Tetsuo Yoshida

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method
- Patent number 8,821,742
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,506,610
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Port structure in semiconductor processing system
- Patent number 7,279,067
- Issue date Oct 9, 2007
- Tokyo Electron Limited
- Tetsuo Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive torque sensor and method of detecting torque
- Patent number 6,601,462
- Issue date Aug 5, 2003
- NEC TOKIN Corporation
- Toru Ueno
- G01 - MEASURING TESTING
Information Patent Grant
Capacitive strain sensor and method for using the same
- Patent number 6,532,824
- Issue date Mar 18, 2003
- Tokin Corporation
- Toru Ueno
- G01 - MEASURING TESTING
Information Patent Grant
Vacuum processing apparatus
- Patent number 6,328,864
- Issue date Dec 11, 2001
- Tokyo Electron Limited
- Shigeru Ishizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Piezoelectric vibratory gyroscope utilizing an energy-trapping vibr...
- Patent number 6,138,510
- Issue date Oct 31, 2000
- Tokin Corporation
- Tetsuo Yoshida
- G01 - MEASURING TESTING
Information Patent Grant
Piezoelectric vibratory gyroscope utilizing an energy-trapping vibr...
- Patent number 5,887,480
- Issue date Mar 30, 1999
- Tokin Corporation
- Tetsuo Yoshida
- G01 - MEASURING TESTING
Information Patent Grant
Voltage converter for use with a piezoelectric transformer
- Patent number 5,777,425
- Issue date Jul 7, 1998
- Tokin Corporation
- Yoshihiro Ino
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method of manufacturing a piezoelectric vibrator capable of reliabl...
- Patent number 5,400,488
- Issue date Mar 28, 1995
- Tokin Corporation
- Tomeji Ohno
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Gyroscope using circular rod type piezoelectric vibrator
- Patent number 5,336,960
- Issue date Aug 9, 1994
- Tokin Corporation
- Hiroshi Shimizu
- G01 - MEASURING TESTING
Information Patent Grant
Piezoelectric vibrator capable of reliably preventing dielectric br...
- Patent number 5,315,205
- Issue date May 24, 1994
- Tokin Corporation
- Tomeji Ohno
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK INCLUDING A DIE...
- Publication number 20240222092
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Takahiko SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20100133234
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20060042754
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060000803
- Publication date Jan 5, 2006
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
- Publication number 20050269292
- Publication date Dec 8, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050257743
- Publication date Nov 24, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Port structure in semiconductor processing system
- Publication number 20050103270
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Tetsuo Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing system and transfer apparatus for the same
- Publication number 20020006323
- Publication date Jan 17, 2002
- Tetsuo Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuo Yoshida

Person

Patents Grantslast 30 patents

Plasma etching method

Plasma processing method and apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method, and electrode plate for pla...

Port structure in semiconductor processing system

Capacitive torque sensor and method of detecting torque

Capacitive strain sensor and method for using the same

Vacuum processing apparatus

Piezoelectric vibratory gyroscope utilizing an energy-trapping vibr...

Piezoelectric vibratory gyroscope utilizing an energy-trapping vibr...

Voltage converter for use with a piezoelectric transformer

Method of manufacturing a piezoelectric vibrator capable of reliabl...

Gyroscope using circular rod type piezoelectric vibrator

Piezoelectric vibrator capable of reliably preventing dielectric br...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK INCLUDING A DIE...

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA ETCHING APPARATUS

PLASMA PROCESSING METHOD AND APPARATUS

Plasma etching apparatus

Plasma processing method and apparatus

Plasma processing apparatus and method, and electrode plate for pla...

Plasma processing apparatus and method

Port structure in semiconductor processing system

Semiconductor processing system and transfer apparatus for the same