Teruyoshi Yao

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,553,198
- Issue date Oct 8, 2013
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,227,153
- Issue date Jul 24, 2012
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, focus measurement apparatus and focus measurement method
- Patent number 7,732,103
- Issue date Jun 8, 2010
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 7,732,107
- Issue date Jun 8, 2010
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Local flare correction
- Patent number 7,604,912
- Issue date Oct 20, 2009
- Fujitsu Microelectronics Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for correcting pattern dimension and photo mas...
- Patent number 7,601,471
- Issue date Oct 13, 2009
- Fujitsu Microelectronics Limited
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aligning method
- Patent number 7,479,356
- Issue date Jan 20, 2009
- Fujitsu Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern size correcting device and pattern size correcting method
- Patent number 7,240,307
- Issue date Jul 3, 2007
- Fujitsu Limited
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test photomask, flare evaluation method, and flare compensation method
- Patent number 6,986,973
- Issue date Jan 17, 2006
- Fujitsu Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacture of semiconductor device using A-C anti-reflection coating
- Patent number 6,420,095
- Issue date Jul 16, 2002
- Fujitsu Limited
- Eiichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacture of semiconductor device using a-c anti-reflection coating
- Patent number 5,750,316
- Issue date May 12, 1998
- Fujitsu Limited
- Eiichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask Pattern Correction Device, Method of Correcting Mask Pattern,...
- Publication number 20120236279
- Publication date Sep 20, 2012
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...
- Publication number 20100209834
- Publication date Aug 19, 2010
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNING METHOD
- Publication number 20080118851
- Publication date May 22, 2008
- Fujitsu Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, focus measurement apparatus and focus measurement method
- Publication number 20080020294
- Publication date Jan 24, 2008
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask pattern correction device, method of correcting mask pattern,...
- Publication number 20060018529
- Publication date Jan 26, 2006
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for correcting pattern dimension and photo mas...
- Publication number 20050233226
- Publication date Oct 20, 2005
- FUJITSU LIMITED
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Local flare correction
- Publication number 20050225736
- Publication date Oct 13, 2005
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern size correcting device and pattern size correcting method
- Publication number 20050121628
- Publication date Jun 9, 2005
- FUJITSU LIMITED
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask
- Publication number 20050095513
- Publication date May 5, 2005
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test photomask, flare evaluation method, and flare compensation method
- Publication number 20040023130
- Publication date Feb 5, 2004
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Teruyoshi Yao

Person

Patents Grantslast 30 patents

Mask pattern correction device, method of correcting mask pattern,...

Mask pattern correction device, method of correcting mask pattern,...

Photomask, focus measurement apparatus and focus measurement method

Mask pattern correction device, method of correcting mask pattern,...

Local flare correction

Apparatus and method for correcting pattern dimension and photo mas...

Aligning method

Pattern size correcting device and pattern size correcting method

Test photomask, flare evaluation method, and flare compensation method

Manufacture of semiconductor device using A-C anti-reflection coating

Manufacture of semiconductor device using a-c anti-reflection coating

Patents Applicationslast 30 patents

Mask Pattern Correction Device, Method of Correcting Mask Pattern,...

MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...

ALIGNING METHOD

Photomask, focus measurement apparatus and focus measurement method

Mask pattern correction device, method of correcting mask pattern,...

Apparatus and method for correcting pattern dimension and photo mas...

Local flare correction

Pattern size correcting device and pattern size correcting method

Photomask

Test photomask, flare evaluation method, and flare compensation method