Thomas B. Faure

Person

Georgia, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Protection of photomasks from 193nm radiation damage using thin coa...
- Patent number 11,143,953
- Issue date Oct 12, 2021
- International Business Machines Corporation
- Robert L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for reducing degradation and/or modifying feature size o...
- Patent number 8,568,959
- Issue date Oct 29, 2013
- International Business Machines Corporation
- Peter H. Bartlau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure for partitioned dummy fill shapes for reduced mask bias w...
- Patent number 7,861,208
- Issue date Dec 28, 2010
- International Business Machines Corporation
- Thomas B. Faure
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method to etch chrome for photomask fabrication
- Patent number 7,754,394
- Issue date Jul 13, 2010
- International Business Machines Corporation
- Shaun B Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for partitioned dummy fill shapes for reduced...
- Patent number 7,709,300
- Issue date May 4, 2010
- International Business Machines Corporation
- Thomas B. Faure
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
CD uniformity of chrome etch to photomask process
- Patent number 7,014,959
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Shaun B. Crawford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for dry etching photomask material
- Patent number 7,014,958
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Timothy Joseph Dalton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of inhibiting contaminants using dilute acid rinse
- Patent number 6,758,912
- Issue date Jul 6, 2004
- International Business Machines Corporation
- Virginia Chi-Chuen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of minimizing contaminating deposits using dilute acid rinse
- Patent number 6,494,966
- Issue date Dec 17, 2002
- International Business Machines Corporation
- Virginia Chi-Chuen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single component developer for use with ghost exposure
- Patent number 6,426,177
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plating cell apparatus for x-ray mask fabrication
- Patent number 6,287,434
- Issue date Sep 11, 2001
- International Business Machines Corporation
- Robin J. Ackel
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Single component developer for copolymer resists
- Patent number 6,270,949
- Issue date Aug 7, 2001
- International Business Machines Corporation
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dilute acid rinse after develop for chrome etch
- Patent number 6,162,565
- Issue date Dec 19, 2000
- International Business Machines Corporation
- Virginia Chi-Chuen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plating process for x-ray mask fabrication
- Patent number 6,039,858
- Issue date Mar 21, 2000
- International Business Machines Corporation
- Robin J. Ackel
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Recovery of an anodically bonded glass device from a substrate by u...
- Patent number 5,783,309
- Issue date Jul 21, 1998
- International Business Machines Corporation
- Thomas Benjamin Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recovery of an anodically bonded glass device from a susstrate by u...
- Patent number 5,538,151
- Issue date Jul 23, 1996
- International Business Machines Corp.
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low stress electrodeposition of gold for x-ray mask fabrication
- Patent number 5,459,001
- Issue date Oct 17, 1995
- International Business Machines Corporation
- Scott A. Estes
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of Manufacturing three dimensional integrated device and cir...
- Patent number 5,409,852
- Issue date Apr 25, 1995
- International Business Machines Corporation
- Thomas B. Faure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low stress electrodeposition of gold for X-ray mask fabrication
- Patent number 5,318,687
- Issue date Jun 7, 1994
- International Business Machines Corporation
- Scott A. Estes
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Three dimensional integrated device and circuit structures
- Patent number 5,319,240
- Issue date Jun 7, 1994
- International Business Machines Corporation
- Thomas B. Faure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor structures formed from planar layers
- Patent number 5,160,987
- Issue date Nov 3, 1992
- International Business Machines Corporation
- Wilber D. Pricer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for X-ray mask warpage reduction
- Patent number 5,124,561
- Issue date Jun 23, 1992
- International Business Machines Corporation
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COA...
- Publication number 20200301270
- Publication date Sep 24, 2020
- International Business Machines Corporation
- Robert L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TECHNIQUES FOR REDUCING DEGRADATION AND/OR MODIFYING FEATURE SIZE O...
- Publication number 20100086876
- Publication date Apr 8, 2010
- International Business Machines Corporation
- Peter H. Bartlau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGN STRUCTURE FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED MASK...
- Publication number 20090100399
- Publication date Apr 16, 2009
- International Business Machines Corporation
- Thomas B. FAURE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method to etch chrome for photomask fabrication
- Publication number 20080113275
- Publication date May 15, 2008
- International Business Machines Corporation
- Shaun B. Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED...
- Publication number 20080086714
- Publication date Apr 10, 2008
- Thomas B. Faure
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DRY ETCHING PHOTOMASK MATERIAL
- Publication number 20040265703
- Publication date Dec 30, 2004
- International Business Machines Corporation
- Timothy Joseph Dalton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPROVED CD UNIFORMITY OF CHROME ETCH TO PHOTOMASK PROCESS
- Publication number 20040262264
- Publication date Dec 30, 2004
- International Business Machines Corporation
- Shaun B. Crawford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of inhibiting contaminants using dilute acid rinse
- Publication number 20030051740
- Publication date Mar 20, 2003
- Virginia Chi-Chuen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Single component developer for use with ghost exposure
- Publication number 20010005571
- Publication date Jun 28, 2001
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of minimizing contaminating deposits using dilute acid rinse
- Publication number 20010001958
- Publication date May 31, 2001
- Virginia Chi-Chuen Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thomas B. Faure

Person

Patents Grantslast 30 patents

Protection of photomasks from 193nm radiation damage using thin coa...

Techniques for reducing degradation and/or modifying feature size o...

Structure for partitioned dummy fill shapes for reduced mask bias w...

Method to etch chrome for photomask fabrication

Structure and method for partitioned dummy fill shapes for reduced...

CD uniformity of chrome etch to photomask process

Method for dry etching photomask material

Method of inhibiting contaminants using dilute acid rinse

Method of minimizing contaminating deposits using dilute acid rinse

Plasma resistant composition and use thereof

Single component developer for use with ghost exposure

Plating cell apparatus for x-ray mask fabrication

Single component developer for copolymer resists

Dilute acid rinse after develop for chrome etch

Plating process for x-ray mask fabrication

Recovery of an anodically bonded glass device from a substrate by u...

Recovery of an anodically bonded glass device from a susstrate by u...

Low stress electrodeposition of gold for x-ray mask fabrication

Method of Manufacturing three dimensional integrated device and cir...

Low stress electrodeposition of gold for X-ray mask fabrication

Three dimensional integrated device and circuit structures

Three-dimensional semiconductor structures formed from planar layers

Process for X-ray mask warpage reduction

Patents Applicationslast 30 patents

PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COA...

TECHNIQUES FOR REDUCING DEGRADATION AND/OR MODIFYING FEATURE SIZE O...

DESIGN STRUCTURE FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED MASK...

Method to etch chrome for photomask fabrication

STRUCTURE AND METHOD FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED...

METHOD FOR DRY ETCHING PHOTOMASK MATERIAL

IMPROVED CD UNIFORMITY OF CHROME ETCH TO PHOTOMASK PROCESS

Method of inhibiting contaminants using dilute acid rinse

Single component developer for use with ghost exposure

Method of minimizing contaminating deposits using dilute acid rinse