Tetsuya Miyashita

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and abnormality detection method
- Patent number 12,170,217
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroaki Chihaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,163,215
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transfer apparatus and substrate processing system
- Patent number 12,033,878
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Tatsuo Hatano
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Sputtering apparatus and method of controlling sputtering apparatus
- Patent number 12,002,667
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering apparatus and magnetron sputtering method
- Patent number 11,901,166
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Tetsuya Miyashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and film formation method
- Patent number 11,823,879
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transfer apparatus and substrate processing system
- Patent number 11,764,092
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Tatsuo Hatano
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Film forming system and method for forming film on substrate
- Patent number 11,542,592
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming device
- Patent number 11,410,837
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Hiroyuki Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD processing method and PVD processing apparatus
- Patent number 11,193,200
- Issue date Dec 7, 2021
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 10,468,237
- Issue date Nov 5, 2019
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,392,688
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Junichi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mounting table system, substrate processing apparatus, and temperat...
- Patent number 10,325,801
- Issue date Jun 18, 2019
- Tokyo Electron Limited
- Tadashi Mitsunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 10,049,860
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum exhaust method
- Patent number 10,014,145
- Issue date Jul 3, 2018
- Tokyo Electron Limited
- Tomohiro Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum-processing apparatus, vacuum-processing method, and storage...
- Patent number 9,790,590
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Shinji Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling processing apparatus and method for operating the same
- Patent number 9,673,078
- Issue date Jun 6, 2017
- Tokyo Electron Limited
- Tetsuya Miyashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Load lock device
- Patent number 9,303,788
- Issue date Apr 5, 2016
- Tokyo Electron Limited
- Masamichi Hara
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Gate valve unit, substrate processing device and substrate processi...
- Patent number 9,121,515
- Issue date Sep 1, 2015
- Tokyo Electron Limited
- Kaoru Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20230377927
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Tatsuo HATANO
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
PVD APPARATUS
- Publication number 20230051865
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Takuya SEINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20220415688
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Tatsuo HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20220415687
- Publication date Dec 29, 2022
- Tokyo Electron Limited
- Tatsuo HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20220328343
- Publication date Oct 13, 2022
- TOKYO ELECTRON LIMITED
- Takuya UMISE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD
- Publication number 20220285197
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD
- Publication number 20220285182
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF
- Publication number 20220270866
- Publication date Aug 25, 2022
- TOKYO ELECTRON LIMITED
- Tetsuya MIYASHITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS AND FILM FORMATION METHOD
- Publication number 20220223390
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND METHOD OF CONTROLLING SPUTTERING APPARATUS
- Publication number 20220208534
- Publication date Jun 30, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20220178014
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Koji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHOD
- Publication number 20220108880
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Tetsuya MIYASHITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD
- Publication number 20220081757
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM TRANSFER DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE...
- Publication number 20220037181
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Tatsuo HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING DEVICE
- Publication number 20200071815
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki TOSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING SYSTEM AND METHOD FOR FORMING FILM ON SUBSTRATE
- Publication number 20190252165
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PVD PROCESSING METHOD AND PVD PROCESSING APPARATUS
- Publication number 20190169737
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180315585
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20180155817
- Publication date Jun 7, 2018
- Junichi TAKEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM EXHAUST METHOD
- Publication number 20170345609
- Publication date Nov 30, 2017
- Tomohiro SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND TEMPERAT...
- Publication number 20170330787
- Publication date Nov 16, 2017
- TOKYO ELECTRON LIMITED
- Tadashi MITSUNAGA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing System, Gate Valve and Substrate Transfer Method
- Publication number 20150371812
- Publication date Dec 24, 2015
- TOKYO ELECTRON LIMITED
- Kouji MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20150357222
- Publication date Dec 10, 2015
- TOKYO ELECTRON LIMITED
- Tetsuya MIYASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150235815
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum-Processing Apparatus, Vacuum-Processing Method, and Storage...
- Publication number 20150187546
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Shinji Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS
- Publication number 20150187549
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Toru Kitada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND NON-T...
- Publication number 20150136596
- Publication date May 21, 2015
- TOKYO ELECTRON LIMITED
- Kanto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTER DEVICE
- Publication number 20140346037
- Publication date Nov 27, 2014
- Shigeru MIZUNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOAD LOCK DEVICE
- Publication number 20140124069
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Masamichi HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM
- Publication number 20140076494
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Tetsuya MIYASHITA
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuya Miyashita

Person

Patents Grantslast 30 patents

Substrate processing apparatus and abnormality detection method

Film forming apparatus and film forming method

Substrate transfer apparatus and substrate processing system

Sputtering apparatus and method of controlling sputtering apparatus

Magnetron sputtering apparatus and magnetron sputtering method

Film formation apparatus and film formation method

Substrate transfer apparatus and substrate processing system

Film forming system and method for forming film on substrate

Film-forming device

PVD processing method and PVD processing apparatus

Substrate processing apparatus

Film forming apparatus

Mounting table system, substrate processing apparatus, and temperat...

Substrate processing apparatus

Vacuum exhaust method

Vacuum-processing apparatus, vacuum-processing method, and storage...

Cooling processing apparatus and method for operating the same

Load lock device

Gate valve unit, substrate processing device and substrate processi...

Patents Applicationslast 30 patents

SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PVD APPARATUS

SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING SYSTEM

PROCESSING METHOD AND PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD

APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

SPUTTERING APPARATUS AND METHOD OF CONTROLLING SPUTTERING APPARATUS

FILM FORMING APPARATUS AND FILM FORMING METHOD

MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTTERING METHOD

FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD

VACUUM TRANSFER DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE...

FILM-FORMING DEVICE

FILM FORMING SYSTEM AND METHOD FOR FORMING FILM ON SUBSTRATE

PVD PROCESSING METHOD AND PVD PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FILM FORMING APPARATUS

VACUUM EXHAUST METHOD

MOUNTING TABLE SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND TEMPERAT...

Substrate Processing System, Gate Valve and Substrate Transfer Method

COOLING PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME

SUBSTRATE PROCESSING APPARATUS

Vacuum-Processing Apparatus, Vacuum-Processing Method, and Storage...

MAGNETRON SPUTTERING APPARATUS

MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND NON-T...

SPUTTER DEVICE

LOAD LOCK DEVICE

PROCESSING SYSTEM