Tetsuo OKAYASU

Person

Shizouka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polycarbosilazane, and composition comprising the same, and method...
- Patent number 11,999,827
- Issue date Jun 4, 2024
- Merck Patent GmbH
- Toshiya Okamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polycarbosilazane, and composition comprising the same, and method...
- Patent number 11,866,554
- Issue date Jan 9, 2024
- Merck Patent GmbH
- Katsuchika Suzuki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Top-layer membrane formation composition and method for forming res...
- Patent number 10,268,117
- Issue date Apr 23, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Masato Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming overlay film, and resist pattern formation...
- Patent number 9,810,988
- Issue date Nov 7, 2017
- AZ Electronic Material (Luxembourg) S.ár.l.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,804,493
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,766,544
- Issue date Sep 19, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,482,952
- Issue date Nov 1, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming fine resist pattern and pattern forming met...
- Patent number 9,448,485
- Issue date Sep 20, 2016
- Merck Patent GmbH
- Tetsuo Okayasu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for preventing development defect and composition for use i...
- Patent number 7,799,513
- Issue date Sep 21, 2010
- AZ Electronic Materials USA Corp.
- Yasushi Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water soluble resin composition and method for pattern formation us...
- Patent number 7,745,093
- Issue date Jun 29, 2010
- AZ Electronic Materials USA Corp.
- Takeshi Nishibe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAM...
- Publication number 20230374226
- Publication date Nov 23, 2023
- Merck Patent GmbH
- Katsuchika SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD...
- Publication number 20230303775
- Publication date Sep 28, 2023
- Merck Patent GmbH
- Katsuchika SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD...
- Publication number 20230174724
- Publication date Jun 8, 2023
- Merck Patent GmbH
- Toshiya OKAMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...
- Publication number 20170090288
- Publication date Mar 30, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...
- Publication number 20160327867
- Publication date Nov 10, 2016
- Merk Patent GmbH
- Tetsuo OKAYASU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20160011510
- Publication date Jan 14, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...
- Publication number 20150331323
- Publication date Nov 19, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Xiaowei WANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20150147701
- Publication date May 28, 2015
- Hyun-woo KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...
- Publication number 20150017587
- Publication date Jan 15, 2015
- AZ Electronic Materials USA Corp.
- Tetsuo Okayasu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for Preventing Development Defect and Composition for Use i...
- Publication number 20100324330
- Publication date Dec 23, 2010
- Yasushi Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Water Soluble Resin Composition and Method for Pattern Formation Us...
- Publication number 20080193880
- Publication date Aug 14, 2008
- Takeshi Nishibe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for preventing development defect and composition for use i...
- Publication number 20050221236
- Publication date Oct 6, 2005
- Yasushi Akiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tetsuo OKAYASU

Person

Patents Grantslast 30 patents

Polycarbosilazane, and composition comprising the same, and method...

Polycarbosilazane, and composition comprising the same, and method...

Top-layer membrane formation composition and method for forming res...

Composition for forming overlay film, and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming fine resist pattern and pattern forming met...

Process for preventing development defect and composition for use i...

Water soluble resin composition and method for pattern formation us...

Patents Applicationslast 30 patents

POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAM...

POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD...

POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD...

TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...

Process for Preventing Development Defect and Composition for Use i...

Water Soluble Resin Composition and Method for Pattern Formation Us...

Process for preventing development defect and composition for use i...