Teruo Haibara

Person

Hikari-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ultrasonic cleaning method
- Patent number 10,137,483
- Issue date Nov 27, 2018
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Grant
Cleaning method of semiconductor wafer
- Patent number 10,121,649
- Issue date Nov 6, 2018
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Grant
Ultrasonic cleaning method and ultrasonic cleaning apparatus
- Patent number 9,773,688
- Issue date Sep 26, 2017
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Grant
Ultrasonic cleaning method
- Patent number 9,662,687
- Issue date May 30, 2017
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Grant
Ultrasonic cleaning method and ultrasonic cleaning apparatus
- Patent number 9,457,385
- Issue date Oct 4, 2016
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Grant
Dissolved nitrogen concentration monitoring method, substrate clean...
- Patent number 8,778,085
- Issue date Jul 15, 2014
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus, measurement method and calibration method
- Patent number 8,575,571
- Issue date Nov 5, 2013
- Siltronic AG
- Teruo Haibara
- G01 - MEASURING TESTING
Information Patent Grant
Micro bubble generating device and silicon wafer cleaning apparatus
- Patent number 8,408,221
- Issue date Apr 2, 2013
- Siltronic AG
- Teruo Haibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the wet-chemical treatment of a semiconductor wafer
- Patent number 8,070,882
- Issue date Dec 6, 2011
- Siltronic AG
- Guenter Schwab
- B08 - CLEANING
Information Patent Grant
Cleaning liquid and cleaning method for electronic material
- Patent number 8,043,435
- Issue date Oct 25, 2011
- Siltronic AG
- Teruo Haibara
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for supply of constant-concentration ozonated water
- Patent number 7,276,168
- Issue date Oct 2, 2007
- Siltronic AG
- Teruo Haibara
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Functional water, method and apparatus of producing the same, and m...
- Patent number 7,074,316
- Issue date Jul 11, 2006
- Permelec Electrode Ltd.
- Teruo Haibara
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Patents Applicationslast 30 patents

Information Patent Application
ULTRASONIC CLEANING METHOD
- Publication number 20160236242
- Publication date Aug 18, 2016
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD
- Publication number 20160052025
- Publication date Feb 25, 2016
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS
- Publication number 20130312785
- Publication date Nov 28, 2013
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS
- Publication number 20130312786
- Publication date Nov 28, 2013
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS
- Publication number 20130312789
- Publication date Nov 28, 2013
- Siltronic AG
- Masashi Uchibe
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS
- Publication number 20130312788
- Publication date Nov 28, 2013
- Siltronic AG
- Etsuko Kubo
- B08 - CLEANING
Information Patent Application
DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD, SUBSTRATE CLEAN...
- Publication number 20130263887
- Publication date Oct 10, 2013
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS, EQUIPMENT, AND METHOD
- Publication number 20130192628
- Publication date Aug 1, 2013
- Siltronic AG
- Yoshihiro Mori
- B08 - CLEANING
Information Patent Application
CLEANING METHOD
- Publication number 20130192627
- Publication date Aug 1, 2013
- Siltronic AG
- Etsuko Kubo
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING METHOD
- Publication number 20130160791
- Publication date Jun 27, 2013
- Siltronic AG
- Teruo Haibara
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Application
CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD
- Publication number 20130112900
- Publication date May 9, 2013
- Siltronic AG
- Teruo Haibara
- G01 - MEASURING TESTING
Information Patent Application
Micro Bubble Generating Device and Silicon Wafer Cleaning Apparatus
- Publication number 20100163084
- Publication date Jul 1, 2010
- Siltronic AG
- Teruo Haibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning method of semiconductor wafer
- Publication number 20100139711
- Publication date Jun 10, 2010
- Siltronic AG
- Teruo Haibara
- B08 - CLEANING
Information Patent Application
Method For The Wet-Chemical Treatment Of A Semiconductor Wafer
- Publication number 20090145457
- Publication date Jun 11, 2009
- Siltronic AG
- Guenter Schwab
- B08 - CLEANING
Information Patent Application
Cleaning Liquid And Cleaning Method For Electronic Material
- Publication number 20080156347
- Publication date Jul 3, 2008
- Siltronic AG
- Teruo Haibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for supply of constant-concentration ozonated water
- Publication number 20050115909
- Publication date Jun 2, 2005
- Siltronic AG
- Teruo Haibara
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Method for forwarding ozonated water
- Publication number 20050109711
- Publication date May 26, 2005
- Siltronic AG
- Teruo Haibara
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Functional water, method and apparatus of producing the same, and m...
- Publication number 20030188764
- Publication date Oct 9, 2003
- PERMELEC ELECTRODE LTD.
- Teruo Haibara
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Teruo Haibara

Person

Patents Grantslast 30 patents

Ultrasonic cleaning method

Cleaning method of semiconductor wafer

Ultrasonic cleaning method and ultrasonic cleaning apparatus

Ultrasonic cleaning method

Ultrasonic cleaning method and ultrasonic cleaning apparatus

Dissolved nitrogen concentration monitoring method, substrate clean...

Cleaning apparatus, measurement method and calibration method

Micro bubble generating device and silicon wafer cleaning apparatus

Method for the wet-chemical treatment of a semiconductor wafer

Cleaning liquid and cleaning method for electronic material

Method for supply of constant-concentration ozonated water

Functional water, method and apparatus of producing the same, and m...

Patents Applicationslast 30 patents

ULTRASONIC CLEANING METHOD

ULTRASONIC CLEANING METHOD

ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS

ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS

ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS

ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS

DISSOLVED NITROGEN CONCENTRATION MONITORING METHOD, SUBSTRATE CLEAN...

CLEANING APPARATUS, EQUIPMENT, AND METHOD

CLEANING METHOD

ULTRASONIC CLEANING METHOD

CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD

Micro Bubble Generating Device and Silicon Wafer Cleaning Apparatus

Cleaning method of semiconductor wafer

Method For The Wet-Chemical Treatment Of A Semiconductor Wafer

Cleaning Liquid And Cleaning Method For Electronic Material

Method for supply of constant-concentration ozonated water

Method for forwarding ozonated water

Functional water, method and apparatus of producing the same, and m...