Thomas LAIDIG

Person

Richmond, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Overlaying on locally dispositioned patterns by ML based dynamic di...
- Patent number 11,934,762
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Tamer Coskun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,899,379
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling light source wavelengths for selectable phase shifts be...
- Patent number 11,899,198
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G02 - OPTICS
Information Patent Grant
Use of adaptive replacement maps in digital lithography for local c...
- Patent number 11,868,700
- Issue date Jan 9, 2024
- Applied Materials Inc.
- Aravind Inumpudi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,599,032
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resolution enhanced digital lithography with anti-blazed DMD
- Patent number 10,983,441
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Thomas L. Laidig
- G02 - OPTICS
Information Patent Grant
Half tone scheme for maskless lithography
- Patent number 10,935,890
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Freeform distortion correction
- Patent number 10,935,892
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reserving spatial light modulator sections to address field non-uni...
- Patent number 10,921,714
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reserving spatial light modulator sections to address field non-uni...
- Patent number 10,705,433
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 10,678,150
- Issue date Jun 9, 2020
- Applied Materials, Inc.
- Uwe Hollerbach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shifting of patterns to reduce line waviness
- Patent number 10,591,815
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half tone scheme for maskless lithography
- Patent number 10,571,809
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reserving spatial light modulator sections to address field non-uni...
- Patent number 10,503,076
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line edge roughness reduction via step size alteration
- Patent number 10,495,975
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half tone scheme for maskless lithography
- Patent number 10,495,979
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce data stream for spatial light modulator
- Patent number 10,488,762
- Issue date Nov 26, 2019
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce line waviness
- Patent number 10,416,550
- Issue date Sep 17, 2019
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Digital photolithography using compact eye module layout
- Patent number 10,409,172
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- David Markle
- G02 - OPTICS
Information Patent Grant
Apparatus and methods for on-the-fly digital exposure image data mo...
- Patent number 10,379,450
- Issue date Aug 13, 2019
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resolution enhanced digital lithography with anti-blazed DMD
- Patent number 10,372,042
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Real time software and array control
- Patent number 10,331,038
- Issue date Jun 25, 2019
- Applied Materials, Inc.
- Uwe Hollerbach
- G05 - CONTROLLING REGULATING
Information Patent Grant
Line edge roughness reduction via step size alteration
- Patent number 10,289,003
- Issue date May 14, 2019
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active eye-to-eye with alignment by X-Y capacitance measurement
- Patent number 10,114,297
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parallel image processing system
- Patent number 10,037,589
- Issue date Jul 31, 2018
- Applied Materials, Inc.
- Barry Keane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Environmental control of systems for photolithography process
- Patent number 10,036,966
- Issue date Jul 31, 2018
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for vibration damping stage
- Patent number 10,031,427
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for on-the-fly digital exposure image data mo...
- Patent number 9,927,723
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce line waviness
- Patent number 9,927,696
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with monitoring optical output power
- Patent number 9,907,152
- Issue date Feb 27, 2018
- Applied Materials, Inc.
- Jeffrey Kaskey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SCALING FOR DIE-LAST ADVANCED IC PACKAGING
- Publication number 20240126180
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING
- Publication number 20240094648
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Uwe HOLLERBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...
- Publication number 20240012978
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Aravind INUMPUDI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
- Publication number 20230408807
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...
- Publication number 20230314953
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...
- Publication number 20230169253
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Aravind INUMPUDI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING
- Publication number 20230161274
- Publication date May 25, 2023
- Applied Materials, Inc.
- Uwe HOLLERBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20230152712
- Publication date May 18, 2023
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DI...
- Publication number 20230040198
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- Tamer COSKUN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF A DIGITAL PATTERN FILE FOR A DIGITAL LITHOGRAPHY DE...
- Publication number 20220367438
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Chung-Shin KANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-TONE SCHEME FOR MASKLESS LITHOGRAPHY
- Publication number 20220326616
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Christopher Dennis BENCHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING
- Publication number 20210341849
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Uwe HOLLERBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...
- Publication number 20200301288
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALF TONE SCHEME FOR MASKLESS LITHOGRAPHY
- Publication number 20200264517
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Christopher Dennis BENCHER
- G02 - OPTICS
Information Patent Application
DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING
- Publication number 20200159132
- Publication date May 21, 2020
- Applied Materials, Inc.
- Uwe HOLLERBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...
- Publication number 20200073253
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS
- Publication number 20200004132
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESOLUTION ENHANCED DIGITAL LITHOGRAPHY WITH ANTI-BLAZED DMD
- Publication number 20190361353
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL TIME SOFTWARE AND ARRAY CONTROL
- Publication number 20190271916
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Uwe HOLLERBACH
- G05 - CONTROLLING REGULATING
Information Patent Application
LINE EDGE ROUGHNESS REDUCTION VIA STEP SIZE ALTERATION
- Publication number 20190243250
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREEFORM DISTORTION CORRECTION
- Publication number 20180329310
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE LINE WAVINESS
- Publication number 20180217491
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESOLUTION ENHANCED DIGITAL LITHOGRAPHY WITH ANTI-BLAZED DMD
- Publication number 20180210346
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHODS FOR ON -THE-FLY DIGITAL EXPOSURE IMAGE DATA M...
- Publication number 20180129142
- Publication date May 10, 2018
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G01 - MEASURING TESTING
Information Patent Application
ACTIVE EYE-TO-EYE WITH ALIGNMENT BY X-Y CAPACITANCE MEASUREMENT
- Publication number 20180024436
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FRUSTRATED CUBE ASSEMBLY
- Publication number 20180017781
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- David MARKLE
- G02 - OPTICS
Information Patent Application
METHOD TO REDUCE LINE WAVINESS
- Publication number 20180004099
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE LINE WAVINESS
- Publication number 20170293232
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Joseph R. JOHNSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPACT EYE MODULE LAYOUT
- Publication number 20170219934
- Publication date Aug 3, 2017
- Applied Materials, Inc.
- David MARKLE
- G02 - OPTICS
Information Patent Application
ENVIRONMENTAL CONTROL OF SYSTEMS FOR PHOTOLITHOGRAPHY PROCESS
- Publication number 20170168403
- Publication date Jun 15, 2017
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thomas LAIDIG

Person

Patents Grantslast 30 patents

Overlaying on locally dispositioned patterns by ML based dynamic di...

Dynamic generation of layout adaptive packaging

Controlling light source wavelengths for selectable phase shifts be...

Use of adaptive replacement maps in digital lithography for local c...

Dynamic generation of layout adaptive packaging

Resolution enhanced digital lithography with anti-blazed DMD

Half tone scheme for maskless lithography

Freeform distortion correction

Reserving spatial light modulator sections to address field non-uni...

Reserving spatial light modulator sections to address field non-uni...

Dynamic generation of layout adaptive packaging

Shifting of patterns to reduce line waviness

Half tone scheme for maskless lithography

Reserving spatial light modulator sections to address field non-uni...

Line edge roughness reduction via step size alteration

Half tone scheme for maskless lithography

Method to reduce data stream for spatial light modulator

Method to reduce line waviness

Digital photolithography using compact eye module layout

Apparatus and methods for on-the-fly digital exposure image data mo...

Resolution enhanced digital lithography with anti-blazed DMD

Real time software and array control

Line edge roughness reduction via step size alteration

Active eye-to-eye with alignment by X-Y capacitance measurement

Parallel image processing system

Environmental control of systems for photolithography process

Methods and apparatus for vibration damping stage

Apparatus and methods for on-the-fly digital exposure image data mo...

Method to reduce line waviness

Illumination system with monitoring optical output power

Patents Applicationslast 30 patents

SCALING FOR DIE-LAST ADVANCED IC PACKAGING

DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING

USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...

CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...

USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...

DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DI...

OPTIMIZATION OF A DIGITAL PATTERN FILE FOR A DIGITAL LITHOGRAPHY DE...

MULTI-TONE SCHEME FOR MASKLESS LITHOGRAPHY

DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING

RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...

HALF TONE SCHEME FOR MASKLESS LITHOGRAPHY

DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING

RESERVING SPATIAL LIGHT MODULATOR SECTIONS TO ADDRESS FIELD NON-UNI...

SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS

RESOLUTION ENHANCED DIGITAL LITHOGRAPHY WITH ANTI-BLAZED DMD

REAL TIME SOFTWARE AND ARRAY CONTROL

LINE EDGE ROUGHNESS REDUCTION VIA STEP SIZE ALTERATION

FREEFORM DISTORTION CORRECTION

METHOD TO REDUCE LINE WAVINESS

RESOLUTION ENHANCED DIGITAL LITHOGRAPHY WITH ANTI-BLAZED DMD

APPARATUS AND METHODS FOR ON -THE-FLY DIGITAL EXPOSURE IMAGE DATA M...

ACTIVE EYE-TO-EYE WITH ALIGNMENT BY X-Y CAPACITANCE MEASUREMENT

FRUSTRATED CUBE ASSEMBLY

METHOD TO REDUCE LINE WAVINESS

METHOD TO REDUCE LINE WAVINESS

COMPACT EYE MODULE LAYOUT

ENVIRONMENTAL CONTROL OF SYSTEMS FOR PHOTOLITHOGRAPHY PROCESS