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Teresa Brugarolas Brufau
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Philadelphia, PA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Formulations for high porosity chemical mechanical polishing pads w...
Patent number
12,064,846
Issue date
Aug 20, 2024
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bryan E. Barton
B24 - GRINDING POLISHING
Information
Patent Grant
Formulations for chemical mechanical polishing pads with high plana...
Patent number
12,064,845
Issue date
Aug 20, 2024
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bryan E. Barton
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pad and polishing method
Patent number
11,813,713
Issue date
Nov 14, 2023
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bryan E. Barton
B24 - GRINDING POLISHING
Information
Patent Grant
Formulations for chemical mechanical polishing pads and CMP pads ma...
Patent number
11,806,830
Issue date
Nov 7, 2023
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bryan E. Barton
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pads having offset circumferential gr...
Patent number
10,625,393
Issue date
Apr 21, 2020
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Aliphatic polyurethane optical endpoint detection windows and CMP p...
Patent number
10,293,456
Issue date
May 21, 2019
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Nan-Rong Chiou
B24 - GRINDING POLISHING
Information
Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
Patent number
10,144,115
Issue date
Dec 4, 2018
Rohm and Haas Electronic Materials CMP Holdings, Inc.
David Michael Veneziale
B24 - GRINDING POLISHING
Information
Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
Patent number
10,105,825
Issue date
Oct 23, 2018
Rohm and Haas Electronics Materials CMP Holdings, Inc.
David Michael Veneziale
B24 - GRINDING POLISHING
Information
Patent Grant
Method of making composite polishing layer for chemical mechanical...
Patent number
10,092,998
Issue date
Oct 9, 2018
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Method of making composite polishing layer for chemical mechanical...
Patent number
10,011,002
Issue date
Jul 3, 2018
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pad and method of making same
Patent number
9,776,300
Issue date
Oct 3, 2017
Rohm and Haas Electronic Materials CMP Holdings Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pad composite polishing layer formula...
Patent number
9,630,293
Issue date
Apr 25, 2017
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Grant
Chemical mechanical polishing pad and method of making same
Patent number
9,586,305
Issue date
Mar 7, 2017
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Composite polishing layer chemical mechanical polishing pad
Patent number
9,539,694
Issue date
Jan 10, 2017
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Julia Kozhukh
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Grant
Chemical mechanical polishing pad with composite polishing layer
Patent number
9,457,449
Issue date
Oct 4, 2016
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Teresa Brugarolas Brufau
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS AND CMP PADS MA...
Publication number
20220226959
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bryan E. Barton
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND POLISHING METHOD
Publication number
20220226957
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bryan E. Barton
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS WITH HIGH PLANA...
Publication number
20220226958
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bryan E. Barton
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS W...
Publication number
20220226961
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bryan E. Barton
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PADS HAVING OFFSET CIRCUMFERENTIAL GR...
Publication number
20180354094
Publication date
Dec 13, 2018
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
Publication number
20160379840
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
Publication number
20160375543
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
G02 - OPTICS
Information
Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
Publication number
20160375553
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
David Michael Veneziale
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
Publication number
20160375552
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...
Publication number
20160375545
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
Publication number
20160375554
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
Publication number
20160375555
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
David Michael Veneziale
B24 - GRINDING POLISHING
Information
Patent Application
COMPOSITE POLISHING LAYER CHEMICAL MECHANICAL POLISHING PAD
Publication number
20160375544
Publication date
Dec 29, 2016
Rohm and Haas Electronic Materials CMP Holdings, INC.
Julia Kozhukh
G02 - OPTICS