Tetsu Osawa

Person

Tsukui-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method for forming a silicon nitride film on a si...
- Patent number 7,629,033
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Untreated body transfer device and semiconductor manufacturing devi...
- Patent number 7,393,172
- Issue date Jul 1, 2008
- Tokyo Electron Limited
- Hiroaki Saeki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,797,111
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,675,737
- Issue date Jan 13, 2004
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,656,322
- Issue date Dec 2, 2003
- Tokyo Electron Limited
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carrier system positioning method
- Patent number 6,510,365
- Issue date Jan 21, 2003
- Tokyo Electron Limited
- Yasuhiko Nishinakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with a dielectric plate having a thickn...
- Patent number 6,372,084
- Issue date Apr 16, 2002
- Tokyo Electron Limited
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical-heat-treatment apparatus with movable lid and compensation...
- Patent number 6,259,061
- Issue date Jul 10, 2001
- Tokyo Electron Limited
- Tetsu Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source device
- Patent number 6,123,429
- Issue date Sep 26, 2000
- Tokyo Electron Limited
- Tetsu Osawa
- G02 - OPTICS
Information Patent Grant
Single-substrate-heat-treatment apparatus in semiconductor processi...
- Patent number 6,080,965
- Issue date Jun 27, 2000
- Tokyo Electron Limited
- Tetsu Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boat for heat treatment
- Patent number 5,820,367
- Issue date Oct 13, 1998
- Tokyo Electron Limited
- Tetsu Osawa
- C30 - CRYSTAL GROWTH
Information Patent Grant
Processing method for wafers
- Patent number 5,357,115
- Issue date Oct 18, 1994
- Tokyo Electron Limited
- Teruo Asakawa
- C30 - CRYSTAL GROWTH
Information Patent Grant
Processing system
- Patent number 5,248,886
- Issue date Sep 28, 1993
- Tokyo Electron Limited
- Teruo Asakawa
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing apparatus having an evacuating arrangement to eva...
- Publication number 20070251453
- Publication date Nov 1, 2007
- TOKYO ELECTRON LIMITED
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus having an evacuating arrangement to eva...
- Publication number 20070254113
- Publication date Nov 1, 2007
- TOKYO ELECTRON LIMITED
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20020076367
- Publication date Jun 20, 2002
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20020066536
- Publication date Jun 6, 2002
- TOKYO ELECTRON LIMITED
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20020046808
- Publication date Apr 25, 2002
- TOKYO ELECTRON LIMITED
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus having an evacuating arrangement to eva...
- Publication number 20020002948
- Publication date Jan 10, 2002
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus with a dielectric plate having a thickn...
- Publication number 20010050059
- Publication date Dec 13, 2001
- Toshiaki Hongo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tetsu Osawa

Person

Patents Grantslast 30 patents

Plasma processing method for forming a silicon nitride film on a si...

Untreated body transfer device and semiconductor manufacturing devi...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Carrier system positioning method

Plasma processing apparatus with a dielectric plate having a thickn...

Vertical-heat-treatment apparatus with movable lid and compensation...

Light source device

Single-substrate-heat-treatment apparatus in semiconductor processi...

Boat for heat treatment

Processing method for wafers

Processing system

Patents Applicationslast 30 patents

Plasma processing apparatus having an evacuating arrangement to eva...

Plasma processing apparatus having an evacuating arrangement to eva...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus having an evacuating arrangement to eva...

Plasma processing apparatus with a dielectric plate having a thickn...