Ted Li

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Enhanced passivation process to protect silicon prior to high dose...
- Patent number 8,721,797
- Issue date May 13, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low damage photoresist strip method for low-K dielectrics
- Patent number 8,591,661
- Issue date Nov 26, 2013
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20140120733
- Publication date May 1, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE...
- Publication number 20110139175
- Publication date Jun 16, 2011
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20110139176
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20110143548
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY