Thomas Okon

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Aalen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method for correcting a lithography projection objective, and such...
- Patent number 8,659,744
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Wilhelm Ulrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting a lithography projection objective, and such...
- Patent number 8,174,676
- Issue date May 8, 2012
- Carl Zeiss SMT GmbH
- Wilhelm Ulrich
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
METHOD FOR CORRECTING A LITHOGRAPHY PROJECTION OBJECTIVE, AND SUCH...
- Publication number 20120188636
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
METHOD FOR CORRECTING A LITHOGRAPHY PROJECTION OBJECTIVE, AND SUCH...
- Publication number 20110279803
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Microlithography projection objective
- Publication number 20090115986
- Publication date May 7, 2009
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
Method for correcting a lithography projection objective, and such...
- Publication number 20070019305
- Publication date Jan 25, 2007
- Wilhelm Ulrich
- G02 - OPTICS