Timo Laufer

Person

Stuttgart, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for temperature control of a component
- Patent number 11,372,341
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining properties of an EUV source
- Patent number 11,187,989
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Timo Laufer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for temperature control of a component
- Patent number 11,022,903
- Issue date Jun 1, 2021
- Carl Zeiss SMT GmbH
- Joeri Lof
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography with in...
- Patent number 10,466,598
- Issue date Nov 5, 2019
- Carl Zeiss SMT GmbH
- Alireza Akbarinia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement in an optical system, in particular in a microl...
- Patent number 9,639,007
- Issue date May 2, 2017
- Carl Zeiss SMT GmbH
- Timo Laufer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus
- Patent number 9,383,328
- Issue date Jul 5, 2016
- Carl Zeiss SMT GmbH
- Timo Laufer
- G01 - MEASURING TESTING
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement in an optical system, in particular in a microl...
- Patent number 9,134,504
- Issue date Sep 15, 2015
- Carl Zeiss SMT GmbH
- Timo Laufer
- G02 - OPTICS
Information Patent Grant
Protection module for EUV lithography apparatus, and EUV lithograph...
- Patent number 8,698,999
- Issue date Apr 15, 2014
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature-control device for an optical assembly
- Patent number 8,339,569
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- G02 - OPTICS
Information Patent Grant
Projection objective
- Patent number 7,557,902
- Issue date Jul 7, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical component, comprising a material with a predetermined homog...
- Patent number 7,524,072
- Issue date Apr 28, 2009
- Carl Zeiss SMT AG
- Timo Laufer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical component that includes a material having a thermal longitu...
- Patent number 7,428,037
- Issue date Sep 23, 2008
- Carl Zeiss SMT AG
- Timo Laufer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR TEMPERATURE CONTROL OF A COMPONENT
- Publication number 20210286272
- Publication date Sep 16, 2021
- Carl Zeiss SMT GMBH
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for temperature control of a component
- Publication number 20200233318
- Publication date Jul 23, 2020
- Carl Zeiss SMT GMBH
- Joeri Lof
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING PROPERTIES OF AN EUV SOURCE
- Publication number 20200218159
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Timo Laufer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH IN...
- Publication number 20190219934
- Publication date Jul 18, 2019
- Carl Zeiss SMT GMBH
- Alireza Akbarinia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROL...
- Publication number 20150346612
- Publication date Dec 3, 2015
- Carl Zeiss SMT GMBH
- Timo Laufer
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY APPARATUS
- Publication number 20130343422
- Publication date Dec 26, 2013
- Timo Laufer
- G01 - MEASURING TESTING
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROL...
- Publication number 20120154772
- Publication date Jun 21, 2012
- Carl Zeiss SMT GMBH
- Timo Laufer
- G02 - OPTICS
Information Patent Application
PROTECTION MODULE FOR EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPH...
- Publication number 20110216298
- Publication date Sep 8, 2011
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-CONTROL DEVICE FOR AN OPTICAL ASSEMBLY
- Publication number 20110181851
- Publication date Jul 28, 2011
- Carl Zeiss SMT GMBH
- Armin Schoeppach
- G02 - OPTICS
Information Patent Application
Euv projection lens with mirrors made from material with differing...
- Publication number 20070035814
- Publication date Feb 15, 2007
- Udo Dinger
- G02 - OPTICS
Information Patent Application
Optical component that includes a material having a thermal longitu...
- Publication number 20050207001
- Publication date Sep 22, 2005
- Timo Laufer
- G02 - OPTICS
Information Patent Application
Optical component, comprising a material with a predetermined homog...
- Publication number 20050185307
- Publication date Aug 25, 2005
- Carl Zeiss SMT AG
- Timo Laufer
- G02 - OPTICS

Timo Laufer

Person

Patents Grantslast 30 patents

Method for temperature control of a component

Method for determining properties of an EUV source

Method for temperature control of a component

EUV exposure apparatus with reflective elements having reduced infl...

Projection exposure apparatus for semiconductor lithography with in...

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Optical arrangement in an optical system, in particular in a microl...

Lithography apparatus

EUV exposure apparatus with reflective elements having reduced infl...

Optical arrangement in an optical system, in particular in a microl...

Protection module for EUV lithography apparatus, and EUV lithograph...

Temperature-control device for an optical assembly

Projection objective

Optical component, comprising a material with a predetermined homog...

Optical component that includes a material having a thermal longitu...

Patents Applicationslast 30 patents

METHOD FOR TEMPERATURE CONTROL OF A COMPONENT

Method for temperature control of a component

METHOD FOR DETERMINING PROPERTIES OF AN EUV SOURCE

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH IN...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROL...

LITHOGRAPHY APPARATUS

EUV Exposure Apparatus

OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROL...

PROTECTION MODULE FOR EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPH...

TEMPERATURE-CONTROL DEVICE FOR AN OPTICAL ASSEMBLY

Euv projection lens with mirrors made from material with differing...

Optical component that includes a material having a thermal longitu...

Optical component, comprising a material with a predetermined homog...