Timothy Lin

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Write-pattern determination for maskless lithography
- Patent number 8,245,162
- Issue date Aug 14, 2012
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Write-pattern determination for maskless lithography
- Patent number 8,111,380
- Issue date Feb 7, 2012
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask patterns for use in multiple-exposure lithography
- Patent number 8,082,524
- Issue date Dec 20, 2011
- Luminescent Technologies, Inc.
- Robert P. Gleason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask Patterns for Use in Multiple-Exposure Lithography
- Publication number 20090319978
- Publication date Dec 24, 2009
- Robert P. Gleason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Write-Pattern Determination for Maskless Lithography
- Publication number 20090077526
- Publication date Mar 19, 2009
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Write-Pattern Determination for Maskless Lithography
- Publication number 20090073413
- Publication date Mar 19, 2009
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY