Tilman Schwertner

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical arrangement in a projection objective of a microlithographi...
- Patent number 9,086,561
- Issue date Jul 21, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Optical element unit for exposure processes having sealing element
- Patent number 9,046,795
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography
- Patent number 8,553,202
- Issue date Oct 8, 2013
- Carl Zeiss SMT GmbH
- Jens Kugler
- G02 - OPTICS
Information Patent Grant
Optical module with minimized overrun of the optical element
- Patent number 8,441,747
- Issue date May 14, 2013
- Carl Zeiss SMT GmbH
- Willi Heintel
- G02 - OPTICS
Information Patent Grant
Holding device for optical element
- Patent number 7,869,147
- Issue date Jan 11, 2011
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
SUBASSEMBLY OF AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAP...
- Publication number 20160334719
- Publication date Nov 17, 2016
- Carl Zeiss SMT GMBH
- Tilman Schwertner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20150168846
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT IN A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHI...
- Publication number 20120075602
- Publication date Mar 29, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100201964
- Publication date Aug 12, 2010
- Carl Zeiss SMT AG
- Jens Kugler
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20080225247
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
Optical module with minimized overrun of the optical element
- Publication number 20080204689
- Publication date Aug 28, 2008
- Carl Zeiss SMT AG
- Willi Heintel
- G02 - OPTICS
Information Patent Application
Holding device for optical element
- Publication number 20070285645
- Publication date Dec 13, 2007
- Tilman Schwertner
- G02 - OPTICS

Tilman Schwertner

Person

Patents Grantslast 30 patents

Optical arrangement in a projection objective of a microlithographi...

Optical element unit for exposure processes having sealing element

Projection objective for microlithography

Optical module with minimized overrun of the optical element

Holding device for optical element

Patents Applicationslast 30 patents

SUBASSEMBLY OF AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAP...

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

OPTICAL ARRANGEMENT IN A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHI...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

Optical module with minimized overrun of the optical element

Holding device for optical element