Te Yu WEI

Person

Taoyuan City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing composition
- Patent number 11,993,729
- Issue date May 28, 2024
- BASF SE
- Christian Daeschlein
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing of substrates containing copper and r...
- Patent number 11,725,117
- Issue date Aug 15, 2023
- BASF SE
- Haci Osman Guevenc
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,899,945
- Issue date Jan 26, 2021
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for post chemical-mechanical-polishing cleaning
- Patent number 10,844,325
- Issue date Nov 24, 2020
- BASF SE
- Christian Daeschlein
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition for post chemical-mechanical-polishing cleaning
- Patent number 10,844,333
- Issue date Nov 24, 2020
- BASF SE
- Christian Daeschlein
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20240002698
- Publication date Jan 4, 2024
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20230416570
- Publication date Dec 28, 2023
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION
- Publication number 20220267643
- Publication date Aug 25, 2022
- BASF SE
- Michael LAUTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220056307
- Publication date Feb 24, 2022
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220049125
- Publication date Feb 17, 2022
- BASF SE
- Haci Osman GUEVENC
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20200299547
- Publication date Sep 24, 2020
- BASF SE
- Christian DAESCHLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR POST CHEMICAL-MECHANICAL-POLISHING CLEANING
- Publication number 20190002802
- Publication date Jan 3, 2019
- BASF SE
- Christian DAESCHLEIN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR POST CHEMICAL-MECHANICAL-POLISHING CLEANING
- Publication number 20180371371
- Publication date Dec 27, 2018
- BASF SE
- Christian DAESCHLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180230333
- Publication date Aug 16, 2018
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Chemical mechanical polishing composition

Chemical mechanical polishing of substrates containing copper and r...

Use of a chemical mechanical polishing (CMP) composition for polish...

Composition for post chemical-mechanical-polishing cleaning

Composition for post chemical-mechanical-polishing cleaning

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING COMPOSITION

COMPOSITION FOR POST CHEMICAL-MECHANICAL-POLISHING CLEANING

COMPOSITION FOR POST CHEMICAL-MECHANICAL-POLISHING CLEANING

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...