Tetsuya Nishizuka

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Beaverton, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus
- Patent number 8,980,048
- Issue date Mar 17, 2015
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method, and semiconductor...
- Patent number 8,969,210
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching features in silicon nitride films
- Patent number 8,809,199
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 8,753,527
- Issue date Jun 17, 2014
- Tokyo Electron Limited
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20140231017
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Etching Features in Silicon Nitride Films
- Publication number 20120208369
- Publication date Aug 16, 2012
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD, AND SEMICONDUCTOR...
- Publication number 20120064726
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20110266257
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Tetsuya Nishizuka
- H01 - BASIC ELECTRIC ELEMENTS