Thomas I. WALLOW

Person

San Carlos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for scanning a sample by a charged particle beam system
- Patent number 11,658,004
- Issue date May 23, 2023
- ASML Netherlands B.V.
- Adam Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for scanning a sample by a charged particle beam system
- Patent number 11,127,563
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Adam Lyons
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for pattern correction and verification
- Patent number 10,754,256
- Issue date Aug 25, 2020
- ASML Netherlands B.V.
- Thomas I. Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gauge pattern selection
- Patent number 10,663,870
- Issue date May 26, 2020
- ASML Netherlands B.V.
- Jun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch-assist features
- Patent number 10,627,722
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical metrology of lithographic processes using asymmetric sub-re...
- Patent number 10,417,359
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing lithographic processes using laser annealing techniques
- Patent number 8,889,343
- Issue date Nov 18, 2014
- GLOBALFOUNDRIES Inc.
- Moshe E Preil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a photoresist pattern on a semiconductor wafer u...
- Patent number 8,852,854
- Issue date Oct 7, 2014
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming semiconductor device with multiple level patterning
- Patent number 8,815,748
- Issue date Aug 26, 2014
- Advanced Micro Devices, Inc.
- Thomas Ingolf Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a high resolution resist pattern on a semicond...
- Patent number 8,715,912
- Issue date May 6, 2014
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spacer lithography
- Patent number 8,642,474
- Issue date Feb 4, 2014
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a high resolution resist pattern on a semiconduc...
- Patent number 8,586,269
- Issue date Nov 19, 2013
- GLOBALFOUNDRIES Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming semiconductor device
- Patent number 8,236,592
- Issue date Aug 7, 2012
- GLOBALFOUNDRIES Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for performing photolithography using BARCs having graded o...
- Patent number 8,153,351
- Issue date Apr 10, 2012
- Advanced Micro Devices, Inc.
- Thomas I. Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining low-noise power spectral density for charact...
- Patent number 8,067,252
- Issue date Nov 29, 2011
- Advanced Micro Devices, Inc.
- Yuansheng Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining suitability of a resist in semiconductor waf...
- Patent number 7,858,276
- Issue date Dec 28, 2010
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G01 - MEASURING TESTING
Information Patent Grant
Stabilization of deep ultraviolet photoresist
- Patent number 7,851,136
- Issue date Dec 14, 2010
- GLOBALFOUNDRIES Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV pellicle with increased EUV light transmittance
- Patent number 7,723,704
- Issue date May 25, 2010
- GLOBALFOUNDRIES Inc.
- Obert Reeves Wood, II
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Inverse self-aligned spacer lithography
- Patent number 7,718,529
- Issue date May 18, 2010
- GLOBALFOUNDRIES Inc.
- Yunfei Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV debris mitigation filter and method for fabricating semiconduct...
- Patent number 7,663,127
- Issue date Feb 16, 2010
- GLOBALFOUNDRIES Inc.
- Obert Reeves Wood, II
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for enhancing resolution of a chemically amplified photoresist
- Patent number 7,504,198
- Issue date Mar 17, 2009
- Advanced Micro Devices, Inc.
- Bruno LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM
- Publication number 20220084784
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Adam LYONS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM
- Publication number 20200211820
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Adam LYONS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH-ASSIST FEATURES
- Publication number 20190018313
- Publication date Jan 17, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVEMENTS IN GAUGE PATTERN SELECTION
- Publication number 20180364589
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Jun CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION
- Publication number 20180275521
- Publication date Sep 27, 2018
- ASML NETHERLANDS B.V.
- Thomas I. WALLOW
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RE...
- Publication number 20170177760
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Robert John SOCHA
- G01 - MEASURING TESTING
Information Patent Application
OPTIMIZING LITHOGRAPHIC PROCESSES USING LASER ANNEALING TECHNIQUES
- Publication number 20140178824
- Publication date Jun 26, 2014
- GLOBALFOUNDRIES INC.
- Moshe E Preil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR PERFORMING PHOTOLITHOGRAPHY USING BARCS HAVING GRADED O...
- Publication number 20100099045
- Publication date Apr 22, 2010
- Advanced Micro Devices, Inc.
- Thomas I. WALLOW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE SELF-ALIGNED SPACER LITHOGRAPHY
- Publication number 20090023298
- Publication date Jan 22, 2009
- Advanced Micro Devices, Inc.
- Yunfei Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER LITHOGRAPHY
- Publication number 20090017628
- Publication date Jan 15, 2009
- Advanced Micro Devices, Inc.
- Ryoung-han KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining suitability of a resist in semiconductor waf...
- Publication number 20090011524
- Publication date Jan 8, 2009
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G01 - MEASURING TESTING
Information Patent Application
Method for producing a high resolution resist pattern on a semicond...
- Publication number 20080292996
- Publication date Nov 27, 2008
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH FIDELITY MULTIPLE RESIST PATTERNING
- Publication number 20080292991
- Publication date Nov 27, 2008
- Advanced Micro Devices, Inc.
- Thomas I. Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a high resolution resist pattern on a semiconduc...
- Publication number 20080233494
- Publication date Sep 25, 2008
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV debris mitigation filter and method for fabricating semiconduct...
- Publication number 20080225245
- Publication date Sep 18, 2008
- Advanced Micro Devices, Inc.
- Obert Reeves Wood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a photoresist pattern on a semiconductor wafer u...
- Publication number 20080199813
- Publication date Aug 21, 2008
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining low-noise power spectral density for charact...
- Publication number 20080194046
- Publication date Aug 14, 2008
- Advanced Micro Devices, Inc.
- Yuansheng Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE
- Publication number 20080171446
- Publication date Jul 17, 2008
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE WITH MULTIPLE LEVEL PATTERNING
- Publication number 20080171447
- Publication date Jul 17, 2008
- Advanced Micro Devices, Inc.
- Thomas Ingolf Wallow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV pellicle with increased EUV light transmittance
- Publication number 20080113491
- Publication date May 15, 2008
- Advanced Micro Devices, Inc.
- Obert Reeves Wood
- B82 - NANO-TECHNOLOGY
Information Patent Application
STABILIZATION OF DEEP ULTRAVIOLET PHOTORESIST
- Publication number 20070281248
- Publication date Dec 6, 2007
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for enhancing resolution of a chemically amplified photoresist
- Publication number 20070275321
- Publication date Nov 29, 2007
- Bruno LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thomas I. WALLOW

Person

Patents Grantslast 30 patents

Method for scanning a sample by a charged particle beam system

Method for scanning a sample by a charged particle beam system

Method and apparatus for pattern correction and verification

Gauge pattern selection

Etch-assist features

Optical metrology of lithographic processes using asymmetric sub-re...

Optimizing lithographic processes using laser annealing techniques

Method for forming a photoresist pattern on a semiconductor wafer u...

Method of forming semiconductor device with multiple level patterning

Method for producing a high resolution resist pattern on a semicond...

Spacer lithography

Method for forming a high resolution resist pattern on a semiconduc...

Method of forming semiconductor device

Methods for performing photolithography using BARCs having graded o...

Method for determining low-noise power spectral density for charact...

Method for determining suitability of a resist in semiconductor waf...

Stabilization of deep ultraviolet photoresist

EUV pellicle with increased EUV light transmittance

Inverse self-aligned spacer lithography

EUV debris mitigation filter and method for fabricating semiconduct...

Methods for enhancing resolution of a chemically amplified photoresist

Patents Applicationslast 30 patents

METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM

METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM

ETCH-ASSIST FEATURES

IMPROVEMENTS IN GAUGE PATTERN SELECTION

METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION

OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RE...

OPTIMIZING LITHOGRAPHIC PROCESSES USING LASER ANNEALING TECHNIQUES

METHODS FOR PERFORMING PHOTOLITHOGRAPHY USING BARCS HAVING GRADED O...

INVERSE SELF-ALIGNED SPACER LITHOGRAPHY

SPACER LITHOGRAPHY

Method for determining suitability of a resist in semiconductor waf...

Method for producing a high resolution resist pattern on a semicond...

HIGH FIDELITY MULTIPLE RESIST PATTERNING

Method for forming a high resolution resist pattern on a semiconduc...

EUV debris mitigation filter and method for fabricating semiconduct...

Method for forming a photoresist pattern on a semiconductor wafer u...

Method for determining low-noise power spectral density for charact...

METHOD OF FORMING SEMICONDUCTOR DEVICE

METHOD OF FORMING SEMICONDUCTOR DEVICE WITH MULTIPLE LEVEL PATTERNING

EUV pellicle with increased EUV light transmittance

STABILIZATION OF DEEP ULTRAVIOLET PHOTORESIST

Methods for enhancing resolution of a chemically amplified photoresist