Thomas G. Mallon

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for adjusting the density of lines and contact openings acro...
- Patent number 6,109,775
- Issue date Aug 29, 2000
- LSI Logic Corporation
- Prabhakar P. Tripathi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit processing wafer having a PECVD ma...
- Patent number 5,876,838
- Issue date Mar 2, 1999
- LSI Logic Corporation
- Thomas G. Mallon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Technique for improving within-wafer non-uniformity of material rem...
- Patent number 5,722,877
- Issue date Mar 3, 1998
- Lam Research Corporation
- Anthony S. Meyer
- B24 - GRINDING POLISHING
Information Patent Grant
Method for the controlled formation of voids in doped glass dielect...
- Patent number 5,719,084
- Issue date Feb 17, 1998
- LSI Logic Corporation
- Thomas G. Mallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Keyed end effector for CMP pad conditioner
- Patent number 5,667,433
- Issue date Sep 16, 1997
- LSI Logic Corporation
- Thomas G. Mallon
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma enhanced chemical vapor reactor with shaped electrodes
- Patent number 5,628,869
- Issue date May 13, 1997
- LSI Logic Corporation
- Thomas G. Mallon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques for assembling polishing pads for chemi-mechanical polis...
- Patent number 5,624,304
- Issue date Apr 29, 1997
- LSI Logic, Inc.
- Nicholas F. Pasch
- B24 - GRINDING POLISHING
Information Patent Grant
Techniques for assembling polishing pads for chemical-mechanical po...
- Patent number 5,516,400
- Issue date May 14, 1996
- LSI Logic Corporation
- Nicholas F. Pasch
- B24 - GRINDING POLISHING
Information Patent Grant
Faraday cage for barrel-style plasma etchers
- Patent number 5,362,353
- Issue date Nov 8, 1994
- LSI Logic Corporation
- Thomas G. Mallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for assembling polishing pads for chemi-mechanical polis...
- Patent number 5,310,455
- Issue date May 10, 1994
- LSI Logic Corporation
- Nicholas F. Pasch
- B24 - GRINDING POLISHING
Information Patent Grant
Method for the controlled formation of voids in doped glass dielect...
- Patent number 5,278,103
- Issue date Jan 11, 1994
- LSI Logic Corporation
- Thomas G. Mallon
- H01 - BASIC ELECTRIC ELEMENTS

Thomas G. Mallon

Person

Patents Grantslast 30 patents

Method for adjusting the density of lines and contact openings acro...

Semiconductor integrated circuit processing wafer having a PECVD ma...

Technique for improving within-wafer non-uniformity of material rem...

Method for the controlled formation of voids in doped glass dielect...

Keyed end effector for CMP pad conditioner

Plasma enhanced chemical vapor reactor with shaped electrodes

Techniques for assembling polishing pads for chemi-mechanical polis...

Techniques for assembling polishing pads for chemical-mechanical po...

Faraday cage for barrel-style plasma etchers

Techniques for assembling polishing pads for chemi-mechanical polis...

Method for the controlled formation of voids in doped glass dielect...