Tetsuo ONO

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,658,011
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,501
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 11,018,014
- Issue date May 25, 2021
- HITACHI HIGH-TECH CORPORATION
- Ze Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,727,088
- Issue date Jul 28, 2020
- HITACHI HIGH-TECH CORPORATION
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,600,619
- Issue date Mar 24, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,559,481
- Issue date Feb 11, 2020
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,522,331
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Yasuo Ohgoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 10,121,640
- Issue date Nov 6, 2018
- Hitachi High-Technologies Corporation
- Satoru Muto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing device
- Patent number 10,090,162
- Issue date Oct 2, 2018
- Hitachi High-Technologies Corporation
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,514,967
- Issue date Dec 6, 2016
- Hitachi High-Technologies Corporation
- Yasuo Ohgoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,349,603
- Issue date May 24, 2016
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,305,803
- Issue date Apr 5, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 8,969,211
- Issue date Mar 3, 2015
- Hitachi High-Technologies Corporation
- Satoru Muto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,889,024
- Issue date Nov 18, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,828,254
- Issue date Sep 9, 2014
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,801,951
- Issue date Aug 12, 2014
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,741,166
- Issue date Jun 3, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,580,131
- Issue date Nov 12, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing semiconductor device
- Patent number 8,501,608
- Issue date Aug 6, 2013
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of semiconductor processing
- Patent number 8,440,513
- Issue date May 14, 2013
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabricating apparatus with function of determining et...
- Patent number 8,071,397
- Issue date Dec 6, 2011
- Hitachi High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,771,607
- Issue date Aug 10, 2010
- Hitachi, Ltd.
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,611,993
- Issue date Nov 3, 2009
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,601,241
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Tsutomu Tetsuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor fabricating apparatus with function of determining et...
- Patent number 7,259,866
- Issue date Aug 21, 2007
- Hitachi High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample surface processing method
- Patent number 7,259,104
- Issue date Aug 21, 2007
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method of a specimen and surface processing appa...
- Patent number 7,049,243
- Issue date May 23, 2006
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabricating apparatus with function of determining et...
- Patent number 6,972,848
- Issue date Dec 6, 2005
- Hitach High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring methods in a plasma processing apparatus, monito...
- Patent number 6,967,109
- Issue date Nov 22, 2005
- Hitachi, Ltd.
- Tatehito Usui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210398777
- Publication date Dec 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200161092
- Publication date May 21, 2020
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20180366335
- Publication date Dec 20, 2018
- Hitachi High-Technologies Corporation
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20180047573
- Publication date Feb 15, 2018
- Hitachi High-Technologies Corporation
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170092468
- Publication date Mar 30, 2017
- Hitachi High-Technologies Corporation
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170040143
- Publication date Feb 9, 2017
- Hitachi High-Technologies Corporation
- Yasuo OHGOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170025289
- Publication date Jan 26, 2017
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20160307765
- Publication date Oct 20, 2016
- Hitachi High-Technologies Corporation
- Ze SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160225587
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160181131
- Publication date Jun 23, 2016
- Hitachi High-Technologies Corporation
- Michikazu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160181118
- Publication date Jun 23, 2016
- Hitachi High-Technologies Corporation
- Yutaka KUDOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160079073
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20150170880
- Publication date Jun 18, 2015
- Hitachi High-Technologies Corporation
- Satoru MUTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20150099368
- Publication date Apr 9, 2015
- Hitachi High-Technologies Corporation
- Ze SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140349418
- Publication date Nov 27, 2014
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20140302682
- Publication date Oct 9, 2014
- Hitachi High-Technologies Corporation
- Satoru MUTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Method
- Publication number 20140220785
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140131314
- Publication date May 15, 2014
- Hitachi High-Technologies Corporation
- Yoji ANDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140057445
- Publication date Feb 27, 2014
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140020831
- Publication date Jan 23, 2014
- Hitachi High-Technologies Corporation
- Yasuo OHGOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130157470
- Publication date Jun 20, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130109184
- Publication date May 2, 2013
- Hitachi High-Technologies Corporation
- Tomoyuki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20130029492
- Publication date Jan 31, 2013
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130001197
- Publication date Jan 3, 2013
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120252219
- Publication date Oct 4, 2012
- Hitachi High-Technologies Corporation
- Michikazu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SEMICONDUCTOR DEVICE
- Publication number 20110104882
- Publication date May 5, 2011
- Hitachi High-Technologies Corporation
- Tetsuo ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SEMICONDUCTOR PROCESSING
- Publication number 20090325388
- Publication date Dec 31, 2009
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR STABILIZING INNER WALL O...
- Publication number 20080257863
- Publication date Oct 23, 2008
- Hiroyuki Kitsunai
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR FABRICATING APPARATUS WITH FUNCTION OF DETERMINING ET...
- Publication number 20080020495
- Publication date Jan 24, 2008
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Method And Plasma Processing Apparatus
- Publication number 20070184562
- Publication date Aug 9, 2007
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Dry etching method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Method and apparatus for plasma processing

Plasma processing method and plasma processing device

Plasma processing apparatus

Plasma processing method

Plasma processing apparatus and plasma processing method

Method and apparatus for plasma processing

Plasma etching method

Plasma processing method

Plasma processing method

Plasma etching method

Plasma etching method

Method for processing semiconductor device

Method of semiconductor processing

Semiconductor fabricating apparatus with function of determining et...

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Semiconductor fabricating apparatus with function of determining et...

Sample surface processing method

Surface processing method of a specimen and surface processing appa...

Semiconductor fabricating apparatus with function of determining et...

Process monitoring methods in a plasma processing apparatus, monito...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DRY ETCHING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING

DRY ETCHING METHOD

PLASMA PROCESSING METHOD

METHOD AND APPARATUS FOR PLASMA PROCESSING

Plasma Etching Method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR PROCESSING SEMICONDUCTOR DEVICE

METHOD OF SEMICONDUCTOR PROCESSING

PLASMA PROCESSING APPARATUS AND METHOD FOR STABILIZING INNER WALL O...

SEMICONDUCTOR FABRICATING APPARATUS WITH FUNCTION OF DETERMINING ET...

Plasma Processing Method And Plasma Processing Apparatus