Thomas C. Fowler

Follow

Person

Georgetown, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
High dielectric constant material at locations of high fields
- Patent number 11,749,712
- Issue date Sep 5, 2023
- Skyworks Solutions, Inc.
- Dan B. Kasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielding using layers with staggered trenches
- Patent number 11,626,366
- Issue date Apr 11, 2023
- Silicon Laboratories Inc.
- Thomas C. Fowler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dielectric constant material at locations of high fields
- Patent number 11,205,696
- Issue date Dec 21, 2021
- Skyworks Solutions, Inc.
- Dan B. Kasha
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHIELDING USING LAYERS WITH STAGGERED TRENCHES
- Publication number 20220406708
- Publication date Dec 22, 2022
- Silicon Laboratories Inc.
- Thomas C. Fowler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DIELECTRIC CONSTANT MATERIAL AT LOCATIONS OF HIGH FIELDS
- Publication number 20220115497
- Publication date Apr 14, 2022
- Skyworks Solutions, Inc.
- Dan B. Kasha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Top Hat Structure for Isolation Capacitors
- Publication number 20210202375
- Publication date Jul 1, 2021
- Silicon Laboratories Inc.
- Thomas C. Fowler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DIELECTRIC CONSTANT MATERIAL AT LOCATIONS OF HIGH FIELDS
- Publication number 20210193791
- Publication date Jun 24, 2021
- Silicon Laboratories Inc.
- Dan B. Kasha
- H01 - BASIC ELECTRIC ELEMENTS