.
- Gang CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Te-Sheng WANG

Person

Patents Grantslast 30 patents

Apparatus and method for process-window characterization

Simulation-assisted alignment between metrology image and design

Apparatus and method for process-window characterization

Measurement method and apparatus

Simulation-assisted alignment between metrology image and design

Displacement based overlay or alignment

Apparatus and method for process-window characterization

Hotspot aware dose correction

Indirect determination of a processing parameter

Patents Applicationslast 30 patents

SOFTWARE, METHODS, AND SYSTEMS FOR DETERMINATION OF A LOCAL FOCUS P...

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

SYSTEM AND METHOD FOR DETERMINING LOCAL FOCUS POINTS DURING INSPECT...

SIMULATION-ASSISTED METROLOGY IMAGE ALIGNMENT

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY C...

SIMULATION-ASSISTED ALIGNMENT BETWEEN METROLOGY IMAGE AND DESIGN

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

MEASUREMENT METHOD AND APPARATUS

SIMULATION-ASSISTED ALIGNMENT BETWEEN METROLOGY IMAGE AND DESIGN

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

DISPLACEMENT BASED OVERLAY OR ALIGNMENT

INDIRECT DETERMINATION OF A PROCESSING PARAMETER

HOTSPOT AWARE DOSE CORRECTION