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Thomas Hoffman
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Hillsboro, OR, US
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last 30 patents
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Patent Grant
Method for improving transistor performance through reducing the sa...
Patent number
9,437,710
Issue date
Sep 6, 2016
Intel Corporation
Anand Murthy
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for improving transistor performance through reducing the sa...
Patent number
9,202,889
Issue date
Dec 1, 2015
Intel Corporation
Anand Murthy
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for improving transistor performance through reducing the sa...
Patent number
8,482,043
Issue date
Jul 9, 2013
Intel Corporation
Anand Murthy
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Gate-induced strain for MOS performance improvement
Patent number
6,982,433
Issue date
Jan 3, 2006
Intel Corporation
Thomas Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
METHOD FOR IMPROVING TRANSISTOR PERFORMANCE THROUGH REDUCING THE SA...
Publication number
20160336446
Publication date
Nov 17, 2016
Intel Corporation
Anand Murthy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR IMPROVING TRANSISTOR PERFORMANCE THROUGH REDUCING THE SA...
Publication number
20160336447
Publication date
Nov 17, 2016
Intel Corporation
Anand Murthy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR IMPROVING TRANSISTOR PERFORMANCE THROUGH REDUCING THE SA...
Publication number
20150108546
Publication date
Apr 23, 2015
lntel Corporation
Anand MURTHY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR IMPROVING TRANSISTOR PERFORMANCE THROUGH REDUCING THE SA...
Publication number
20130302961
Publication date
Nov 14, 2013
Anand Murthy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Short channel effect of MOS devices by retrograde well engineering...
Publication number
20080311720
Publication date
Dec 18, 2008
Thomas Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Codoping of source drains using carbon or fluorine ion implants to...
Publication number
20040102013
Publication date
May 27, 2004
Jack Hwang
H01 - BASIC ELECTRIC ELEMENTS