Teng-Feng KUO

Person

Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Asymmetry compensation method used in lithography overlay process
- Patent number 9,494,873
- Issue date Nov 15, 2016
- United Microelectronics Corporation
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlap mark set and method for selecting recipe of measuring overl...
- Patent number 9,482,964
- Issue date Nov 1, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-mask and method of manufacturing semiconductor structures by...
- Patent number 9,448,471
- Issue date Sep 20, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting overlay error
- Patent number 9,400,435
- Issue date Jul 26, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- G05 - CONTROLLING REGULATING
Information Patent Grant
Overlay mark and method for forming the same
- Patent number 9,305,884
- Issue date Apr 5, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SERS-active structure, fabrication method thereof, and SERS system...
- Patent number 9,127,984
- Issue date Sep 8, 2015
- National Tsing Hua University
- Fan-Gang Tseng
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY MARK
- Publication number 20160172308
- Publication date Jun 16, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT MARK STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20160126194
- Publication date May 5, 2016
- UNITED MICROELECTRONICS CORP.
- Chia-Chang Hsu
- G01 - MEASURING TESTING
Information Patent Application
DOUBLE PATTERNING METHOD
- Publication number 20160103396
- Publication date Apr 14, 2016
- UNITED MICROELECTRONICS CORP.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARK AND METHOD FOR FORMING THE SAME
- Publication number 20160093573
- Publication date Mar 31, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURES BY...
- Publication number 20160018728
- Publication date Jan 21, 2016
- UNITED MICROELECTRONICS CORP.
- En-Chiuan Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRY COMPENSATION METHOD USED IN LITHOGRAPHY OVERLAY PROCESS
- Publication number 20160018741
- Publication date Jan 21, 2016
- UNITED MICROELECTRONICS CORPORATION
- EN-CHIUAN LIOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CORRECTING OVERLAY ERROR
- Publication number 20150362905
- Publication date Dec 17, 2015
- UNITED MICROELECTRONICS CORP.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAP MARK SET AND METHOD FOR SELECTING RECIPE OF MEASURING OVERL...
- Publication number 20150293461
- Publication date Oct 15, 2015
- United Microelectronics Corp.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SERS-ACTIVE STRUCTURE, FABRICATION METHOD THEREOF, AND SERS SYSTEM...
- Publication number 20140043605
- Publication date Feb 13, 2014
- National Tsing Hua University
- Fan-Gang TSENG
- G01 - MEASURING TESTING

Teng-Feng KUO

Person

Patents Grantslast 30 patents

Asymmetry compensation method used in lithography overlay process

Overlap mark set and method for selecting recipe of measuring overl...

Photo-mask and method of manufacturing semiconductor structures by...

Method of correcting overlay error

Overlay mark and method for forming the same

SERS-active structure, fabrication method thereof, and SERS system...

Patents Applicationslast 30 patents

OVERLAY MARK

MEASUREMENT MARK STRUCTURE AND MANUFACTURING METHOD THEREOF

DOUBLE PATTERNING METHOD

OVERLAY MARK AND METHOD FOR FORMING THE SAME

PHOTO-MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURES BY...

ASYMMETRY COMPENSATION METHOD USED IN LITHOGRAPHY OVERLAY PROCESS

METHOD OF CORRECTING OVERLAY ERROR

OVERLAP MARK SET AND METHOD FOR SELECTING RECIPE OF MEASURING OVERL...

SERS-ACTIVE STRUCTURE, FABRICATION METHOD THEREOF, AND SERS SYSTEM...