Thomas Thaler

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for characterizing a microlithographic mask
- Patent number 11,914,303
- Issue date Feb 27, 2024
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring photomasks
- Patent number 11,899,358
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and appliance for predicting the imaging result obtained wit...
- Patent number 10,788,748
- Issue date Sep 29, 2020
- Carl Zeiss SMT GmbH
- Thomas Thaler
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 10,698,318
- Issue date Jun 30, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting the critical dimension uniformity of a photom...
- Patent number 10,578,975
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Thomas Thaler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for determining an OPC model
- Patent number 10,539,865
- Issue date Jan 21, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for examining a mask
- Patent number 9,869,640
- Issue date Jan 16, 2018
- Carl Zeiss SMT GmbH
- Thomas Trautzsch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Emulation of reproduction of masks corrected by local density varia...
- Patent number 9,535,244
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20240152057
- Publication date May 9, 2024
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20210397099
- Publication date Dec 23, 2021
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING PHOTOMASKS
- Publication number 20210255541
- Publication date Aug 19, 2021
- Carl Zeiss SMT GMBH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPLIANCE FOR PREDICTING THE IMAGING RESULT OBTAINED WIT...
- Publication number 20190107776
- Publication date Apr 11, 2019
- Carl Zeiss SMT GMBH
- Thomas Thaler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Correcting the Critical Dimension Uniformity of a Photom...
- Publication number 20190107783
- Publication date Apr 11, 2019
- Carl Zeiss SMT GMBH
- Thomas Thaler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY
- Publication number 20190011839
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Holger Seitz
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR DETERMINING AN OPC MODEL
- Publication number 20180095358
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
Method and device for examining a mask
- Publication number 20150198541
- Publication date Jul 16, 2015
- CARL ZEISS SMS GMBH
- Thomas Trautzsch
- G01 - MEASURING TESTING
Information Patent Application
EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...
- Publication number 20150198798
- Publication date Jul 16, 2015
- CARL ZEISS SMS GMBH
- Holger Seitz
- G02 - OPTICS

Thomas Thaler

Person

Patents Grantslast 30 patents

Apparatus and method for characterizing a microlithographic mask

Method for measuring photomasks

Method and appliance for predicting the imaging result obtained wit...

Method and device for characterizing a mask for microlithography

Method for correcting the critical dimension uniformity of a photom...

Method and device for determining an OPC model

Method and device for examining a mask

Emulation of reproduction of masks corrected by local density varia...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

METHOD FOR MEASURING PHOTOMASKS

METHOD AND APPLIANCE FOR PREDICTING THE IMAGING RESULT OBTAINED WIT...

Method for Correcting the Critical Dimension Uniformity of a Photom...

METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY

METHOD AND DEVICE FOR DETERMINING AN OPC MODEL

Method and device for examining a mask

EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...