Thomas Theeuwes

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for process metrology
- Patent number 12,007,697
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,947,269
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,784,098
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for performing a manufacturing process and associated appara...
- Patent number 11,733,606
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Theeuwes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,728,224
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process metrology
- Patent number 11,385,551
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,143,972
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,145,557
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining a height profile, a measurement system and a...
- Patent number 11,137,695
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,185
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,184
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,871,367
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,845,713
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Thomas Theeuwes
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 10,816,904
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,677,589
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alok Verma
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter, a...
- Patent number 10,615,084
- Issue date Apr 7, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,546,790
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,481,503
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 10,453,758
- Issue date Oct 22, 2019
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Estimation of data in metrology
- Patent number 10,429,746
- Issue date Oct 1, 2019
- ASML Netherlands B.V.
- Alexandru Onose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, and lithographic apparatus
- Patent number 9,927,717
- Issue date Mar 27, 2018
- ASML Netherlands B.V.
- Kyu Kab Rhe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining focus corrections, lithographic processing ce...
- Patent number 9,360,770
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Arend Johannes Kisteman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining focus corrections, lithographic processing ce...
- Patent number 9,360,769
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Arend Johannes Kisteman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHODS AND APPARATUSES
- Publication number 20240061346
- Publication date Feb 22, 2024
- Thomas THEEUWES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240014078
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20230161265
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Pioter NIKOLSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20220342319
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESS METROLOGY
- Publication number 20220326625
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Bert VERSTRAETEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20220066330
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210384086
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210335678
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESS METROLOGY
- Publication number 20210302845
- Publication date Sep 30, 2021
- ASML NETHERLANDS B.V.
- Bert VERSTRAETEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PERFORMING A MANUFACTURING PROCESS AND ASSOCIATED APPARA...
- Publication number 20210240073
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Thomas THEEUWES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20210003927
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20200284578
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200185281
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200126872
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200013685
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
A METHOD OF DETERMINING A HEIGHT PROFILE, A MEASUREMENT SYSTEM AND...
- Publication number 20190294060
- Publication date Sep 26, 2019
- ASML Nethertands B.V.
- Arend Johannes DONKERBROEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20190271919
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Davit HARUTYUNYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20190163075
- Publication date May 30, 2019
- ASML NETHERLANDS B.V.
- Thomas THEEUWES
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20190155173
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ESTIMATION OF DATA IN METROLOGY
- Publication number 20190129313
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20190086810
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20190063911
- Publication date Feb 28, 2019
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255738
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255736
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170256465
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING

Thomas Theeuwes

Person

Patents Grantslast 30 patents

Method and apparatus to determine a patterning process parameter us...

Method for process metrology

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method for performing a manufacturing process and associated appara...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Separation of contributions to metrology data

Method for process metrology

Method for determining contribution to a fingerprint

Methods and patterning devices and apparatuses for measuring focus...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method of determining a height profile, a measurement system and a...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic pr...

Substrate, metrology apparatus and associated methods for a lithogr...

Metrology method and apparatus, computer program and lithographic s...

Method for determining contribution to a fingerprint

Method and apparatus to determine a patterning process parameter

Substrate, metrology apparatus and associated methods for a lithogr...

Method and apparatus to determine a patterning process parameter, a...

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic pr...

Method and apparatus to determine a patterning process parameter us...

Estimation of data in metrology

Inspection method and apparatus, and lithographic apparatus

Method of determining focus corrections, lithographic processing ce...

Method of determining focus corrections, lithographic processing ce...

Patents Applicationslast 30 patents

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY METHODS AND APPARATUSES

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR PROCESS METROLOGY

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD FOR PROCESS METROLOGY

METHOD FOR PERFORMING A MANUFACTURING PROCESS AND ASSOCIATED APPARA...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

A METHOD OF DETERMINING A HEIGHT PROFILE, A MEASUREMENT SYSTEM AND...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

ESTIMATION OF DATA IN METROLOGY

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER