Tetsuji Sato

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,825,589
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annular member, plasma processing apparatus and plasma etching method
- Patent number 11,257,662
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Shingo Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,032,899
- Issue date Jun 8, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,847,348
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,455,125
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Akihiro Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing ring
- Patent number D709536
- Issue date Jul 22, 2014
- Tokyo Electron Limited
- Akihiro Yoshimura
- D15 - Machines not elsewhere specified
Information Patent Grant
Reflecting device, communicating pipe, exhausting pump, exhaust sys...
- Patent number 8,727,708
- Issue date May 20, 2014
- Tokyo Electron Limited
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Substrate mounting table of substrate processing apparatus
- Patent number 8,687,343
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat-transfer structure and substrate processing apparatus
- Patent number 8,524,005
- Issue date Sep 3, 2013
- Tokyo Electron Limited
- Masaaki Miyagawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,173,036
- Issue date May 8, 2012
- Tokyo Electron Limited
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and the upper electrode unit
- Patent number 8,083,891
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflecting device, communicating pipe, exhausting pump, exhaust sys...
- Patent number 7,927,066
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Exhaust system and exhausting pump connected to a processing chambe...
- Patent number 7,837,432
- Issue date Nov 23, 2010
- Tokyo Electron Limited
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,815,767
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Tetsuji Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,438,783
- Issue date Oct 21, 2008
- Shin-Etsu Chemical Co., Ltd.
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS
- Publication number 20240249907
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Tetsuji SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210272781
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Shojiro YAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210267042
- Publication date Aug 26, 2021
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210249231
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Tetsuji SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210183685
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Sungjae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200176226
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200107429
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNULAR MEMBER, PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20200066496
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Shingo KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20110240224
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Akihiro YOSHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTING DEVICE, COMMUNICATING PIPE, EXHAUSTING PUMP, EXHAUST SYS...
- Publication number 20110162678
- Publication date Jul 7, 2011
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
SUBSTRATE MOUNTING TABLE OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20110116207
- Publication date May 19, 2011
- TOKYO ELECTRON LIMITED
- Tetsuji SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and the Upper Electrode Unit
- Publication number 20110030898
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and the Upper Electrode Unit
- Publication number 20090255631
- Publication date Oct 15, 2009
- TOKYO ELECTRON LIMITED
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD, AND BAFFLE PLATE OF THE PLA...
- Publication number 20090206055
- Publication date Aug 20, 2009
- TOKYO ELECTRON LIMITED
- Tetsuji SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST SYSTEM AND EXHAUSTING PUMP CONNECTED TO A PROCESSING CHAMBE...
- Publication number 20090136336
- Publication date May 28, 2009
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
HEAT-TRANSFER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080006207
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reflecting device, communicating pipe, exhausting pump, exhaust sys...
- Publication number 20060257243
- Publication date Nov 16, 2006
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060196847
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060081559
- Publication date Apr 20, 2006
- Shin-Etsu Chemical Co., Ltd.
- Koji Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040261712
- Publication date Dec 30, 2004
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040182515
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Tetsuji Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tetsuji Sato

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Annular member, plasma processing apparatus and plasma etching method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Focusing ring

Reflecting device, communicating pipe, exhausting pump, exhaust sys...

Substrate mounting table of substrate processing apparatus

Heat-transfer structure and substrate processing apparatus

Plasma processing method and apparatus

Plasma processing apparatus and the upper electrode unit

Reflecting device, communicating pipe, exhausting pump, exhaust sys...

Exhaust system and exhausting pump connected to a processing chambe...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

UPPER ELECTRODE STRUCTURE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

EDGE RING AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ANNULAR MEMBER, PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD

SUBSTRATE PROCESSING APPARATUS

REFLECTING DEVICE, COMMUNICATING PIPE, EXHAUSTING PUMP, EXHAUST SYS...

SUBSTRATE MOUNTING TABLE OF SUBSTRATE PROCESSING APPARATUS

Plasma Processing Apparatus and the Upper Electrode Unit

Plasma Processing Apparatus and the Upper Electrode Unit

PLASMA PROCESSING APPARATUS AND METHOD, AND BAFFLE PLATE OF THE PLA...

EXHAUST SYSTEM AND EXHAUSTING PUMP CONNECTED TO A PROCESSING CHAMBE...

HEAT-TRANSFER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

Reflecting device, communicating pipe, exhausting pump, exhaust sys...

Plasma processing method and apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus