Thaddeus Gerard Dziura

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process monitoring of deep structures with X-ray scatterometry
- Patent number 11,955,391
- Issue date Apr 9, 2024
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full beam metrology for x-ray scatterometry systems
- Patent number 11,313,816
- Issue date Apr 26, 2022
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process monitoring of deep structures with X-ray scatterometry
- Patent number 11,145,559
- Issue date Oct 12, 2021
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 11,099,137
- Issue date Aug 24, 2021
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 10,794,839
- Issue date Oct 6, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Full beam metrology for X-ray scatterometry systems
- Patent number 10,775,323
- Issue date Sep 15, 2020
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process monitoring of deep structures with X-ray scatterometry
- Patent number 10,727,142
- Issue date Jul 28, 2020
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for patterned wafer characterization
- Patent number 10,502,694
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
X-ray scatterometry metrology for high aspect ratio structures
- Patent number 10,352,695
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Method of optimizing an optical parametric model for structural ana...
- Patent number 10,325,004
- Issue date Jun 18, 2019
- KLA-Tencor Corporation
- Thaddeus G. Dziura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model optimization approach based on spectral sensitivity
- Patent number 10,255,385
- Issue date Apr 9, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Signal response metrology based on measurements of proxy structures
- Patent number 10,151,986
- Issue date Dec 11, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, method and computer program product for combining raw data...
- Patent number 10,152,678
- Issue date Dec 11, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,816,810
- Issue date Nov 14, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology tool with combined XRF and SAXS capabilities
- Patent number 9,778,213
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Combined x-ray and optical metrology
- Patent number 9,535,018
- Issue date Jan 3, 2017
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,490,182
- Issue date Nov 8, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical parametric model optimization
- Patent number 9,435,735
- Issue date Sep 6, 2016
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing an optical parametric model for structural analysis usin...
- Patent number 9,310,296
- Issue date Apr 12, 2016
- KLA-Tencor Corporation
- Thaddeus G. Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Secondary target design for optical measurements
- Patent number 9,311,431
- Issue date Apr 12, 2016
- KLA-Tencor Corporation
- Sungchul Yoo
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system optimization for parameter tracking
- Patent number 9,255,877
- Issue date Feb 9, 2016
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology using targets with field enhancement elements
- Patent number 8,879,073
- Issue date Nov 4, 2014
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods for high aspect ratio and large later...
- Patent number 8,860,937
- Issue date Oct 14, 2014
- KLA-Tencor Corp.
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Method for automated determination of an optimally parameterized sc...
- Patent number 8,666,703
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- Jason Ferns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical parametric model optimization
- Patent number 8,090,558
- Issue date Jan 3, 2012
- KLA-Tencor Corporation
- Thaddeus G. Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,933,016
- Issue date Apr 26, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,663,753
- Issue date Feb 16, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining lithographic focus and exposure
- Patent number 7,656,512
- Issue date Feb 2, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining lithographic focus and exposure
- Patent number 7,382,447
- Issue date Jun 3, 2008
- KLA-Tencor Technologies Corporation
- Walter Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20220268714
- Publication date Aug 25, 2022
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods And Systems For Accurate Measurement Of Deep Structures Hav...
- Publication number 20220252395
- Publication date Aug 11, 2022
- KLA Corporation
- John J. Hench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Monitoring Of Deep Structures With X-Ray Scatterometry
- Publication number 20210407864
- Publication date Dec 30, 2021
- KLA Corporation
- Antonio Arion Gellineau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200393386
- Publication date Dec 17, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process Monitoring Of Deep Structures With X-Ray Scatterometry
- Publication number 20200303265
- Publication date Sep 24, 2020
- KLA Corporation
- Antonio Arion Gellineau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20200300790
- Publication date Sep 24, 2020
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200271595
- Publication date Aug 27, 2020
- KLA-Tencor Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process Monitoring Of Deep Structures With X-Ray Scatterometry
- Publication number 20180350699
- Publication date Dec 6, 2018
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20180106735
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20180051984
- Publication date Feb 22, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
X-Ray Scatterometry Metrology For High Aspect Ratio Structures
- Publication number 20170167862
- Publication date Jun 15, 2017
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20170003123
- Publication date Jan 5, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR COMBINING RAW DATA...
- Publication number 20160141193
- Publication date May 19, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Signal Response Metrology Based On Measurements Of Proxy Structures
- Publication number 20160003609
- Publication date Jan 7, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20150176985
- Publication date Jun 25, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Metrology Tool With Combined XRF And SAXS Capabilities
- Publication number 20150051877
- Publication date Feb 19, 2015
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR PATTERNED WAFER CHARACTERIZATION
- Publication number 20150046121
- Publication date Feb 12, 2015
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Application
Combined X-Ray and Optical Metrology
- Publication number 20150032398
- Publication date Jan 29, 2015
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM OPTIMIZATION FOR PARAMETER TRACKING
- Publication number 20140347666
- Publication date Nov 27, 2014
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
MODEL OPTIMIZATION APPROACH BASED ON SPECTRAL SENSITIVITY
- Publication number 20130262044
- Publication date Oct 3, 2013
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology Using Targets With Field Enhancement Elements
- Publication number 20130222795
- Publication date Aug 29, 2013
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING
Information Patent Application
Secondary Target Design for Optical Measurements
- Publication number 20130116978
- Publication date May 9, 2013
- KLA-TENCOR CORPORATION
- Sungchul Yoo
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANA...
- Publication number 20120323356
- Publication date Dec 20, 2012
- Thaddeus G. Dziura
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SC...
- Publication number 20120022836
- Publication date Jan 26, 2012
- TOKYO ELECTRON LIMITED
- Jason Ferns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20100091284
- Publication date Apr 15, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE
- Publication number 20080192221
- Publication date Aug 14, 2008
- KLA-Tencor Technologies Corporation
- Walter Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080094630
- Publication date Apr 24, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for detecting overlay errors using scatterometry
- Publication number 20040169861
- Publication date Sep 2, 2004
- KLA-Tenor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Method for determining lithographic focus and exposure
- Publication number 20030048458
- Publication date Mar 13, 2003
- Walter Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thaddeus Gerard Dziura

Person

Patents Grantslast 30 patents

Process monitoring of deep structures with X-ray scatterometry

Full beam metrology for x-ray scatterometry systems

Process monitoring of deep structures with X-ray scatterometry

Visualization of three-dimensional semiconductor structures

Visualization of three-dimensional semiconductor structures

Full beam metrology for X-ray scatterometry systems

Process monitoring of deep structures with X-ray scatterometry

Measurement of multiple patterning parameters

Methods and apparatus for patterned wafer characterization

X-ray scatterometry metrology for high aspect ratio structures

Method of optimizing an optical parametric model for structural ana...

Model optimization approach based on spectral sensitivity

Signal response metrology based on measurements of proxy structures

System, method and computer program product for combining raw data...

Measurement of multiple patterning parameters

Metrology tool with combined XRF and SAXS capabilities

Combined x-ray and optical metrology

Measurement of multiple patterning parameters

Optical parametric model optimization

Optimizing an optical parametric model for structural analysis usin...

Secondary target design for optical measurements

Metrology system optimization for parameter tracking

Optical metrology using targets with field enhancement elements

Metrology systems and methods for high aspect ratio and large later...

Method for automated determination of an optimally parameterized sc...

Optical parametric model optimization

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Method for determining lithographic focus and exposure

Method for determining lithographic focus and exposure

Patents Applicationslast 30 patents

Full Beam Metrology For X-Ray Scatterometry Systems

Methods And Systems For Accurate Measurement Of Deep Structures Hav...

Process Monitoring Of Deep Structures With X-Ray Scatterometry

Visualization of Three-Dimensional Semiconductor Structures

Process Monitoring Of Deep Structures With X-Ray Scatterometry

Full Beam Metrology For X-Ray Scatterometry Systems

Visualization of Three-Dimensional Semiconductor Structures

Process Monitoring Of Deep Structures With X-Ray Scatterometry

Full Beam Metrology For X-Ray Scatterometry Systems

Measurement Of Multiple Patterning Parameters

X-Ray Scatterometry Metrology For High Aspect Ratio Structures

Measurement Of Multiple Patterning Parameters

SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR COMBINING RAW DATA...

Signal Response Metrology Based On Measurements Of Proxy Structures

Measurement Of Multiple Patterning Parameters

Metrology Tool With Combined XRF And SAXS Capabilities

METHODS AND APPARATUS FOR PATTERNED WAFER CHARACTERIZATION

Combined X-Ray and Optical Metrology

METROLOGY SYSTEM OPTIMIZATION FOR PARAMETER TRACKING

MODEL OPTIMIZATION APPROACH BASED ON SPECTRAL SENSITIVITY

Optical Metrology Using Targets With Field Enhancement Elements

Secondary Target Design for Optical Measurements

METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANA...

METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SC...

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Apparatus and method for detecting overlay errors using scatterometry

Method for determining lithographic focus and exposure