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Theodore H. Fedynyshyn

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  • Sudbury, MA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    3-D printed devices formed with conductive inks and method of making
    • Patent number 11,267,981
    • Issue date Mar 8, 2022
    • Massachusetts Institute of Technology
    • Bradley P. Duncan
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Block copolymer ink formulation for 3D printing and method of makin...
    • Patent number 10,851,251
    • Issue date Dec 1, 2020
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • B33 - ADDITIVE MANUFACTURING TECHNOLOGY
  • Information Patent Grant

    Directed material assembly
    • Patent number 8,551,566
    • Issue date Oct 8, 2013
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Grant

    Inorganic resist sensitizer
    • Patent number 8,323,866
    • Issue date Dec 4, 2012
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist sensitizer
    • Patent number 8,158,338
    • Issue date Apr 17, 2012
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Multi-tone resist compositions
    • Patent number 8,110,339
    • Issue date Feb 7, 2012
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Immersion fluids for lithography
    • Patent number 7,745,102
    • Issue date Jun 29, 2010
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Grant

    Contrast enhancing layers
    • Patent number 7,622,246
    • Issue date Nov 24, 2009
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Surface-emission cathodes having cantilevered electrodes
    • Patent number 7,443,090
    • Issue date Oct 28, 2008
    • The Massachusetts Institute of Technology
    • Michael W. Geis
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Resist with reduced line edge roughness
    • Patent number 7,153,630
    • Issue date Dec 26, 2006
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist with reduced line edge roughness
    • Patent number 6,936,398
    • Issue date Aug 30, 2005
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Surface modified encapsulated inorganic resist
    • Patent number 6,913,865
    • Issue date Jul 5, 2005
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    High sensitivity X-ray photoresist
    • Patent number 6,872,504
    • Issue date Mar 29, 2005
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist materials for 157-nm lithography
    • Patent number 6,815,145
    • Issue date Nov 9, 2004
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Low abosorbing resists for 157 nm lithography
    • Patent number 6,794,109
    • Issue date Sep 21, 2004
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Encapsulated inorganic resists
    • Patent number 6,783,914
    • Issue date Aug 31, 2004
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist methods and materials for UV and electron-beam lithography w...
    • Patent number 6,680,157
    • Issue date Jan 20, 2004
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Resist materials for 157-nm lithography
    • Patent number 6,468,712
    • Issue date Oct 22, 2002
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Radiation sensitive compositions comprising blends of an aliphatic...
    • Patent number 5,302,490
    • Issue date Apr 12, 1994
    • Shipley Company Inc.
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    3-D Printed Devices Formed With Magnetic Inks and Methods of Making...
    • Publication number 20200353682
    • Publication date Nov 12, 2020
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    3-D PRINTED DEVICES FORMED WITH CONDUCTIVE INKS AND METHOD OF MAKING
    • Publication number 20190300741
    • Publication date Oct 3, 2019
    • Massachusetts Institute of Technology
    • Bradley P. DUNCAN
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    BLOCK COPOLYMER INK FORMULATION FOR 3D PRINTING AND METHOD OF MAKIN...
    • Publication number 20180320008
    • Publication date Nov 8, 2018
    • President and Fellows of Harvard College
    • Theodore H. Fedynyshyn
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    SURFACE MODIFIED DIAMOND MATERIALS AND METHODS OF MANUFACTURING
    • Publication number 20180212026
    • Publication date Jul 26, 2018
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • C01 - INORGANIC CHEMISTRY
  • Information Patent Application

    PREPARATION, PURIFICATION AND USE OF HIGH-X DIBLOCK COPOLYMERS
    • Publication number 20150337068
    • Publication date Nov 26, 2015
    • KARL K BERGGREN
    • B33 - ADDITIVE MANUFACTURING TECHNOLOGY
  • Information Patent Application

    Surfaces with Controllable Wetting and Adhesion
    • Publication number 20120276334
    • Publication date Nov 1, 2012
    • Massachusetts Institute of Technology
    • Theodore Fedynyshyn
    • B08 - CLEANING
  • Information Patent Application

    DIRECTED MATERIAL ASSEMBLY
    • Publication number 20110039061
    • Publication date Feb 17, 2011
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Application

    Inorganic Resist Sensitizer
    • Publication number 20100021843
    • Publication date Jan 28, 2010
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST SENSITIZER
    • Publication number 20100009289
    • Publication date Jan 14, 2010
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MULTI-TONE RESIST COMPOSITIONS
    • Publication number 20090068589
    • Publication date Mar 12, 2009
    • Massachusetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    CONTRAST ENHANCING LAYERS
    • Publication number 20080076060
    • Publication date Mar 27, 2008
    • Massachuetts Institute of Technology
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    IMMERSION FLUIDS FOR LITHOGRAPHY
    • Publication number 20080063989
    • Publication date Mar 13, 2008
    • MASS INSTITUTE OF TECHNOLOGY
    • Theodore H. Fedynyshyn
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    Surface-emission cathodes having cantilevered electrodes
    • Publication number 20070090476
    • Publication date Apr 26, 2007
    • Michael W. Geis
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Resist with reduced line edge roughness
    • Publication number 20060078820
    • Publication date Apr 13, 2006
    • MASS INSTITUTE OF TECHNOLOGY (MIT)
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Sample preparation methods and devices
    • Publication number 20050277204
    • Publication date Dec 15, 2005
    • Massachusetts Institute of Technology
    • Mark A. Hollis
    • G01 - MEASURING TESTING
  • Information Patent Application

    Sample preparation methods and devices
    • Publication number 20050118570
    • Publication date Jun 2, 2005
    • Massachusetts Institute of Technology
    • Mark A. Hollis
    • B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • Information Patent Application

    High sensitivity X-ray photoresist
    • Publication number 20040110091
    • Publication date Jun 10, 2004
    • MASS INSTITUTE OF TECHNOLOGY (MIT)
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Protecting groups for lithographic resist compositions
    • Publication number 20040009424
    • Publication date Jan 15, 2004
    • MASS INSTITUTE OF TECHNOLOGY (MIT)
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist materials for 157-nm lithography
    • Publication number 20030157431
    • Publication date Aug 21, 2003
    • MASS INSTITUTE OF TECHNOLOGY (MIT)
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Surface modified encapsulated inorganic resist
    • Publication number 20030099897
    • Publication date May 29, 2003
    • MASS INSTITUTE OF TECHNOLOGY (MIT)
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist with reduced line edge roughness
    • Publication number 20030036015
    • Publication date Feb 20, 2003
    • Theodore H. Fedynyshyn
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Low abosorbing resists for 157 nm lithography
    • Publication number 20020160297
    • Publication date Oct 31, 2002
    • Theodore H. Fedynyshyn
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC