Tetsuya Oda

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and nozzle cleaning method
- Patent number 9,764,345
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Yoshihiro Kai
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Apparatus and method for heating substrate and coating and developi...
- Patent number 8,237,092
- Issue date Aug 7, 2012
- Tokyo Electron Limited
- Shinichi Hayashi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for heating substrate and coating and developi...
- Patent number 8,080,765
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Shinichi Hayashi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment apparatus, heat treatment method, and recording medi...
- Patent number 7,947,926
- Issue date May 24, 2011
- Tokyo Electron Limited
- Katsuhisa Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for heating substrate and coating and developi...
- Patent number 7,812,285
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Shinichi Hayashi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment unit and heat treatment method
- Patent number 6,815,647
- Issue date Nov 9, 2004
- Tokyo Electron Limited
- Mitsuhiro Tanoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment unit and heat treatment method
- Patent number 6,534,750
- Issue date Mar 18, 2003
- Tokyo Electron Limited
- Mitsuhiro Tanoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hot plate cooling method and heat processing apparatus
- Patent number 6,474,986
- Issue date Nov 5, 2002
- Tokyo Electron Limited
- Tetsuya Oda
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Hot plate cooling method and heat processing apparatus
- Patent number 6,450,805
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Tetsuya Oda
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method for heat-processing semiconductor device and apparatus for t...
- Patent number 5,151,871
- Issue date Sep 29, 1992
- Tokyo Electron Limited
- Kimiharu Matsumura
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD
- Publication number 20140352730
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND METHOD FOR HEATING SUBSTRATE AND COATING AND DEVELOPI...
- Publication number 20100330815
- Publication date Dec 30, 2010
- TOKYO ELECTRON LIMITED
- Shinichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR HEATING SUBSTRATE AND COATING AND DEVELOPI...
- Publication number 20100326351
- Publication date Dec 30, 2010
- TOKYO ELECTRON LIMITED
- Shinichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDI...
- Publication number 20070286709
- Publication date Dec 13, 2007
- TOKYO ELECTRON LIMITED
- Katsuhisa FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for heating substrate and coating and developi...
- Publication number 20060234178
- Publication date Oct 19, 2006
- TOKYO ELECTRON LIMITED
- Shinichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment unit and heat treatment method
- Publication number 20030121902
- Publication date Jul 3, 2003
- Mitsuhiro Tanoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hot plate cooling method and heat processing apparatus
- Publication number 20010038988
- Publication date Nov 8, 2001
- TOKYO ELECTRON LIMITED
- Tetsuya Oda
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuya Oda

Person

Patents Grantslast 30 patents

Substrate processing apparatus and nozzle cleaning method

Apparatus and method for heating substrate and coating and developi...

Apparatus and method for heating substrate and coating and developi...

Heat treatment apparatus, heat treatment method, and recording medi...

Apparatus and method for heating substrate and coating and developi...

Heat treatment unit and heat treatment method

Heat treatment unit and heat treatment method

Hot plate cooling method and heat processing apparatus

Hot plate cooling method and heat processing apparatus

Method for heat-processing semiconductor device and apparatus for t...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND NOZZLE CLEANING METHOD

APPARATUS AND METHOD FOR HEATING SUBSTRATE AND COATING AND DEVELOPI...

APPARATUS AND METHOD FOR HEATING SUBSTRATE AND COATING AND DEVELOPI...

HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDI...

Apparatus and method for heating substrate and coating and developi...

Heat treatment unit and heat treatment method

Hot plate cooling method and heat processing apparatus