Tina LI

Person

Warrenville, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,920,107
- Issue date Feb 16, 2021
- CMC Materials, Inc.
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,076
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,075
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition comprising an amine-containing surfactant
- Patent number 10,344,186
- Issue date Jul 9, 2019
- Cabot Microelectronics Corporation
- Alexander W. Hains
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition comprising cationic polymer additive
- Patent number 10,301,508
- Issue date May 28, 2019
- Cabot Microelectronics Corporation
- Viet Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP processing composition comprising alkylamine and cyclodextrin
- Patent number 9,796,882
- Issue date Oct 24, 2017
- Cabot Microelectronics Corporation
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tungsten-processing slurry with cationic surfactant and cyclodextrin
- Patent number 9,771,496
- Issue date Sep 26, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Tungsten chemical-mechanical polishing composition
- Patent number 9,567,491
- Issue date Feb 14, 2017
- Cabot Microelectronics Corporation
- Lin Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP compositions selective for oxide over polysilicon and nitride w...
- Patent number 9,165,489
- Issue date Oct 20, 2015
- Cabot Microelectronics Corporation
- Tina Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20200190361
- Publication date Jun 18, 2020
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20190185716
- Publication date Jun 20, 2019
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20180244956
- Publication date Aug 30, 2018
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT
- Publication number 20170369742
- Publication date Dec 28, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION COMPRISING CATIONIC POLYMER ADDITIVE
- Publication number 20170210946
- Publication date Jul 27, 2017
- Cabot Microelectronics Corporation
- Viet LAM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN
- Publication number 20170183540
- Publication date Jun 29, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN
- Publication number 20170121560
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN CHEMICAL-MECHANICAL POLISHING COMPOSITION
- Publication number 20150376462
- Publication date Dec 31, 2015
- Cabot Microelectronics Corporation
- Lin Fu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...
- Publication number 20140349483
- Publication date Nov 27, 2014
- Tina LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Polishing composition comprising an amine-containing surfactant

Polishing composition comprising cationic polymer additive

CMP processing composition comprising alkylamine and cyclodextrin

Tungsten-processing slurry with cationic surfactant and cyclodextrin

Tungsten chemical-mechanical polishing composition

CMP compositions selective for oxide over polysilicon and nitride w...

Patents Applicationslast 30 patents

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT

POLISHING COMPOSITION COMPRISING CATIONIC POLYMER ADDITIVE

CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN

TUNGSTEN CHEMICAL-MECHANICAL POLISHING COMPOSITION

CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...