Thorsten Schedel

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask assembly with reflective photomask and method of manufact...
- Patent number 11,537,039
- Issue date Dec 27, 2022
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective photomask and reflection-type mask blank
- Patent number 10,031,409
- Issue date Jul 24, 2018
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Bender
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnect structures and methods
- Patent number 8,097,955
- Issue date Jan 17, 2012
- Qimonda AG
- Bernd Zimmermann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for purging an optical lens
- Patent number 7,304,716
- Issue date Dec 4, 2007
- Infineon Technologies AG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting a substrate in an appliance for carrying out e...
- Patent number 7,248,365
- Issue date Jul 24, 2007
- Infineon Technologies AG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the relative positional accuracy of two stru...
- Patent number 7,186,484
- Issue date Mar 6, 2007
- Infineon Technologies AG
- Heiko Hommen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing at least one or at least two semiconductor wafers
- Patent number 6,979,522
- Issue date Dec 27, 2005
- Infineon Technologies AG
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing an alignment measurement of two patterns in d...
- Patent number 6,908,775
- Issue date Jun 21, 2005
- Infineon Technologies AG
- Rolf Heine
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for adjusting processing parameters of at least one plate-sh...
- Patent number 6,892,108
- Issue date May 10, 2005
- Infineon Technologies SC300 GmbH & Co. KG
- Karl Mautz
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for exposing a semiconductor wafer
- Patent number 6,887,722
- Issue date May 3, 2005
- Infineon Technologies SC300 GmbH & Co. KG
- Thorsten Schedel
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for aligning and exposing a semiconductor wafer
- Patent number 6,861,331
- Issue date Mar 1, 2005
- Infineon Technologies AG
- Martin Rössiger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for adjusting a temperature in a resist process
- Patent number 6,806,008
- Issue date Oct 19, 2004
- Infineon Technologies SC300 GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling the quality of a lithographic structuring step
- Patent number 6,780,552
- Issue date Aug 24, 2004
- Infineon Technologies AG
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a processing device for a sequential process...
- Patent number 6,684,124
- Issue date Jan 27, 2004
- Infineon Technologies AG
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for clamping a semiconductor device in a manufacturing process
- Patent number 6,593,254
- Issue date Jul 15, 2003
- Infineon Technologies AG
- Manfred Kraxenberger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Photomask Assembly with Reflective Photomask and Method of Manufact...
- Publication number 20200225571
- Publication date Jul 16, 2020
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK AND REFLECTION-TYPE MASK BLANK
- Publication number 20170108766
- Publication date Apr 20, 2017
- Advanced Mask Technology Center GmbH & Co. KG
- Markus Bender
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interconnect Structures and Methods
- Publication number 20100090317
- Publication date Apr 15, 2010
- Bernd Zimmermann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Enhancing the Adhesion of a Passivation Layer on a Semic...
- Publication number 20090166848
- Publication date Jul 2, 2009
- Volker Berghof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for the preferred processing of workpieces of highest priority
- Publication number 20070005170
- Publication date Jan 4, 2007
- Thorsten Schedel
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for purging an optical lens
- Publication number 20050269748
- Publication date Dec 8, 2005
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining the relative positional accuracy of two stru...
- Publication number 20050260510
- Publication date Nov 24, 2005
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a mask adapted to an exposure apparatus
- Publication number 20050106476
- Publication date May 19, 2005
- Jens Hassmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for adjusting processing parameters of at least one plate-sh...
- Publication number 20040125191
- Publication date Jul 1, 2004
- Karl Mautz
- G05 - CONTROLLING REGULATING
Information Patent Application
Configuration and method for detecting defects on a substrate in a...
- Publication number 20040117055
- Publication date Jun 17, 2004
- Torsten Seidel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for adjusting a substrate in an appliance for carrying out e...
- Publication number 20040100625
- Publication date May 27, 2004
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for performing an alignment measurement of two patterns in d...
- Publication number 20040101984
- Publication date May 27, 2004
- Rolf Heine
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for aligning and exposing a semiconductor wafer
- Publication number 20040082085
- Publication date Apr 29, 2004
- Martin Rossiger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for exposing a semiconductor wafer
- Publication number 20040029027
- Publication date Feb 12, 2004
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for exposing at least one or at least two semiconductor wafers
- Publication number 20040029025
- Publication date Feb 12, 2004
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for controlling the quality of a lithographic structuring step
- Publication number 20030039905
- Publication date Feb 27, 2003
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for adjusting a temperature in a resist process
- Publication number 20030008242
- Publication date Jan 9, 2003
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for controlling a process appliance for the sequential proce...
- Publication number 20020183879
- Publication date Dec 5, 2002
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for clamping a semiconductor device in a manufacturing process
- Publication number 20020132393
- Publication date Sep 19, 2002
- Manfred Kraxenberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of adjusting a lithographic tool
- Publication number 20020051567
- Publication date May 2, 2002
- Dietmar Ganz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Thorsten Schedel

Person

Patents Grantslast 30 patents

Photomask assembly with reflective photomask and method of manufact...

Reflective photomask and reflection-type mask blank

Interconnect structures and methods

Method for purging an optical lens

Method for adjusting a substrate in an appliance for carrying out e...

Method for determining the relative positional accuracy of two stru...

Method for exposing at least one or at least two semiconductor wafers

Method for performing an alignment measurement of two patterns in d...

Method for adjusting processing parameters of at least one plate-sh...

Method for exposing a semiconductor wafer

Method for aligning and exposing a semiconductor wafer

Method for adjusting a temperature in a resist process

Method for controlling the quality of a lithographic structuring step

Method for controlling a processing device for a sequential process...

Method for clamping a semiconductor device in a manufacturing process

Patents Applicationslast 30 patents

Photomask Assembly with Reflective Photomask and Method of Manufact...

REFLECTIVE PHOTOMASK AND REFLECTION-TYPE MASK BLANK

Interconnect Structures and Methods

Method for Enhancing the Adhesion of a Passivation Layer on a Semic...

Method for the preferred processing of workpieces of highest priority

Method for purging an optical lens

Method for determining the relative positional accuracy of two stru...

Method for producing a mask adapted to an exposure apparatus

Method for adjusting processing parameters of at least one plate-sh...

Configuration and method for detecting defects on a substrate in a...

Method for adjusting a substrate in an appliance for carrying out e...

Method for performing an alignment measurement of two patterns in d...

Method for aligning and exposing a semiconductor wafer

Method for exposing a semiconductor wafer

Method for exposing at least one or at least two semiconductor wafers

Method for controlling the quality of a lithographic structuring step

Method for adjusting a temperature in a resist process

Method for controlling a process appliance for the sequential proce...

Method for clamping a semiconductor device in a manufacturing process

Method of adjusting a lithographic tool