Thomas Christopher Cecil

Person

Menlo Park, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,977,327
- Issue date May 7, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Skeleton representation of layouts for the development of lithograp...
- Patent number 11,860,531
- Issue date Jan 2, 2024
- Synopsys, Inc.
- Thomas C. Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose information generation and communication for lithography manuf...
- Patent number 11,822,232
- Issue date Nov 21, 2023
- Synopsys, Inc.
- Thomas Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverse lithography and machine learning for mask synthesis
- Patent number 11,762,283
- Issue date Sep 19, 2023
- Synopsys, Inc.
- Amyn A. Poonawala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask rule checking for curvilinear masks for electronic circuits
- Patent number 11,748,553
- Issue date Sep 5, 2023
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask synthesis using design guided offsets
- Patent number 11,720,015
- Issue date Aug 8, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Classification of patterns in an electronic circuit layout using ma...
- Patent number 11,663,485
- Issue date May 30, 2023
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer sensitivity determination and communication
- Patent number 11,657,207
- Issue date May 23, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dose optimization techniques for mask synthesis tools
- Patent number 11,651,135
- Issue date May 16, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Obtaining a mask using a cost function gradient from a jacobian mat...
- Patent number 11,644,747
- Issue date May 9, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask rule checking for curvilinear masks for electronic circuits
- Patent number 11,568,127
- Issue date Jan 31, 2023
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography-based pattern optimization
- Patent number 11,449,659
- Issue date Sep 20, 2022
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,360,382
- Issue date Jun 14, 2022
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask rule checking for curvilinear masks for electronic circuits
- Patent number 11,222,160
- Issue date Jan 11, 2022
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Obtaining a mask using a cost function gradient from a Jacobian mat...
- Patent number 11,061,321
- Issue date Jul 13, 2021
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Matrix reduction for lithography simulation
- Patent number 10,430,543
- Issue date Oct 1, 2019
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist feature implementation for shot generation
- Patent number 10,318,697
- Issue date Jun 11, 2019
- Synopsys, Inc.
- Michael Lawrence Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Rule based assist feature placement using skeletons
- Patent number 10,262,100
- Issue date Apr 16, 2019
- Synopsys, Inc.
- Thomas C. Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist feature implementation with shot optimization
- Patent number 9,471,746
- Issue date Oct 18, 2016
- Synopsys, Inc.
- Michael Lawrence Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist feature implementation using shot optimization
- Patent number 9,170,481
- Issue date Oct 27, 2015
- Synopsys, Inc.
- Michael Lawrence Rieger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full-field mask error enhancement function
- Patent number 8,498,469
- Issue date Jul 30, 2013
- Synopsys, Inc.
- Guangming Xiao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographically enhanced edge determination
- Patent number 8,473,878
- Issue date Jun 25, 2013
- Synopsys, Inc.
- Tatung Chow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Technique for determining mask patterns and write patterns
- Patent number 8,028,252
- Issue date Sep 27, 2011
- Luminescent Technologies Inc.
- Thomas C. Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...
- Publication number 20240248392
- Publication date Jul 25, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS
- Publication number 20230129457
- Publication date Apr 27, 2023
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Enforcing mask synthesis consistency across random areas of integra...
- Publication number 20220276554
- Publication date Sep 1, 2022
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS
- Publication number 20220277130
- Publication date Sep 1, 2022
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAFER SENSITIVITY DETERMINATION AND COMMUNICATION
- Publication number 20220035240
- Publication date Feb 3, 2022
- Synopsys, Inc.
- Thomas CECIL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DOSE INFORMATION GENERATION AND COMMUNICATION FOR LITHOGRAPHY MANUF...
- Publication number 20220035241
- Publication date Feb 3, 2022
- Synopsys, Inc.
- Thomas CECIL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOSE OPTIMIZATION TECHNIQUES FOR MASK SYNTHESIS TOOLS
- Publication number 20220035242
- Publication date Feb 3, 2022
- Synopsys, Inc.
- Thomas CECIL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK SYNTHESIS USING DESIGN GUIDED OFFSETS
- Publication number 20210405522
- Publication date Dec 30, 2021
- Synopsys, Inc.
- Thomas CECIL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OBTAINING A MASK USING A COST FUNCTION GRADIENT FROM A JACOBIAN MAT...
- Publication number 20210294207
- Publication date Sep 23, 2021
- Synopsys, Inc.
- Thomas CECIL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SKELETON REPRESENTATION OF LAYOUTS FOR THE DEVELOPMENT OF LITHOGRAP...
- Publication number 20210255539
- Publication date Aug 19, 2021
- Synopsys, Inc.
- Thomas C. Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS
- Publication number 20210181620
- Publication date Jun 17, 2021
- Synopsys, Inc.
- Amyn A. POONAWALA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NEURAL NETWORK BASED MASK SYNTHESIS FOR INTEGRATED CIRCUITS
- Publication number 20210064977
- Publication date Mar 4, 2021
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...
- Publication number 20210018831
- Publication date Jan 21, 2021
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS
- Publication number 20200387660
- Publication date Dec 10, 2020
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY-BASED PATTERN OPTIMIZATION
- Publication number 20200379344
- Publication date Dec 3, 2020
- Synopsys, Inc.
- Thomas CECIL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLASSIFICATION OF PATTERNS IN AN ELECTRONIC CIRCUIT LAYOUT USING MA...
- Publication number 20200372365
- Publication date Nov 26, 2020
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Rule Based Assist Feature Placement Using Skeletons
- Publication number 20180341740
- Publication date Nov 29, 2018
- Synopsys, Inc.
- Thomas C. Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION FOR SHOT GENERATION
- Publication number 20170032076
- Publication date Feb 2, 2017
- Synopsys, Inc.
- Michael Lawrence Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MATRIX REDUCTION FOR LITHOGRAPHY SIMULATION
- Publication number 20160098511
- Publication date Apr 7, 2016
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION WITH SHOT OPTIMIZATION
- Publication number 20160042118
- Publication date Feb 11, 2016
- Synopsys, Inc.
- Michael Lawrence Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION USING SHOT OPTIMIZATION
- Publication number 20140282290
- Publication date Sep 18, 2014
- Synopsys, Inc.
- Michael Lawrence Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHICALLY ENHANCED EDGE DETERMINATION
- Publication number 20130139116
- Publication date May 30, 2013
- Luminescent Technologies, Inc.
- Tatung Chow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Full-Field Mask Error Enhancement Function
- Publication number 20110211748
- Publication date Sep 1, 2011
- Guangming Xiao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Technique for Determining Mask Patterns and Write Patterns
- Publication number 20090075183
- Publication date Mar 19, 2009
- Thomas C. Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thomas Christopher Cecil

Person

Patents Grantslast 30 patents

Enforcing mask synthesis consistency across random areas of integra...

Skeleton representation of layouts for the development of lithograp...

Dose information generation and communication for lithography manuf...

Inverse lithography and machine learning for mask synthesis

Mask rule checking for curvilinear masks for electronic circuits

Mask synthesis using design guided offsets

Classification of patterns in an electronic circuit layout using ma...

Wafer sensitivity determination and communication

Dose optimization techniques for mask synthesis tools

Obtaining a mask using a cost function gradient from a jacobian mat...

Mask rule checking for curvilinear masks for electronic circuits

Lithography-based pattern optimization

Enforcing mask synthesis consistency across random areas of integra...

Mask rule checking for curvilinear masks for electronic circuits

Obtaining a mask using a cost function gradient from a Jacobian mat...

Matrix reduction for lithography simulation

Sub-resolution assist feature implementation for shot generation

Rule based assist feature placement using skeletons

Sub-resolution assist feature implementation with shot optimization

Sub-resolution assist feature implementation using shot optimization

Full-field mask error enhancement function

Lithographically enhanced edge determination

Technique for determining mask patterns and write patterns

Patents Applicationslast 30 patents

ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...

MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS

Enforcing mask synthesis consistency across random areas of integra...

MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS

WAFER SENSITIVITY DETERMINATION AND COMMUNICATION

DOSE INFORMATION GENERATION AND COMMUNICATION FOR LITHOGRAPHY MANUF...

DOSE OPTIMIZATION TECHNIQUES FOR MASK SYNTHESIS TOOLS

MASK SYNTHESIS USING DESIGN GUIDED OFFSETS

OBTAINING A MASK USING A COST FUNCTION GRADIENT FROM A JACOBIAN MAT...

SKELETON REPRESENTATION OF LAYOUTS FOR THE DEVELOPMENT OF LITHOGRAP...

INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS

NEURAL NETWORK BASED MASK SYNTHESIS FOR INTEGRATED CIRCUITS

ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...

MASK RULE CHECKING FOR CURVILINEAR MASKS FOR ELECTRONIC CIRCUITS

LITHOGRAPHY-BASED PATTERN OPTIMIZATION

CLASSIFICATION OF PATTERNS IN AN ELECTRONIC CIRCUIT LAYOUT USING MA...

Rule Based Assist Feature Placement Using Skeletons

SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION FOR SHOT GENERATION

MATRIX REDUCTION FOR LITHOGRAPHY SIMULATION

SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION WITH SHOT OPTIMIZATION

SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION USING SHOT OPTIMIZATION

LITHOGRAPHICALLY ENHANCED EDGE DETERMINATION

Full-Field Mask Error Enhancement Function

Technique for Determining Mask Patterns and Write Patterns